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931. Dimensional Metrology at the Nanometer Level: Combined SEM and PPM
Topic: Manufacturing
Published: 7/1/1997
Authors: Michael T Postek, H Ho, L Harrison
Abstract: The National Institute of Standards and Technology (NIST) is currently exploring the potentials afforded by the incorporation of a commercial proximal probe microscope (PPM) operating in the scanning tunneling or atomic force mode into a high resolut ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820864

932. Fourier Transform Feedback for Scanning Electron Microscopes Used in Semiconductor Metrology
Topic: Manufacturing
Published: 7/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: The utility of the sharpness concept for use on metrology scanning electron microscopes (SEM) as implemented through the Fourier transform technique has been clearly demonstrated and documented. The original methods for sharpness analysis were labor- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820866

933. Practical Aspects of Touch Trigger Probe Error Compensation
Topic: Manufacturing
Published: 7/1/1997
Authors: William Tyler Estler, Steven David Phillips, Bruce R. Borchardt, Ted Hopp, M Levenson, K Eberhardt, Marjorie A McClain
Abstract: We present extensions of our prior work in modeling and correcting for pretravel variation errors in kinematic seat touch-trigger coordinate measuring machine (CMM) probes with straight styli. A simple correction term is shown to account for a range ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820843

934. Statistical Measure for the Sharpness of the SEM Image
Topic: Manufacturing
Published: 7/1/1997
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820884

935. Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects
Topic: Manufacturing
Published: 7/1/1997
Authors: A Thompson, Theodore Vincent Vorburger, J Martin, M E. McKnight, Michael A Galler, R Lipman, Fern Y Hunt
Abstract: This is a conference report on the Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects held at Gaithersburg, MD, May 20, 1996.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822530

936. Inexpensive Digital Imaging?
Topic: Manufacturing
Published: 6/1/1997
Authors: Michael T Postek, Andras Vladar
Abstract: The capture of digital images through the use of a frame grabber provides tremendous advantages to scanning electron microscopy. Accessory frame grabbers can range in price from very inexpensive to several thousand dollars. This work investigates the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820865

937. Glass and Dimensional Metrology
Topic: Manufacturing
Published: 4/1/1997
Author: Theodore D Doiron
Abstract: Ordinary glass, even good optical quality glass, will shrink up to 20 micrometers/meter over the first few years after its manufacture. Gages made of glass are therefore not suitable as high accuracy artifacts unless they are calibrated often. Better ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820839

938. High-Speed Grinding - Fundamentals and State of the Art in Europe, Japan, and the USA
Topic: Manufacturing
Published: 4/1/1997
Authors: F Klocke, E Brinksmeier, Christopher J. Evans, T Howes, I Inasaki, E Minke, H Tonshoff, J A Webster, D Stuff
Abstract: This paper describes the technological basis and the current state of the art in the field of high speed grinding. The technological fundamentals of high speed grinding are first of all presented on the basis of the kinematics of the chip-forming pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823091

939. Performance Analysis Tool for Scanning Electron Microscopes Used in Semiconductor Metrology
Topic: Manufacturing
Published: 4/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: Scanning electron microscopes (SEM) are being utilized extensively in the production environment, and these instruments are approaching full automation. Once a human operator is no longer monitoring the instrument''s performance and multiple instrume ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820867

940. Noise Temperature Measurements on Wafer
Series: Technical Note (NIST TN)
Report Number: 1390
Topic: Manufacturing
Published: 3/1/1997
Author: James Paul Randa
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=11089