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Topic Area: Manufacturing
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Displaying records 991 to 1000.
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991. Simulation Prototypes for Incident Management Training
Topic: Manufacturing
Published: 10/1/2006
Authors: Guodong Shao, Charles R. McLean
Abstract: First responders and incident management personnel need better training resources to prepare for future disasters. Live training exercises while valuable are often very expensive to organize and conduct. Training using modeling, simulation, and gamin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822635

992. Simulation and Measurement of Subsurface Features in Scanning Electron Microscopy Metrology
Topic: Manufacturing
Published: 4/1/1998
Authors: J R. Lowney, Michael T Postek, Samuel N Jones, S Mayo, Michael W Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821787

993. Simulation and Prediction of Hardness Performance of Rockwell Diamond Indenters Using Finite Element Analysis
Topic: Manufacturing
Published: 7/1/2002
Authors: Li Ma, Samuel Rea Low III, Hui Zhou, Jun-Feng Song, R Dewit
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821771

994. Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Topic: Manufacturing
Published: 1/1/2005
Authors: Egon Marx, James Edward Potzick
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer.  When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822252

995. Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Topic: Manufacturing
Published: 7/3/2005
Authors: Egon Marx, James Edward Potzick
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer. When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822388

996. Simulation-based Manufacturing Interoperability Standards and Testing
Topic: Manufacturing
Published: 1/7/2009
Authors: Guodong Shao, Swee Kong Leong, Charles R. McLean
Abstract: Software applications for manufacturing systems developed using software from different vendors typically cannot work together. Develop¬ment of custom integrations of manufacturing software incurs costs and delays that hurt industry productivity and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901344

997. Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards
Topic: Manufacturing
Published: 4/5/2007
Authors: Ronald G Dixson, William F Guthrie, Michael W Cresswell, Richard A Allen, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) are rapidly gaining acceptance in semiconductor manufacturing metrology.  These instruments offer non-destructive three dimensional imaging of structures and can provide a valuable complement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823219

998. Single-Integral-Equation Method for Scattering by Dielectric Cylinders
Topic: Manufacturing
Published: 7/1/2001
Author: Egon Marx
Abstract: Electromagnetic scattering of an incident plane monochromatic wave by dielectric or finitely conducting infinite cylinders of arbitrary shape, possibly in the presence of a substrate, can be reduced to the solution of scalar Helmholtz equations in tw ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822444

999. Single-Integral-Equation Method for Three-Dimensional Scattering
Topic: Manufacturing
Published: 7/1/2001
Author: Egon Marx
Abstract: The fields scattered by a homogeneous dielectric or finitely conducting object can be obtained from two tangential vector fields, the components of the electric and magnetic fields, on the interface. We have adapted the single-integral-equation metho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822445

1000. Sliding Mode Control for Active Vibration Isolation of a Long Range Scanning Tunneling Microscope
Topic: Manufacturing
Published: 10/29/2004
Authors: K J Lan, James H Yen, John A Kramar
Abstract: An active vibration isolation (AVI) system has been designed and implemented for the Molecular Measuring Machine (M3) at the National Institute of Standards and Technology (NIST). NIST is investigating active vibration isolation as an approach to imp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822380



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