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Topic Area: Manufacturing

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941. Patterning on Passivated Semiconductor Surfaces
Topic: Manufacturing
Published: 8/7/1998
Authors: John A. Dagata, E Snow
Abstract: Abstract unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820734

942. NIST Calibration Services for Gas Flow Meters: Piston Prover and Bell Prover Gas Flow Facilities
Series: Special Publication (NIST SP)
Report Number: 250-49
Topic: Manufacturing
Published: 8/1/1998
Authors: John D Wright, G E. Mattingly
Abstract: This document provides a description of the small and medium range gas flow calibration facilities at the National Institute of Standards and Technology (NIST), Fluid Flow Group, as reported in NIST Special Publication 250 for Test Nos. 18010C-18040C ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830588

943. Accuracy and Traceability in Dimensional Measurements
Topic: Manufacturing
Published: 6/1/1998
Author: James Edward Potzick
Abstract: Dimensional measurements of importance to microlithography include feature sizes and feature placement on photomasks and wafers, overlay eccentricities, defect and particle sizes on masks and wafers, and many others. A common element is that the obje ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820907

944. Characterization of On-Wafer Diode Noise Sources
Topic: Manufacturing
Published: 6/1/1998
Authors: James Paul Randa, David K Walker, Lawrence P. Dunleavy, Robert L Billinger, Joseph Paul Rice
Abstract: A set of wafer probeable diode noise source transfer standards are characterized using on-wafer noise temperature methods developed recently at the National Institute of Standards and Technology (NIST). This paper reviews the methods for accurate on ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27897

945. Developing a Method to Determine Linewidth Based on Counting the Atom-Spacings Across a Line
Topic: Manufacturing
Published: 6/1/1998
Authors: Richard M Silver, Carsten P. Jensen, V W. Tsai, Joseph Fu, John S Villarrubia, E Clayton Teague
Abstract: We are developing the instrumentation and prototype samples at NIST to enable the counting of atom-spacings across linewidth features etched in silicon. This is an effort to allow the accurate counting of atom-spacings across a feature in a controlle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820909

946. Measurement of Pitch and Width Samples with the NIST Calibrated Atomic Force Microscope
Topic: Manufacturing
Published: 6/1/1998
Authors: Ronald G Dixson, R Koning, Theodore Vincent Vorburger, Joseph Fu, V W. Tsai
Abstract: Because atomic force microscopes (AFMs) are capable of generating three dimensional images with nanometer level resolution, these instruments are being increasingly used in many industries as tools for dimensional metrology at sub- micrometer length ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820889

947. Strategy for Faster Blind Reconstruction of Tip Geometry for Scanned Probe Microscopy
Topic: Manufacturing
Published: 6/1/1998
Author: John S Villarrubia
Abstract: In scanned probe microscopy, it is necessary to know the tip's geometry in order to correct image distortions due to its finite size. Heretofore, methods have focused upon determining the tip shape by erosion of a tip characterizer of known geometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820919

948. Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology
Topic: Manufacturing
Published: 6/1/1998
Authors: J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
Abstract: The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron micro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823089

949. Inverse Electron Beam Modeling and Metrology Research
Topic: Manufacturing
Published: 4/1/1998
Authors: Michael T Postek, Andras Vladar, J R. Lowney, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821790

950. Simulation and Measurement of Subsurface Features in Scanning Electron Microscopy Metrology
Topic: Manufacturing
Published: 4/1/1998
Authors: J R. Lowney, Michael T Postek, Samuel N Jones, S Mayo, Michael W Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821787



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Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
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  • SP 700-XX: Industrial Measurement Series
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