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941. Technology Readiness Levels for Randomized Bin Picking, Performance Metrics for Intelligent Systems (PerMIS) 2012 Workshop, Special Session
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7876
Topic: Manufacturing
Published: 9/4/2012
Authors: Jeremy A Marvel, Roger D. Eastman, Geraldine S Cheok, Kamel S Saidi, Tsai Hong Hong, Elena R Messina, Bob Bollinger, Paul Evans, Joyce Guthrie, Eric Hershberger, Carlos Martinez, Karen McNamara, James Wells
Abstract: The special session on Technology Readiness Levels (TRLs) for Randomized Bin Picking was held during the morning session of the 2012 Performance Metrics for Intelligent Systems (PerMIS) workshop, 21 March, 2012. The stated objective of the speci ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911415

942. Telepresence:  A New Paradigm for Industrial and Scientific Collaboration
Topic: Manufacturing
Published: 6/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: A portion of the mission of the National Institute of Standards and Technology (NIST) Manufacturing Engineering Laboratory (MEL) is to improve and advance length metrology in aid of U.S. industry.  The successful development of a Collaboratory f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823114

943. Telepresence:  A New Paradigm for Solving Contamination Problems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full complement of analytical tools in a fab that would be necessary to identify very small particle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823117

944. Telepresence: A New Paradigm for Industrial and Scientific Collaboration
Topic: Manufacturing
Published: 6/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: The successful development of a collaboratory for Telepresence Microscopy (TPM) provides an important new tool to promote technology transfer in the areas of measurement technology. NIST and Texas Instruments (TI), under the auspices of the National ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820945

945. Telepresence: A New Paradigm for Solving Contamination Problems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full compliment of analytical tools in a fab that would be necessary to identify very small particle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820944

946. Test Optics Error Removal
Topic: Manufacturing
Published: 3/1/1996
Authors: Christopher J. Evans, R Kestner
Abstract: Wave-front or surface errors may be divided into rotationally symmetric and nonrotationally symmetric terms. It is shown that if either the test part or the reference surface in an interferometric test is rotated to N equally spaced positions about t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820792

947. Test Tool for Industrial Ethernet Network Performance
Topic: Manufacturing
Published: 6/5/2009
Authors: James D Gilsinn, Freemon Johnson
Abstract: The number of devices that implement Ethernet interfaces on the factory floor is growing at an exponential rate along with the adoption of industrial-grade Ethernet networks on the plant floor. In addition to the sheer number of devices using indust ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902598

948. Test of CD-SEM Shape-Sensitive Linewidth Measurement
Topic: Manufacturing
Published: 7/1/2004
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: In a model-based library (MBL) approach to scanning electron microscope (SEM) linewidth measurement, a library of simulation results for a range of lineshapes is searched for a match to the measured image of the unknown line. Compared to standard alg ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823157

949. Test of a Slow Off-Axis Parabola at it
Topic: Manufacturing
Published: 11/1/1995
Authors: R E. Parks, Christopher J. Evans, Lianzhen Shao
Abstract: We describe the interferometric testing of a slow (f/16 at the center of curvature) off-axis parabola, intended for use in an x-ray spectrometer, that uses a spherical wave front matched to the mean radius of the asphere. We find the figure error in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820753

950. Testing Displacement-Measuring Interferometer Systems
Topic: Manufacturing
Published: 1/1/1998
Authors: Jack A Stone Jr., Martin Schroeck, Michael T. Stocker
Abstract: We have made a study of one method for testing displacement-measuring interferometer systems, a modified back-to-back comparison, that automatically compensates for changes in the optical path length between the two interferometers.  Although th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823081



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