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Displaying records 991 to 1000.
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991. Semiconductor Manufacturing Equipment Data Acquisition Simulation for Timing Performance Analysis
Topic: Manufacturing
Published: 9/22/2008
Authors: James Moyne, YaShian Li-Baboud, Xiao Zhu, Dhananjay Anand, Sulaiman Hussain
Abstract: The ability to acquire quality equipment and process data is pertinent for future real-time process control systems to maximize opportunities for semiconductor manufacturing yield enhancement and equipment efficiency. Clock synchronization for accur ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=33160

992. Sensors and Process Control in Gas Atomization
Topic: Manufacturing
Published: 1/1/1991
Authors: S Ridder, Steve Osella, P Espina, F Biancaniello
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821487

993. Separation and Metrology of Nanoparticles by Nanofluidic Size Exclusion
Topic: Manufacturing
Published: 8/11/2010
Authors: Samuel M Stavis, Jon C Geist, Michael Gaitan
Abstract: A nanofluidic approach to the separation and metrology of nanoparticles is demonstrated. Advantages of this approach include nanometer-scale resolution, nanometer-scale to submicrometer-scale range, mitigation of hydrodynamic and diffusional limitat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904215

994. Separation of Inner Shell Vacancy Transfer Mechanisms in Collisions of Slow Ar17+ Ions with SiO2
Topic: Manufacturing
Published: 1/1/2001
Authors: Z Berenyi, N Stolterfoht, E Takacs, J Pedulla, R Deslattes, J Gillaspy, R Minniti, L Ratliff
Abstract: We have studied the spectrum of x-rays emitted when 130 and 200 keV kinetic energy hydrogen-like argon ions impact silicon dioxide surfaces. Specifically, we were interested in the mechanism for creation of K-shell holes in the silicon target atoms, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822443

995. Service Oriented and Orchestrated Framework for Supply Chain Integration
Topic: Manufacturing
Published: 6/8/2009
Authors: Jack C.P. Cheng, Kincho H. Law, Albert W Jones, Ram D Sriram
Abstract: Supply chain management integrates key business processes and facilities, involving end users and suppliers that provide products, services and information. Supply chain integration can potentially add value to the stakeholders along product developm ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902583

996. Shape-Sensitive Linewidth Measurement with the SEM Using a Model-Based Library
Topic: Manufacturing
Published: 3/1/2001
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek
Abstract: In semiconductor electronics manufacturing, device performance often depends upon size. For example, microprocessor speed is linked to the width of transistor gates. Accurate measurement of feature width is an important but challenging problem. When ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821590

997. Shape-Sensitive Linewidth Measurements of Resist Structures
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7089
Topic: Manufacturing
Published: 1/1/2004
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: Widths of developed 193 nm resist lines were measured by two methods and compared. One method was a new model-based library method. In this method the scanning electron microscope (SEM) images corresponding to various edge shapes are simulated in adv ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822161

998. Silicon Nanostructures Fabricated by Scanning Probe Lithography and TMAH Etching
Topic: Manufacturing
Published: 1/1/2002
Authors: F S Chien, W F Hsieh, S Gwo, Andras Vladar, John A Dagata
Abstract: Fabrication of silicon nanostructures is a key technique for the development of monolithically integrated optoelectronic circuits. We demonstrate that the process of scanning probe lithography (SPL) and anisotropic TMAH etching is a low-cost and rel ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823149

999. Silicon Nanostructures Fabricated by Scanning Probe Oxidation and Tetramethyl Ammonium Hydroxide Etching
Topic: Manufacturing
Published: 6/15/2002
Authors: F S Chien, W F Hsieh, S Gwo, Andras Vladar, John A Dagata
Abstract: Fabrication of silicon nanostructures is a key technique for the development of monolithically integrated optoelectronic circuits. We demonstrate that the process of scanning probe lithography (SPL) and anisotropic TMAH etching is a low-cost and reli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821774

1000. Silicon Single Atom Steps as AFM Height Standards
Topic: Manufacturing
Published: 8/1/2001
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore Vincent Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Abstract: Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and roughness measurements at sub-nanometer levels are often of interest. To perform accurate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821579



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