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You searched on: Topic Area: Manufacturing

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Displaying records 911 to 920 of 1000 records.
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911. A Distribution-Independent Bound on the Level of Confidence in the Result of a Measurement
Topic: Manufacturing
Published: 9/1/1997
Author: William Tyler Estler
Abstract: The Bienaym?-Chebyshev Inequality provides a quantitative bound on the level of confidence of a measurement with known combined standard uncertainty and assumed coverage factor. The result is independent of the detailed nature of the probability dist ...

912. Accurate Force Measurements for Miniature Mechanical Systems: A Review of Progress
Topic: Manufacturing
Published: 9/1/1997
Authors: Lowell P. Howard, Joseph Fu
Abstract: A survey of nanonewton force calibration techniques suitable for micro-electromechanical systems (MEMS) is presented. The reviewed techniques include: mass-derived force, pendulums, calibrated master spings, resonance and electromagnetic techniques. ...

913. Evaluation of Scanning Maxwell-Stress Microscopy for SPM-Based Nanoelectronics
Topic: Manufacturing
Published: 9/1/1997
Author: John A Dagata
Abstract: A preliminary evaluation of the compatibility, spatial resolution, and sensitivity of scanning Maxwell-stress microscopy (SMM) as an in situ diagnostic technique for SPM oxidation of silicon is presented. These results indicate that SMM will provide ...

914. Guidelines for Expressing the Uncertainty of Measurement Results Containing Uncorrected Bias
Topic: Manufacturing
Published: 9/1/1997
Authors: Steven David Phillips, K Eberhardt, B Parry
Abstract: This paper proposes a method to extend the current ISO Guide to the Expression of Uncertainty in Measurement to include the case of known, but uncorrected, measurement bias. It is strongly recommended that measurement results be corrected for bias, h ...

915. Potentials for Inspection and Metrology of MEMS Using a Combined Scanning Electron Microscope (SEM) and Proximal Probe Microscope (PPM)
Topic: Manufacturing
Published: 9/1/1997
Author: Michael T Postek
Abstract: The potentials afforded by the incorporation of a commercial proximal probe microscope (PPM) into a high resolution field emission scanning electron microscope (SEM) are substantial for MEMS inspection and metrology. An instrument of this type is cur ...

916. Scattering From Sinusoidal Gratings
Topic: Manufacturing
Published: 9/1/1997
Authors: B C. Park, Theodore Vincent Vorburger, Thomas Avery Germer, Egon Marx
Abstract: Laser light scattering from holographic sinusoidal gratings has been investigated with a view to its use in the calibration of the linearity of BRDF instruments, a task that requires a wide dynamic range in the scattered intensity. An aluminum-coated ...

917. Uncertainty Estimation for Multiposition Form Error Metrology
Topic: Manufacturing
Published: 9/1/1997
Authors: William Tyler Estler, Christopher J. Evans, Lianzhen Shao
Abstract: We analyze a general multiposition comparator measurement procedure that leads to partial removal of artifact error for a class of problems including roundness metrology, measurement of radial error motions of precision spindles, and figure error met ...

918. Blind Estimation of Tip Geometry in Scanned Probe Microscopy
Topic: Manufacturing
Published: 8/1/1997
Author: John S Villarrubia
Abstract: Broadening of surface protrusions is a well-known imaging artifact in scanned probe microscope topographs. Blind reconstruction is a method for estimating the tip shape from the image of a tip characterizer, without independent knowledge of the chara ...

919. A Method to Characterize Overlay Tool Misalignments and Distortions
Topic: Manufacturing
Published: 7/1/1997
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Christopher J. Evans, Michael L McGlauflin, Edward A Kornegay, Robert D. Larrabee
Abstract: A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. ...

920. Algorithm for Scanned Probe Microscope Image Simulation, Surface Reconstruction, and Tip Estimation
Series: Journal of Research (NIST JRES)
Topic: Manufacturing
Published: 7/1/1997
Author: John S Villarrubia

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