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You searched on: Topic Area: Manufacturing Sorted by: date

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Displaying records 981 to 990 of 1000 records.
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981. Integral Equation for Scattering by a Rough Surface
Topic: Manufacturing
Published: 1/1/1996
Author: Egon Marx
Abstract: An equation for an unknown surface field that represents scattering by a rough patch on a flat dielectric surface is presented. The geometrical considerations for this particular problem are discussed, especially in relation to a surface divergence f ...

982. Laser Trackers: Traceability, Uncertainty and Standardization - A Report to the CMSC
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6061
Topic: Manufacturing
Published: 1/1/1996
Author: Gregory W Caskey
Abstract: During the 1996 CMSC conference, undoubtedly one of the hottest topics was how to achieve traceability for the laser tracker. This paper reviews the concepts of traceability and measurement uncertainty from NIST''s perspective, and explain ho ...

983. New NIST-Certified Length Microscale
Topic: Manufacturing
Published: 1/1/1996
Author: James Edward Potzick
Abstract: The National Institute of Standards and Technology is developing a simple one-dimension certified pitch standard (or scale) covering the range 1 um to 10 mm, intended for the calibration of microscope magnification and dimensional metrology instrumen ...

984. Novel Methods for Length Measurement Employing Diode Lasers
Topic: Manufacturing
Published: 1/1/1996
Authors: Jack A Stone Jr., Lowell P. Howard, Alois Stejskal, M Stephens, C Oates, L Hollberg
Abstract: Diode lasers have several unique capabilities for length-measurement applications, arising from properties of the diodes that are much different from those of the venerable helium-neon laser presently used for most interferometric measurements. For e ...

985. Optical Overlay Metrology at NIST
Topic: Manufacturing
Published: 1/1/1996
Authors: Richard M Silver, Amy Singer, L Carroll, S Berg-cross, James Edward Potzick
Abstract: Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standa ...

986. Progress Towards Accurate Metrology Using Atomic Force Microscopy
Topic: Manufacturing
Published: 1/1/1996
Authors: T Mcwaid, J Schneir, John S Villarrubia, Ronald G Dixson, V W. Tsai
Abstract: Accurate metrology using atomic force microscopy (AFM) requires accurate control of the tip position, an estimate of the tip geometry, and an understanding of the tip-surface interaction forces. We describe recent progress at NIST towards accurate AF ...

987. Quest for a Recurrence Relation for Xn
Topic: Manufacturing
Published: 1/1/1996
Author: Amy Singer

988. Relativistic Covariance and the Interpretation of Quantum Mechanics
Topic: Manufacturing
Published: 1/1/1996
Author: Egon Marx
Abstract: The standard interpretation of quantum mechanics is revised to conform to the relativistic theory based on the many-amplitudes formalism for the N-particle system. The wave function acquires a significance closer to that of the electromagnetic field, ...

989. SEM Image Sharpness Analysis
Topic: Manufacturing
Published: 1/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: The technique described here, utilizing the sharpness concept, is facilitated by the use of the FFT techniques to analyze the electron micrograph to obtain the evaluation. This is not the first application of Fourier techniques to SEM images, but it ...

990. Self-Calibration: Reversal, Redundancy, Error Separation, and "Absolute Testing"
Topic: Manufacturing
Published: 1/1/1996
Authors: Christopher J. Evans, R Hocken, William Tyler Estler
Abstract: Over the years many techniques have been developed for accurate measurement of part features without reference to an externally calibrated artifact. This paper presents a partial survey of such methods for dimensional metrology, their ranges of appli ...

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