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Displaying records 941 to 950 of 1000 records.
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941. Optical Linewidth Models - Then and Now
Topic: Manufacturing
Published: 3/1/1999
Authors: Robert D. Larrabee, Richard M Silver, M P Davidson
Abstract: In the late 1970's Dr. Diana Nyyssonen demonstrated that the National Institute of Standards and Technology (NIST) could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright ...

942. A Constrained Monte Carlo Simulation Method for the Calculation of CMM Measurement Uncertainty
Topic: Manufacturing
Published: 1/1/1999
Authors: Steven David Phillips, Bruce R. Borchardt, Daniel S Sawyer, William Tyler Estler, K Eberhardt, M Levenson, Marjorie A McClain, Ted Hopp
Abstract: We describe a Monte Carlo simulation technique where known information about a metrology system is employed as a constraint to distinguish the errors associated with the instrument under consideration from the set of all possible instrument errors. T ...

943. Algorithms for Calculating Single-Atom Step Heights
Topic: Manufacturing
Published: 1/1/1999
Authors: Joseph Fu, V W. Tsai, R Koning, Ronald G Dixson, Theodore Vincent Vorburger
Abstract: Recently, measuring Si(111) single atomic steps prompted us to investigate the measuring technique. The section technique is the most popular method for measuring the height. By measuring a simulated Si(111) atomic step, we have found it could have a ...

944. Diode Lasers in Length Metrology: Application to Absolute Distance Interferometry
Topic: Manufacturing
Published: 1/1/1999
Authors: Jack A Stone Jr., Lowell P. Howard, Alois Stejskal
Abstract: Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of ...

945. Measurement Uncertainty and Noise in Nanometrology
Topic: Manufacturing
Published: 1/1/1999
Author: James Edward Potzick
Abstract: The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such ...

946. Measurement Uncertainty and Uncorrected Bias
Topic: Manufacturing
Published: 1/1/1999
Authors: Steven David Phillips, K Eberhardt, William Tyler Estler
Abstract: This paper discusses the distinction between measurement uncertainty, measurement errors and their role in the calibration process. The issue of including uncorrected bias is addressed and a method to extend the current ISO Guide to the Expression of ...

947. Modified Field Studies for CSCW Systems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michelle Potts Steves, Jean C. Scholtz
Abstract: We, at the National Institute of Standards and Technology (NIST), are in the process of instituting and assessing collaboration technologies for manufacturing applications. This position paper for the Computer Supported Cooperative Work (CSCW) Evalu ...

948. Noise averaging and measurement resolution (or a "little noise is a good thing")
Topic: Manufacturing
Published: 1/1/1999
Author: James Edward Potzick
Abstract: When a continuous quantity is measured with a digital instrument or digitized for further processing, a measurement uncertainty component is incurred from quantization of the continuous variable. This uncertainty can be reduced by oversampling and av ...

949. Radiationless Resonant Raman Scattering at the Ar K Edge
Topic: Manufacturing
Published: 1/1/1999
Authors: Thomas W LeBrun, S H Southworth, G B Armen, M A MacDonald, Y Azuma
Abstract: Partial cross sections for Ar K-LZL3(1 D2)np, n=4 and 5 spectator Auger states excited by x-ray absorption across the K-edge were measured and compared with calculations based on the theory or radiationless resonant Raman scattering. Core relaxation ...

950. Self-Calibration and Error Compensation Using Reference Position Markers
Topic: Manufacturing
Published: 1/1/1999
Author: H Zou
Abstract: In this paper, reference position markers are proposed for self-calibration and error compensation. Self-calibration of x-y motion guides is discussed with a focus on the orthogonality calibration. An algorithm is developed using a closure method and ...

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