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Displaying records 991 to 1000.
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991. Self-Similarity Simplification Approaches for the Modeling and Analysis of Rockwell Hardness Indentation
Series: Journal of Research (NIST JRES)
Topic: Manufacturing
Published: 9/1/2003
Authors: Li Ma, J Zhou, A Lau, Samuel Rea Low III, R Dewit
Abstract: The indentation process of pressing a rockwell diamond indenter into inelastic material has been studied to provide a means for the analysis, simulation and prediction of Rockwell hardness tests. The geometrical characteristics of the spheroconical-s ...

992. Semantic B2B-integration Using an Ontological Message Metamodel
Topic: Manufacturing
Published: 9/1/2010
Authors: Marko Vujasinovic, Nenad Ivezic, Edward J. Barkmeyer Jr., Zoran Marjanovic
Abstract: E-Business applications are often required to use different, incompatible, message sets to implement message interfaces for a business-to-business (B2B) communication. This makes communication with every new partner a new interoperability problem. In ...

993. Semantic-Mediation for Standards-based B2B Interoperability
Topic: Manufacturing
Published: 6/15/2009
Authors: Marko Vujasinovic, Nenad Ivezic, Boonserm Kulvatunyou, Edward J. Barkmeyer Jr., Michele Missikoff, Francesco Taglino, Zoran Marjanovic, Igor Miletic
Abstract: The authors discuss a semantic-mediation architecture to advance traditional approaches for standards-based business-to-business (B2B) interoperability. The architecture is supported by the ATHENA Knowledge Representation and Semantics Mediation tool ...

994. Semiconductor Manufacturing Equipment Data Acquisition Simulation for Timing Performance Analysis
Topic: Manufacturing
Published: 9/22/2008
Authors: James Moyne, YaShian Li-Baboud, Xiao Zhu, Dhananjay Anand, Sulaiman Hussain
Abstract: The ability to acquire quality equipment and process data is pertinent for future real-time process control systems to maximize opportunities for semiconductor manufacturing yield enhancement and equipment efficiency. Clock synchronization for accur ...

995. Sensors and Process Control in Gas Atomization
Topic: Manufacturing
Published: 1/1/1991
Authors: S Ridder, Steve Osella, P Espina, F Biancaniello

996. Separation and Metrology of Nanoparticles by Nanofluidic Size Exclusion
Topic: Manufacturing
Published: 8/11/2010
Authors: Samuel M Stavis, Jon C Geist, Michael Gaitan
Abstract: A nanofluidic approach to the separation and metrology of nanoparticles is demonstrated. Advantages of this approach include nanometer-scale resolution, nanometer-scale to submicrometer-scale range, mitigation of hydrodynamic and diffusional limitat ...

997. Separation of Inner Shell Vacancy Transfer Mechanisms in Collisions of Slow Ar17+ Ions with SiO2
Topic: Manufacturing
Published: 1/1/2001
Authors: Z Berenyi, N Stolterfoht, E Takacs, J Pedulla, R Deslattes, J Gillaspy, R Minniti, L Ratliff
Abstract: We have studied the spectrum of x-rays emitted when 130 and 200 keV kinetic energy hydrogen-like argon ions impact silicon dioxide surfaces. Specifically, we were interested in the mechanism for creation of K-shell holes in the silicon target atoms, ...

998. Service Oriented and Orchestrated Framework for Supply Chain Integration
Topic: Manufacturing
Published: 6/8/2009
Authors: Jack C.P. Cheng, Kincho H. Law, Albert W Jones, Ram D Sriram
Abstract: Supply chain management integrates key business processes and facilities, involving end users and suppliers that provide products, services and information. Supply chain integration can potentially add value to the stakeholders along product developm ...

999. Shape-Sensitive Linewidth Measurement with the SEM Using a Model-Based Library
Topic: Manufacturing
Published: 3/1/2001
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek
Abstract: In semiconductor electronics manufacturing, device performance often depends upon size. For example, microprocessor speed is linked to the width of transistor gates. Accurate measurement of feature width is an important but challenging problem. When ...

1000. Shape-Sensitive Linewidth Measurements of Resist Structures
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7089
Topic: Manufacturing
Published: 1/1/2004
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: Widths of developed 193 nm resist lines were measured by two methods and compared. One method was a new model-based library method. In this method the scanning electron microscope (SEM) images corresponding to various edge shapes are simulated in adv ...

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