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51. A Metrology Approach to Unifying Rockwell C Hardness Scales
Topic: Manufacturing
Published: 1/1/1995
Authors: Jun-Feng Song, J Smith, Theodore Vincent Vorburger
Abstract: Current Rockwell C hardness scales (HRC) are unified by performance comparisons. Unless a reliable metrology approach is used for the direct verification of standard hardness machines and diamond indenters, the unified hardness scale may exhibit a sy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820772

52. A Model for Step Height, Edge Slope and Linewidth Measurements Using AFM
Topic: Manufacturing
Published: 1/1/2003
Authors: Xuezeng Zhao, Theodore Vincent Vorburger, Joseph Fu, Jun-Feng Song, C V Nguyen
Abstract: Nano-scale linewidth measurements are performed in semiconductor manufacturing and in the data storage industry and will become increasingly important in micro-mechanical engineering. With the development of manufacturing technology in recent years, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821974

53. A Modular System Architecture for Agile Assembly of Nano-Components using Optical Tweezers
Topic: Manufacturing
Published: 9/1/2005
Authors: Arvind Kumar Balijepalli, Thomas W LeBrun, et al
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822378

54. A Modular System Architecture for Agile Assembly of Nanocomponents using Optical Tweezers
Topic: Manufacturing
Published: 9/10/2005
Authors: Arvind Kumar Balijepalli, Thomas W LeBrun, Cedric Victor Lucien Gagnon, Yong-Gu Lee, Nicholas G Dagalakis
Abstract: In order to realize the flexibility optical trapping offers as a nanoassembly tool, we need to develop natural and intuitiveinterfaces to assemble large quantities of nanocomponents quickly and cheaply. We propose a system to create such aninterface ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822368

55. A Monte Carlo Model for SEM Linewidth Metrology
Topic: Manufacturing
Published: 5/1/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820689

56. A Multi-Criteria Web Services Composition Problem
Topic: Manufacturing
Published: 6/20/2007
Authors: Jeong Buhwan, Hyunbo Cho, Boonserm Kulvatunyou, Albert W Jones
Abstract: With its prevalence in enterprise applications integration, the service-oriented approach has been studied in various ways. The popularity, however, results in a number of different standards and implementations. The approach needs agreed-upon defini ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904334

57. A Multiscale Fabrication Approach to Microfluidic System Development
Topic: Manufacturing
Published: 1/1/2004
Authors: Tony L Schmitz, John A Dagata, Brian S. Dutterer, W G Sawyer
Abstract: Microfluidic systems for analytical, medical, and sensing applications integrate optical or electrical readouts in low-cost, low-volume consumption systems. Embedding chemically functionalized templates with nanoscale topography within these devices ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821973

58. A New Design and Uncertainty Budget for a Metrology UHV-STM Used in Direct Measurements of Atom Spacings
Topic: Manufacturing
Published: 7/1/2002
Authors: S Gonda, Hui Zhou, Joseph Fu, Richard M Silver
Abstract: A basic scheme of direct, highly accurate dimensional measurements of nanostructures is presented. We have constructed a scanning tunneling microscope (STM) unit combined with a diode laser-based Michelson interferometer module. The compact size of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821757

59. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Topic: Manufacturing
Published: 1/1/1994
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820698

60. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Topic: Manufacturing
Published: 12/1/1999
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820939



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