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61. A Model-Driven Approach for Building OWL DL and OWL Full Ontologies
Topic: Manufacturing
Published: 10/1/2006
Authors: S Brockmans, R Colomb, P Haase, E Kendall, Evan K Wallace, G Xie
Abstract: This paper presents an approach for visually modeling OWL DL and OWL Full ontologies based on the well-established visual modeling language UML. We discuss a metamodel for OWL based on the Meta-Object Facility, an associated UML profile as visual syn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822636

62. A Modular System Architecture for Agile Assembly of Nano-Components using Optical Tweezers
Topic: Manufacturing
Published: 9/1/2005
Authors: Arvind Kumar Balijepalli, Thomas W LeBrun, et al
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822378

63. A Modular System Architecture for Agile Assembly of Nanocomponents using Optical Tweezers
Topic: Manufacturing
Published: 9/10/2005
Authors: Arvind Kumar Balijepalli, Thomas W LeBrun, Cedric Gagnon, Yong-Gu Lee, Nicholas G Dagalakis
Abstract: In order to realize the flexibility optical trapping offers as a nanoassembly tool, we need to develop natural and intuitiveinterfaces to assemble large quantities of nanocomponents quickly and cheaply. We propose a system to create such aninterface ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822368

64. A Monte Carlo Model for SEM Linewidth Metrology
Topic: Manufacturing
Published: 5/1/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820689

65. A Multi-Criteria Web Services Composition Problem
Topic: Manufacturing
Published: 6/20/2007
Authors: Jeong Buhwan, Hyunbo Cho, Boonserm Kulvatunyou, Albert W Jones
Abstract: With its prevalence in enterprise applications integration, the service-oriented approach has been studied in various ways. The popularity, however, results in a number of different standards and implementations. The approach needs agreed-upon defini ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904334

66. A Multiscale Fabrication Approach to Microfluidic System Development
Topic: Manufacturing
Published: 1/1/2004
Authors: Tony L Schmitz, John A. Dagata, Brian S. Dutterer, W G Sawyer
Abstract: Microfluidic systems for analytical, medical, and sensing applications integrate optical or electrical readouts in low-cost, low-volume consumption systems. Embedding chemically functionalized templates with nanoscale topography within these devices ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821973

67. A New Design and Uncertainty Budget for a Metrology UHV-STM Used in Direct Measurements of Atom Spacings
Topic: Manufacturing
Published: 7/1/2002
Authors: S Gonda, Hui Zhou, Joseph Fu, Richard M Silver
Abstract: A basic scheme of direct, highly accurate dimensional measurements of nanostructures is presented. We have constructed a scanning tunneling microscope (STM) unit combined with a diode laser-based Michelson interferometer module. The compact size of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821757

68. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Topic: Manufacturing
Published: 1/1/1994
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820698

69. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Topic: Manufacturing
Published: 12/1/1999
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820939

70. A New Way of Handling Dimensional Meaurement Results for Integrated Circuit Technology
Topic: Manufacturing
Published: 6/1/2003
Authors: Andras Vladar, John S Villarrubia, Michael T Postek
Abstract: The international guidelines for correct expression of measurement results and errors call for a through assessment of the errors, their origin and behavior. The various dimensional measurement methods have different types of errors, different signa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823159