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961. STEP-OAGIS Harmonization Joint Working Group, PDM Subgroup Interim Report
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7618
Topic: Manufacturing
Published: 8/27/2009
Authors: Xenia Fiorentini, Rachuri Rachuri
Abstract: In any manufacturing enterprise, there are two types of tools used to create and share product related data across its extended network. The engineering information of the product is created using what is commonly called engineering authoring tool (e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903449

962. STEPNC++ - An Effective Tool for Feature-based CAM/CNC
Topic: Manufacturing
Published: 12/1/2009
Authors: John L Michaloski, Thomas Rollin Kramer, Frederick M Proctor, Xun Xu, Sid Venkatesh, David Odendahl
Abstract: This chapter discusses the realization of direct translation of feature-based CAM files into feature-based CNC part program files. The information infrastructure that allows this to happen is STEP-NC, as described by ISO 14649 Parts 10 and 11. Amon ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901160

963. STR Sequence Analysis for Characterizing Normal, Variant, and Null Alleles
Topic: Manufacturing
Published: 8/1/2011
Authors: Margaret C Kline, Carolyn R Hill, John M Butler, Amy Decker
Abstract: DNA sequence variation is known to exist in and around the repeat region of short tandem repeat (STR) loci used in human identity testing. While the vast majority of STR alleles measured in forensic DNA laboratories worldwide type as ,normalŠ alleles ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905299

964. Safe Control of Manufacturing Vehicles Research Towards Standard Test Methods
Topic: Manufacturing
Published: 6/28/2012
Authors: Roger V Bostelman, William P Shackleford, Geraldine S Cheok, Kamel Shawki Saidi
Abstract: The National Institute of Standards and Technology's Intelligent Systems Division has been researching several areas leading to safe control of manufacturing vehicles to improve AGV safety standards. The research areas include: - Automated guided ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911407

965. Scale-Space Analysis of Line Edge Roughness on 193 nm Lithography Test Structures
Topic: Manufacturing
Published: 1/1/2003
Authors: Ndubuisi George Orji, Theodore Vincent Vorburger, Xiaohong Gu, Jayaraman Raja
Abstract: Line edge roughness (LER) is a potential showstopper for the semiconductor industry. As the width of patterned line structures decreases, LER is becoming a non-negligible contributor to resist critical dimension (CD) variation. The International Tech ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822124

966. Scanned Probe Microscope Tip Characterization Without Calibrated Tip Characterizers
Topic: Manufacturing
Published: 3/1/1996
Author: John S Villarrubia
Abstract: In scanned probe microscopy the image is a combination of information from the sample and the tip. In order to reconstruct the true surface geometry, it is necessary to know the actual tip shape. It has been proposed that this shape may be reconstruc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820829

967. Scanned Probe Techniques for the Electrical Characterization of Semiconductor Devices
Topic: Manufacturing
Published: 7/1/1995
Authors: John A Dagata, Joseph J Kopanski
Abstract: The spatial resolution, sensitivity, and accuracy required for electrical characterization of device structures in the semiconductor industry suggest that scanned probe microscopy (SPM) tools may offer an alternative to existing measurement technique ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820733

968. Scanning Electron Microscope Analog of Scatterometry
Topic: Manufacturing
Published: 7/1/2002
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek
Abstract: Optical scatterometry has attracted a great deal of interest for linewidth measurement due to its high repeatability and capability of measuring sidewall shape. We have developed an analogous and complementary technique for the scanning electron micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821756

969. Scanning Electron Microscope Dimensional Metrology Using a Model-Based Library
Topic: Manufacturing
Published: 4/1/2005
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822251

970. Scanning Electron Microscope Dimensional Metrology using a Model-based Library
Topic: Manufacturing
Published: 1/1/2005
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822374



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