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Topic Area: Manufacturing
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51. A Literature Review of Sensor Ontologies for Manufacturing Applications
Topic: Manufacturing
Published: 10/23/2013
Authors: Craig I Schlenoff, Tsai Hong Hong, Roger D. Eastman
Abstract: The purpose of this paper is to review existing sensor and sensor network ontologies to understand whether they can be reused as a basis for a manufacturing perception sensor ontology, or if the existing ontologies hold lessons for the development of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914024

52. A Method for the Spatial Calibration of a Commercial Phase Measuring Interferometer
Topic: Manufacturing
Published: 2/1/1995
Authors: P Sullivan, Christopher J. Evans
Abstract: In a phase measuring interferometer (PMI), the interference pattern is focused on a charge coupled device (CCD) detector array and data points are sampled at the corresponding locations. In most commercially available systems, a zoom lens forms part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820778

53. A Method for the Spatial Calibration of a Commercial Phase Measuring Interferometer - Theoretical Aspects
Topic: Manufacturing
Published: 1/1/1994
Authors: P Sullivan, Christopher J. Evans
Abstract: In a phase measuring interferometer (PMI), the interference pattern is focused on a charge coupled device (CCD) detector array and data points are sampled at the corresponding locations. In most commercially available systems, a zoom lens forms part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820718

54. A Method for the Spatial Calibration of a Commercial Phase Measuring Interferometer-Practical Implementation
Topic: Manufacturing
Published: 10/1/1994
Authors: P Sullivan, Christopher J. Evans
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820719

55. A Method to Characterize Overlay Tool Misalignments and Distortions
Topic: Manufacturing
Published: 7/1/1997
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Christopher J. Evans, Michael L McGlauflin, Edward A Kornegay, Robert D. Larrabee
Abstract: A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820873

56. A Methodology for Systematic Generation and Evaluation of Alternative Operation Plans
Topic: Manufacturing
Published: 1/1/1994
Authors: Satyandra K. Gupta, William Regli, D Nau, Li Zhang
Abstract: This chapter describes a methodology for analyzing some of the manufacturability aspects of machined parts during the design stage of the product development cycle, so that problems related to machining can be recognized and corrected while the produ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821982

57. A Metric for the Comparison of Surface Topographies of Standard Reference Material (SRM) Bullets and Casings
Topic: Manufacturing
Published: 10/1/2005
Authors: Jun-Feng Song, Theodore Vincent Vorburger, Li Ma, John M Libert, Susan M Ballou
Abstract: Based on the maximum cross-correlation function, CCFmax, a new parameter called signature difference, Ds, is developed for verifying the similarity of the 2D and 3D ballistics signatures of the standard bullets and of the prototype standard casings. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822360

58. A Metrology Approach to Unifying Rockwell C Hardness Scales
Topic: Manufacturing
Published: 1/1/1995
Authors: Jun-Feng Song, J Smith, Theodore Vincent Vorburger
Abstract: Current Rockwell C hardness scales (HRC) are unified by performance comparisons. Unless a reliable metrology approach is used for the direct verification of standard hardness machines and diamond indenters, the unified hardness scale may exhibit a sy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820772

59. A Model Driven Standards Process
Topic: Manufacturing
Published: 4/1/2005
Author: Arthur Griesser
Abstract: Explains how and why UML models fit into a robust formal standardization process based on the best practices of software development.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31913

60. A Model for Step Height, Edge Slope and Linewidth Measurements Using AFM
Topic: Manufacturing
Published: 1/1/2003
Authors: Xuezeng Zhao, Theodore Vincent Vorburger, Joseph Fu, Jun-Feng Song, C V Nguyen
Abstract: Nano-scale linewidth measurements are performed in semiconductor manufacturing and in the data storage industry and will become increasingly important in micro-mechanical engineering. With the development of manufacturing technology in recent years, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821974



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