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Topic Area: Manufacturing
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Displaying records 931 to 940 of 1000 records.
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931. A Strategy for Faster Blind Reconstruction of Tip Geometry for Scanned Probe Microscopy
Topic: Manufacturing
Published: 3/1/1999
Author: John S Villarrubia
Abstract: In scanned probe microscopy, it is necessary to know the tip's geometry in order to correct image distortions due to its finite size. Heretofore, methods have focused upon determining the tip geometry by erosion of a tip characterizer of known geomet ...

932. Detector Strategy for the Scanning Electron Microscope Inspection and Metrology of Semiconductor Wafers
Topic: Manufacturing
Published: 3/1/1999
Authors: O C Wells, Michael T Postek

933. Nanometre-scale Oxidation of Silicon Surfaces by Dynamic Force Microscopy: Reproducibility, Kinetics and Nanofabrication
Topic: Manufacturing
Published: 3/1/1999
Authors: M Calleja, J Anguita, R Garcia, K Birkelund, F Perez-murano, John A Dagata
Abstract: Local oxidation of silicon surfaces by scanning probe microscopy is a very promising lithographic approach at nanometre scale. Here, we present two approaches to optimize the oxidation for nanofabrication purposes: (i) we analyse the reproducibility ...

934. Optical Linewidth Models - Then and Now
Topic: Manufacturing
Published: 3/1/1999
Authors: Robert D. Larrabee, Richard M Silver, M P Davidson
Abstract: In the late 1970's Dr. Diana Nyyssonen demonstrated that the National Institute of Standards and Technology (NIST) could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright ...

935. A Constrained Monte Carlo Simulation Method for the Calculation of CMM Measurement Uncertainty
Topic: Manufacturing
Published: 1/1/1999
Authors: Steven David Phillips, Bruce R. Borchardt, Daniel S Sawyer, William Tyler Estler, K Eberhardt, M Levenson, Marjorie A McClain, Ted Hopp
Abstract: We describe a Monte Carlo simulation technique where known information about a metrology system is employed as a constraint to distinguish the errors associated with the instrument under consideration from the set of all possible instrument errors. T ...

936. Algorithms for Calculating Single-Atom Step Heights
Topic: Manufacturing
Published: 1/1/1999
Authors: Joseph Fu, V W. Tsai, R Koning, Ronald G Dixson, Theodore Vincent Vorburger
Abstract: Recently, measuring Si(111) single atomic steps prompted us to investigate the measuring technique. The section technique is the most popular method for measuring the height. By measuring a simulated Si(111) atomic step, we have found it could have a ...

937. Diode Lasers in Length Metrology: Application to Absolute Distance Interferometry
Topic: Manufacturing
Published: 1/1/1999
Authors: Jack A Stone Jr, Lowell P. Howard, Alois Stejskal
Abstract: Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of ...

938. Measurement Uncertainty and Noise in Nanometrology
Topic: Manufacturing
Published: 1/1/1999
Author: James Edward Potzick
Abstract: The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such ...

939. Measurement Uncertainty and Uncorrected Bias
Topic: Manufacturing
Published: 1/1/1999
Authors: Steven David Phillips, K Eberhardt, William Tyler Estler
Abstract: This paper discusses the distinction between measurement uncertainty, measurement errors and their role in the calibration process. The issue of including uncorrected bias is addressed and a method to extend the current ISO Guide to the Expression of ...

940. Modified Field Studies for CSCW Systems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michelle Potts Steves, Jean C. Scholtz
Abstract: We, at the National Institute of Standards and Technology (NIST), are in the process of instituting and assessing collaboration technologies for manufacturing applications. This position paper for the Computer Supported Cooperative Work (CSCW) Evalu ...

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