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941. Scattering From Sinusoidal Gratings
Topic: Manufacturing
Published: 9/1/1997
Authors: B C. Park, Theodore Vincent Vorburger, Thomas Avery Germer, Egon Marx
Abstract: Laser light scattering from holographic sinusoidal gratings has been investigated with a view to its use in the calibration of the linearity of BRDF instruments, a task that requires a wide dynamic range in the scattered intensity. An aluminum-coated ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820855

942. Scattering by Dielectric Strips on a Dielectric Layer of Finite Thickness
Topic: Manufacturing
Published: 1/1/2004
Author: Egon Marx
Abstract: Accurate simulation of optical images of lines and trenches placed on semiconductors are of great interest to industry, especially in the overlay process.  Similarly, optical images of photomasks in the transmission mode are also of interest. &n ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823169

943. Scattering by Wedges
Topic: Manufacturing
Published: 1/1/2003
Author: Egon Marx
Abstract: Some of the components of the fields produced by an incident plane monochromatic wave scattered by a wedge diverge near the edge of the wedge. Rigorous solutions for the fields scattered by a perfectly conducting infinite wedge have been obtained, bu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822043

944. Scattering by a Dielectric Wedge for Oblique Incidence
Topic: Manufacturing
Published: 1/1/2002
Author: Egon Marx
Abstract: Electromagnetic scattering of an incident plane monochromatic wave by dielectric or finitely conducting infinite cylinders of arbitrary cross section can be reduced to the solution of scalar Helmholtz equations in two dimensions for the components of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822431

945. Scattering by a Dielectric Wedge: Oblique Incidence
Topic: Manufacturing
Published: 1/1/1995
Author: Egon Marx
Abstract: The scattering of a plane monochromatic wave by an infinite dielectric wedge is discussed for arbitrary direction of incidence and polarization. Two sets of coupled integral equations for an unknown surface function are derived. The behavior of the f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820746

946. Scattering by a Sphere with a Dielectric Half-Space or on Another Sphere
Topic: Manufacturing
Published: 1/1/2004
Author: Egon Marx
Abstract: Particle contamination of dielectric or conducting surfaces can be detected by shining light on the surface and looking for abnormal scattering distributions.  This procedure can be simulated by computing the scattering distribution for a dielec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823168

947. Science based Information Metrology for Engineering Informatics
Topic: Manufacturing
Published: 9/1/2007
Author: Rachuri Rachuri
Abstract: Engineering informatics is the discipline of creating, codifying (structure and behavior that is syntax and semantics), exchanging (interactions and sharing), processing (decision making), storing and retrieving (archive and access) the digital objec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822745

948. Selecting Valid Correlation Areas for Automated Bullet Identification Systems Based on Striation Detection
Topic: Manufacturing
Published: 5/1/2011
Authors: Wei Chu, Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Richard M Silver
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905104

949. Self-Calibration and Error Compensation Using Reference Position Markers
Topic: Manufacturing
Published: 1/1/1999
Author: H Zou
Abstract: In this paper, reference position markers are proposed for self-calibration and error compensation. Self-calibration of x-y motion guides is discussed with a focus on the orthogonality calibration. An algorithm is developed using a closure method and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820956

950. Self-Calibration: Reversal, Redundancy, Error Separation, and "Absolute Testing"
Topic: Manufacturing
Published: 1/1/1996
Authors: Christopher J. Evans, R Hocken, William Tyler Estler
Abstract: Over the years many techniques have been developed for accurate measurement of part features without reference to an externally calibrated artifact. This paper presents a partial survey of such methods for dimensional metrology, their ranges of appli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820791



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