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Displaying records 911 to 920 of 1000 records.
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911. Optical Overlay Metrology at NIST
Topic: Manufacturing
Published: 1/1/1996
Authors: Richard M Silver, Amy Singer, L Carroll, S Berg-cross, James Edward Potzick
Abstract: Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820818

912. Progress Towards Accurate Metrology Using Atomic Force Microscopy
Topic: Manufacturing
Published: 1/1/1996
Authors: T Mcwaid, J Schneir, John S Villarrubia, Ronald G Dixson, V W. Tsai
Abstract: Accurate metrology using atomic force microscopy (AFM) requires accurate control of the tip position, an estimate of the tip geometry, and an understanding of the tip-surface interaction forces. We describe recent progress at NIST towards accurate AF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820798

913. Quest for a Recurrence Relation for Xn
Topic: Manufacturing
Published: 1/1/1996
Author: Amy Singer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820819

914. Relativistic Covariance and the Interpretation of Quantum Mechanics
Topic: Manufacturing
Published: 1/1/1996
Author: Egon Marx
Abstract: The standard interpretation of quantum mechanics is revised to conform to the relativistic theory based on the many-amplitudes formalism for the N-particle system. The wave function acquires a significance closer to that of the electromagnetic field, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820797

915. SEM Image Sharpness Analysis
Topic: Manufacturing
Published: 1/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: The technique described here, utilizing the sharpness concept, is facilitated by the use of the FFT techniques to analyze the electron micrograph to obtain the evaluation. This is not the first application of Fourier techniques to SEM images, but it ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820808

916. Self-Calibration: Reversal, Redundancy, Error Separation, and "Absolute Testing"
Topic: Manufacturing
Published: 1/1/1996
Authors: Christopher J. Evans, R Hocken, William Tyler Estler
Abstract: Over the years many techniques have been developed for accurate measurement of part features without reference to an externally calibrated artifact. This paper presents a partial survey of such methods for dimensional metrology, their ranges of appli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820791

917. Standard Grade Rockwell Diamond Indenters - A Key to a Worldwide Unified Rockwell Hardness Scale
Topic: Manufacturing
Published: 1/1/1996
Authors: Jun-Feng Song, Samuel Rea Low III, David J Pitchure, Theodore Vincent Vorburger
Abstract: Since the 1980's, the European Community (EC) has established a unified Rockwell C hardness (HRC) scale by averaging several national scales, which come from each country''s national hardness machines and diamond indenters. These indenter ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820820

918. Standard Grade Rockwell Diamond Indenters - A Key to a Worldwide Unified Rockwell Hardness Scale (in Japanese)
Topic: Manufacturing
Published: 1/1/1996
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: Since the 1980''s, the European Community (EC) has established a unified Rockwell C hardness (HRC) scale by averaging several national scales, which come from each country''s national hardness machines and diamond indenters. These ind ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820997

919. Static Structural Analysis of a Reconfigurable Rigid Platform Supported by Elastic Legs
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5885
Topic: Manufacturing
Published: 1/1/1996
Author: F Rudder
Abstract: This report describes a static structural analysis of a rigid planar platform supported by elastic legs. The platform deformations are computed relative to a specified platform position and orientation. The analysis considers deformation due to stati ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820815

920. Statistical Models for Estimating the Measurement of Pitch in Metrology Instruments
Topic: Manufacturing
Published: 1/1/1996
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee
Abstract: The measurement of pitch in metrology instruments is through to be a benign self-compensating function. In the course of issuing the new scanning electron microscope standard SRM 2090, a new algorithm for the measurement of pitch was developed. This ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820885



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