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Displaying records 951 to 960 of 1000 records.
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951. Statistical Models for Estimating the Measurement of Pitch in Metrology Instruments
Topic: Manufacturing
Published: 1/1/1996
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee
Abstract: The measurement of pitch in metrology instruments is through to be a benign self-compensating function. In the course of issuing the new scanning electron microscope standard SRM 2090, a new algorithm for the measurement of pitch was developed. This ...

952. Strut Structure and Rigid Joint Therefor
Topic: Manufacturing
Published: 1/1/1996
Author: James Edward Potzick
Abstract: A highly rigid structure is provided using six struts connected at three upper and three lower nodes to upper and lower support structures. The joint assemblies are formed by half- spherical balls attached to the ends of each of the struts, and retai ...

953. Stylus Flight in Surface Profiling
Topic: Manufacturing
Published: 1/1/1996
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: In this paper, theoretical and experimental work on stylus flight is described. Experiments on the surfaces of different roughness specimens with sinusoidal, rectangular, triangular and random waveforms support the theoretical model, which predicts s ...

954. Toward Accurate Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated AFM
Topic: Manufacturing
Published: 1/1/1996
Authors: Ronald G Dixson, Theodore Vincent Vorburger, P Sullivan, V W. Tsai, T Mcwaid
Abstract: Atomic force microscope (AFM) measurements are being used increasingly for metrological applications such as semiconductor process development and control. Common types of measurements are those of feature spacing (pitch), feature height (or depth), ...

955. Uncertainty Procedure for NIST Surface Finish and Microform Calibration
Topic: Manufacturing
Published: 1/1/1996
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: An uncertainty procedure is used for reporting the NIST surface finish and microform calibration uncertainties. The combined standard uncertainty is a combination of the uncertainty from the geometric non-uniformity of the measured surface, and the u ...

956. Using a Potentiostat to Model In-Process Electromechanical Dressing
Topic: Manufacturing
Published: 1/1/1996
Authors: Robert S. Polvani, A Fraker, Christopher J. Evans
Abstract: In-process electrochemical dressing insures true, sharp, stable wheels for efficient ceramic grinding. To better implement electrochemical dressing, we couple laboratory studies based on a potentiostat with shop floor grinding runs. To do this, a cal ...

957. Wavelength-Shift Interferometry: Using a Dither to Improve Accuracy
Topic: Manufacturing
Published: 1/1/1996
Authors: Jack A Stone Jr., Alois Stejskal, Lowell P. Howard
Abstract: A dither in path length can dramatically improve the accuracy of wavelength-shift methods used for absolute distance interferometry. Here we report how a dither improves the accuracy of absolute distance measurement by two orders of magnitude, reduci ...

958. Visualization of Surface Figure Using Zernike Polynomials
Topic: Manufacturing
Published: 12/1/1995
Authors: Christopher J. Evans, R E. Parks, P Sullivan, John S Taylor
Abstract: Commercial software in modern interferometers used in optical testing frequently fit the wave-front or surface-figure error to Zernike polynomials; typically 37 coefficients are provided. We provide visual representations of these data in a form that ...

959. Stylus Technique for Direct Verification of Rockwell Diamond Indenters
Topic: Manufacturing
Published: 11/23/1995
Authors: Jun-Feng Song, F Rudder, Theodore Vincent Vorburger, J Smith
Abstract: Based on a stylus technique, a microform calibration system was developed at NIST for the direct verification of Rockwell diamond indenters. The least-squares radius and profile deviations, cone angle and cone flank straightness, and the holder axis ...

960. Blind Estimation of Tip Geometry from Noisy Images
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5752
Topic: Manufacturing
Published: 11/2/1995
Author: John S Villarrubia
Abstract: Broadening of image features due to non-vanishing tip size is a well-known imaging artifact in scanned probe microscopy (SPM) topographs. This need not be a serious limitation for some types of metrology (e.g. pitch or height), but it is significant ...

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