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You searched on: Topic Area: Manufacturing

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Displaying records 911 to 920 of 1000 records.
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911. Statistical Measure for the Sharpness of the SEM Image
Topic: Manufacturing
Published: 7/1/1997
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...

912. Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects
Topic: Manufacturing
Published: 7/1/1997
Authors: A Thompson, Theodore Vincent Vorburger, J Martin, M E. McKnight, Michael A Galler, R Lipman, Fern Y Hunt
Abstract: This is a conference report on the Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects held at Gaithersburg, MD, May 20, 1996.

913. Inexpensive Digital Imaging?
Topic: Manufacturing
Published: 6/1/1997
Authors: Michael T Postek, Andras Vladar
Abstract: The capture of digital images through the use of a frame grabber provides tremendous advantages to scanning electron microscopy. Accessory frame grabbers can range in price from very inexpensive to several thousand dollars. This work investigates the ...

914. Glass and Dimensional Metrology
Topic: Manufacturing
Published: 4/1/1997
Author: Theodore D Doiron
Abstract: Ordinary glass, even good optical quality glass, will shrink up to 20 micrometers/meter over the first few years after its manufacture. Gages made of glass are therefore not suitable as high accuracy artifacts unless they are calibrated often. Better ...

915. High-Speed Grinding - Fundamentals and State of the Art in Europe, Japan, and the USA
Topic: Manufacturing
Published: 4/1/1997
Authors: F Klocke, E Brinksmeier, Christopher J. Evans, T Howes, I Inasaki, E Minke, H Tonshoff, J A Webster, D Stuff
Abstract: This paper describes the technological basis and the current state of the art in the field of high speed grinding. The technological fundamentals of high speed grinding are first of all presented on the basis of the kinematics of the chip-forming pr ...

916. Performance Analysis Tool for Scanning Electron Microscopes Used in Semiconductor Metrology
Topic: Manufacturing
Published: 4/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: Scanning electron microscopes (SEM) are being utilized extensively in the production environment, and these instruments are approaching full automation. Once a human operator is no longer monitoring the instrument''s performance and multiple instrume ...

917. Discussion of Statistical Issues in Geometric Feature Inspection Using Coordinate Measuring Machines
Topic: Manufacturing
Published: 2/1/1997
Authors: Steven David Phillips, K Eberhardt
Abstract: A coordinate measuring machine (CMM) is a computer controlled device that uses a probe to obtain measurements on a manufactured part''s surface, usually one point at a time. Probe movements may be programmed or determined manually by operatio ...

918. Photomask Metrology in the Era of Neolithography
Topic: Manufacturing
Published: 2/1/1997
Author: James Edward Potzick
Abstract: The appearance of smaller photomask feature sizes, high density patterns, and optical enhancements such as phase shifters and OPC features, and the increasing importance of subresolution mask characteristics, can render traditional mask metrology tec ...

919. A Differential Wavelength Meter for Laser Tuning
Topic: Manufacturing
Published: 1/1/1997
Authors: Lowell P. Howard, Jack A Stone Jr.
Abstract: A simple interferometer for matching the wavelengths of tunable lasers is described. Our interferometer uses the angular dispersion of a diffraction grating at the Littrow angle to produce a tilted wavefront with respect to a reference mirror in an o ...

920. Antireflecting-Chromium Linewidth Standard, SRM 473, for Calibration of Optical Microscope Linewidth Measuring System
Series: Technical Note (NIST TN)
Report Number: 260
Topic: Manufacturing
Published: 1/1/1997
Author: James Edward Potzick
Abstract: This document describes the physical characteristics of Standard Reference Material SRM 473, provides instructions for its use in calibrating optical photomask linewidth measuring systems, and gives information and precautions concerning its care and ...

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