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Displaying records 961 to 970 of 1000 records.
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961. STR Sequence Analysis for Characterizing Normal, Variant, and Null Alleles
Topic: Manufacturing
Published: 8/1/2011
Authors: Margaret C Kline, Carolyn R Hill, John M Butler, Amy Decker
Abstract: DNA sequence variation is known to exist in and around the repeat region of short tandem repeat (STR) loci used in human identity testing. While the vast majority of STR alleles measured in forensic DNA laboratories worldwide type as ,normalŠ alleles ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905299

962. Safe Control of Manufacturing Vehicles Research Towards Standard Test Methods
Topic: Manufacturing
Published: 6/28/2012
Authors: Roger V Bostelman, William P Shackleford, Geraldine S Cheok, Kamel Shawki Saidi
Abstract: The National Institute of Standards and Technology's Intelligent Systems Division has been researching several areas leading to safe control of manufacturing vehicles to improve AGV safety standards. The research areas include: - Automated guided ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911407

963. Scale-Space Analysis of Line Edge Roughness on 193 nm Lithography Test Structures
Topic: Manufacturing
Published: 1/1/2003
Authors: Ndubuisi George Orji, Theodore Vincent Vorburger, Xiaohong Gu, Jayaraman Raja
Abstract: Line edge roughness (LER) is a potential showstopper for the semiconductor industry. As the width of patterned line structures decreases, LER is becoming a non-negligible contributor to resist critical dimension (CD) variation. The International Tech ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822124

964. Scanned Probe Microscope Tip Characterization Without Calibrated Tip Characterizers
Topic: Manufacturing
Published: 3/1/1996
Author: John S Villarrubia
Abstract: In scanned probe microscopy the image is a combination of information from the sample and the tip. In order to reconstruct the true surface geometry, it is necessary to know the actual tip shape. It has been proposed that this shape may be reconstruc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820829

965. Scanned Probe Techniques for the Electrical Characterization of Semiconductor Devices
Topic: Manufacturing
Published: 7/1/1995
Authors: John A. Dagata, Joseph J Kopanski
Abstract: The spatial resolution, sensitivity, and accuracy required for electrical characterization of device structures in the semiconductor industry suggest that scanned probe microscopy (SPM) tools may offer an alternative to existing measurement technique ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820733

966. Scanning Electron Microscope Analog of Scatterometry
Topic: Manufacturing
Published: 7/1/2002
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek
Abstract: Optical scatterometry has attracted a great deal of interest for linewidth measurement due to its high repeatability and capability of measuring sidewall shape. We have developed an analogous and complementary technique for the scanning electron micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821756

967. Scanning Electron Microscope Dimensional Metrology Using a Model-Based Library
Topic: Manufacturing
Published: 4/1/2005
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822251

968. Scanning Electron Microscope Dimensional Metrology using a Model-based Library
Topic: Manufacturing
Published: 1/1/2005
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822374

969. Scanning Electron Microscope Length Standards (Chapter VII in: Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology, R.M. Silver, J.L. Land, Editors, NISTIR 6036)
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6036
Topic: Manufacturing
Published: 1/1/1998
Authors: Michael T Postek, Joseph Fu
Abstract: A cross-section of length measurement capabilities fiom the Precision Engineering Division within the National Institute of Standards and Technology is benchmarked against those of other leading National Measurement Institutes. We present a variety ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820863

970. Scanning Electron Microscope Metrology
Topic: Manufacturing
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various form ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820702



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