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Displaying records 991 to 1000.
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991. Toward Metamodels for Composable and Reusable Additive Manufacturing Process Models
Topic: Manufacturing
Published: 8/12/2014
Authors: Paul W Witherell, Shaw C Feng, Timothy Simpson
Abstract: Despite the existence and interest in additive manufacturing (AM) for many decades, industry adoption of AM technologies has been relatively slow. Recent advances in modeling and simulation of AM processes and materials are providing new insights to ...

992. Toward Nanometer Accuracy Measurements
Topic: Manufacturing
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...

993. Toward Smart Manufacturing Using Decision Guidance Analytics
Topic: Manufacturing
Published: 11/1/2014
Authors: Alexander Brodsky, Mohan Krishnamoorthy, Daniel A Menasce , Guodong Shao, Sudarsan Rachuri
Abstract: This paper is focused on decision analytics for smart manufacturing. We consider temporal manufacturing processes with stochastic throughput and inventories. We demonstrate the use of the recently proposed concept of the decision guidance analytics l ...

994. Toward Traceability for At Line AFM Dimensional Metrology
Topic: Manufacturing
Published: 1/1/2002
Authors: Ronald G Dixson, Angela Guerry, Marylyn H. Bennett, Theodore Vincent Vorburger, Michael T Postek
Abstract: The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that exhibit excellent measurement repeatability--below 1 nm in some cases. Accuracy, however, is ...

995. Toward Traceability for At-line AFM Dimensional Metrology
Topic: Manufacturing
Published: 7/1/2003
Authors: Marylyn H. Bennett, Angela Guerry, Ronald G Dixson, Michael T Postek, Theodore Vincent Vorburger
Abstract: The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that exhibit excellent measurement repeatability - below one nanometer in some cases. Accuracy, ho ...

996. Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology
Topic: Manufacturing
Published: 6/1/1998
Authors: J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
Abstract: The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron micro ...

997. Toward the Ideal of Automating Production Optimization
Topic: Manufacturing
Published: 11/15/2013
Authors: John L Michaloski, Frederick M Proctor, Jorge Arinez, Jonatan Berglund
Abstract: The advent of improved factory data collection offers a prime opportunity to continuously study and optimize factory operations. Although manufacturing optimization tools can be considered mainstream technology, most U.S. manufacturers do not take fu ...

998. Towards Accurate Feature Shape Metrology
Topic: Manufacturing
Published: 3/22/2008
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, J Allgair
Abstract: Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM ...

999. Towards Information Networks to Support Composable Manufacturing
Topic: Manufacturing
Published: 10/15/2008
Authors: Mahesh Mani, Albert W Jones, Jun H. Shin, Ram D Sriram
Abstract: Rigid, supply-chain organizational structures are giving way to highly dynamic collaborative partnerships. These partnerships will develop rapidly by composing global manufacturing resources in response to open market opportunities; and, they will di ...

1000. Towards Mobile Manipulator Safety Standards
Topic: Manufacturing
Published: 10/24/2013
Authors: Jeremy A Marvel, Roger V Bostelman
Abstract: We present an overview of the current safety standards for industrial robots and automated guided vehicles (AGVs), and describe how they relate to the safety concerns of mobile manipulators (robot arms mounted on mobile bases) in modern manufacturing ...

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