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Topic Area: Manufacturing
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Displaying records 981 to 990 of 1000 records.
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981. Silicon Nanostructures Fabricated by Scanning Probe Lithography and TMAH Etching
Topic: Manufacturing
Published: 1/1/2002
Authors: F S Chien, W F Hsieh, S Gwo, Andras Vladar, John A. Dagata
Abstract: Fabrication of silicon nanostructures is a key technique for the development of monolithically integrated optoelectronic circuits. We demonstrate that the process of scanning probe lithography (SPL) and anisotropic TMAH etching is a low-cost and rel ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823149

982. Silicon Nanostructures Fabricated by Scanning Probe Oxidation and Tetramethyl Ammonium Hydroxide Etching
Topic: Manufacturing
Published: 6/15/2002
Authors: F S Chien, W F Hsieh, S Gwo, Andras Vladar, John A. Dagata
Abstract: Fabrication of silicon nanostructures is a key technique for the development of monolithically integrated optoelectronic circuits. We demonstrate that the process of scanning probe lithography (SPL) and anisotropic TMAH etching is a low-cost and reli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821774

983. Silicon Single Atom Steps as AFM Height Standards
Topic: Manufacturing
Published: 8/1/2001
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore Vincent Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Abstract: Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and roughness measurements at sub-nanometer levels are often of interest. To perform accurate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821579

984. Simulated SEM Images for Resolution Measurement
Topic: Manufacturing
Published: 7/30/2008
Authors: Petr Cizmar, Andras Vladar, Bin Ming, Michael T Postek
Abstract: Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are sev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823050

985. Simulation Modeling of Emergency Response Facility Based on Software Product Line Technology
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7444
Topic: Manufacturing
Published: 9/1/2007
Authors: Guodong Shao, Yung-Tsun Tina Lee
Abstract: The development of a simulation model has always been a challenging task; it is time-consuming and requires expertise. Furthermore, most customized simulation models need to be developed from scratch. This paper proposes a more effective, reusable so ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822741

986. Simulation Prototypes for Incident Management Training
Topic: Manufacturing
Published: 10/1/2006
Authors: Guodong Shao, Charles R. McLean
Abstract: First responders and incident management personnel need better training resources to prepare for future disasters. Live training exercises while valuable are often very expensive to organize and conduct. Training using modeling, simulation, and gamin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822635

987. Simulation and Measurement of Subsurface Features in Scanning Electron Microscopy Metrology
Topic: Manufacturing
Published: 4/1/1998
Authors: J R. Lowney, Michael T Postek, Samuel N Jones, S Mayo, Michael W Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821787

988. Simulation and Prediction of Hardness Performance of Rockwell Diamond Indenters Using Finite Element Analysis
Topic: Manufacturing
Published: 7/1/2002
Authors: Li Ma, Samuel Rea Low III, Hui Zhou, Jun-Feng Song, R Dewit
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821771

989. Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Topic: Manufacturing
Published: 1/1/2005
Authors: Egon Marx, James Edward Potzick
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer.  When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822252

990. Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Topic: Manufacturing
Published: 7/3/2005
Authors: Egon Marx, James Edward Potzick
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer. When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822388



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