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981. Traceability Calibration, & Measurement Uncertainty Issues Regarding Coordinate Measuring Machines and Other Complex Instruments
Topic: Manufacturing
Published: 6/1/2000
Author: Steven David Phillips
Abstract: The modern definition of traceability intimately links the concepts of calibration (i.e., connection to the SI unit) and measurement uncertainty. In a typical coordinate measuring machine (CMM) measurement problem the measurement under consideration ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820969

982. Traceability for Ballistics Signature Measurements in Forensic Science
Topic: Manufacturing
Published: 12/1/2009
Authors: Jun-Feng Song, Theodore Vincent Vorburger, Susan M Ballou, Li Ma, Thomas B Renegar, Xiaoyu A Zheng, Martin Ols
Abstract: The National Institute of Standards and Technology (NIST) in collaboration with the Bureau of Alcohol, Tobacco, Firearms, and Explosives (ATF) has developed the Standard Reference Material (SRM) 2460 Bullets and 2461 Casings. NIST has also developed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824703

983. Traceable Atomic Force Microscope Dimensional Metrology at NIST
Topic: Manufacturing
Published: 3/1/2006
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Michael W Cresswell, Richard A Allen, William F Guthrie
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology.  There are two major instruments being used for traceable measurements at NIST.  The first is a cus ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823204

984. Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty
Topic: Manufacturing
Published: 1/1/2005
Authors: Ronald G Dixson, Richard A Allen, William F Guthrie, Michael W Cresswell
Abstract: The use of critical dimension atomic force microscopes (CD-AFMs) in semiconductor manufacturing, both for process control and as a reference metrology tool, is increasing.  If the tip width is calibrated consistentlybetween measurements, a CD-AF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823193

985. Traceable Pico-Meter Level Step Height Metrology
Topic: Manufacturing
Published: 12/1/2004
Authors: Ndubuisi George Orji, Ronald G Dixson, Joseph Fu, Theodore Vincent Vorburger
Abstract: The atomic force microscope (AFM) increasingly being used as a metrology tool in the semiconductor industry where the features measured are at the nanometer level and continue to decrease. Usually the height sensors of the AFM are calibrated using st ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822142

986. Traceable Standards for Scanning Electron Microscopy
Topic: Manufacturing
Published: 1/1/1994
Author: Michael T Postek
Abstract: The emphasis on International Standards Organization (ISO) certification of laboratories has resulted in a renewed interest in NIST traceable standards for scanning electron microscopy (SEM). Under ISO certification, it is mandatory to calibrate and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820996

987. Tradeoffs in Building a Generic Supply Chain Simulation Capability
Topic: Manufacturing
Published: 10/15/2008
Author: Sanjay Jain
Abstract: Building a simulation model for any large complex sys-tem requires high expertise and effort. These requirements can be reduced through building generic simulation capability that includes artifacts for facilitating the development of the simulation ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824711

988. Trial Shape-Sensitive Linewidth Measurement System
Topic: Manufacturing
Published: 11/1/2001
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: This is a report for a project to develop a scanning electron microscope (SEM) based shape-sensitive linewidth measurement system by improving the method by improving the method by which SEM data are analyzed. We report significant developments in al ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822433

989. Two-Dimensional Calibration Artifact and Measurement Methodology
Topic: Manufacturing
Published: 6/1/1999
Authors: Richard M Silver, Theodore D Doiron, William B. Penzes, S Fox, Edward A Kornegay, S Rathjen, M Takac, D Owen
Abstract: In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank. The design has been agreed upon by a number of SEMI participants working on a two-dimensiona ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820948

990. Two-Dimensional Simulation and Modeling in Scanning Electron Microscope Imaging and Metrology Research
Topic: Manufacturing
Published: 7/1/2002
Authors: Michael T Postek, Andras Vladar, J R. Lowney, William J. Keery
Abstract: Traditional Monte Carlo modeling of the electron beam specimen interactions in a scanning electron microscope (SEM) produces information about electron beam penetration and output signal generation at either a single beam landing location, or multipl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822435



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