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Displaying records 991 to 1000.
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991. Tolerancing Form Deviations for NIST Standard Reference Material (SRM) 2809 Rockwell Diamond Indenters
Topic: Manufacturing
Published: 1/1/2007
Authors: Jun-Feng Song, Samuel Rea Low III, Li Ma
Abstract: The National Institute of Standards and technology (NIST) plans to develop Standard Reference Material (SRM) 2809 Rockwell Diamond Indenter to support Rockwell hardness standardization.  Most tolerances of the SRM indenters are adopted from thos ...

992. Tolerancing Form Deviations for Rockwell Diamond Indenters
Topic: Manufacturing
Published: 9/1/2002
Authors: Jun-Feng Song, Samuel Rea Low III, Li Ma
Abstract: The spherical tip of Rockwell diamond indenters tends to be manufactured either a flat- or sharp-shaped surface because of the anisotropy property of the diamond. This can cause significant differences in the hardness readings. In order to control th ...

993. Topography Measurements and Applications
Topic: Manufacturing
Published: 1/1/2006
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: Based on auto- and cross-correlation functions (ACF and CCF), a new surface parameter called profile (or topography) difference, Ds, has been developed for quantifying differences between 2D profiles or between 3D topographies with a single number. & ...

994. Topography Measurements for Determining the Decay Factors in Surface Replication
Topic: Manufacturing
Published: 7/4/2008
Authors: Jun-Feng Song, P Rubert, Xiaoyu A Zheng, Theodore Vincent Vorburger
Abstract: The electro-forming technique is used at National Institute of Standards and Technology (NIST) for the production of standard reference material (SRM) 2461 standard casings to support nationwide ballistics measurement traceability and measurement q ...

995. Toward Accurate Linewidth Metrology Using Atomic Force Microscopy and Tip Characterization
Topic: Manufacturing
Published: 5/1/1996
Authors: Ronald G Dixson, J Schneir, T Mcwaid, N. Sullivan, V W. Tsai, S Zaidi, S Brueck
Abstract: As the critical dimensions of integrated circuit features decrease toward 0.18 um, feature width measurements with nanometer level accuracy will become increasingly important to the semiconductor processing industry. Atomic force microscopy (AFM) off ...

996. Toward Accurate Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated AFM
Topic: Manufacturing
Published: 1/1/1996
Authors: Ronald G Dixson, Theodore Vincent Vorburger, P Sullivan, V W. Tsai, T Mcwaid
Abstract: Atomic force microscope (AFM) measurements are being used increasingly for metrological applications such as semiconductor process development and control. Common types of measurements are those of feature spacing (pitch), feature height (or depth), ...

997. Toward Metamodels for Composable and Reusable Additive Manufacturing Process Models
Topic: Manufacturing
Published: 8/12/2014
Authors: Paul W Witherell, Shaw C Feng, Timothy Simpson
Abstract: Despite the existence and interest in additive manufacturing (AM) for many decades, industry adoption of AM technologies has been relatively slow. Recent advances in modeling and simulation of AM processes and materials are providing new insights to ...

998. Toward Nanometer Accuracy Measurements
Topic: Manufacturing
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...

999. Toward Smart Manufacturing Using Decision Guidance Analytics
Topic: Manufacturing
Published: 11/1/2014
Authors: Alexander Brodsky, Mohan Krishnamoorthy, Daniel A Menasce , Guodong Shao, Sudarsan Rachuri
Abstract: This paper is focused on decision analytics for smart manufacturing. We consider temporal manufacturing processes with stochastic throughput and inventories. We demonstrate the use of the recently proposed concept of the decision guidance analytics l ...

1000. Toward Traceability for At Line AFM Dimensional Metrology
Topic: Manufacturing
Published: 1/1/2002
Authors: Ronald G Dixson, Angela Guerry, Marylyn H. Bennett, Theodore Vincent Vorburger, Michael T Postek
Abstract: The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that exhibit excellent measurement repeatability--below 1 nm in some cases. Accuracy, however, is ...

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