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Topic Area: Manufacturing

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911. Dimensional Metrology with the NIST Calibrated Atomic Force Microscope
Topic: Manufacturing
Published: 6/1/1999
Authors: Ronald G Dixson, R Koning, V W. Tsai, Joseph Fu, Theodore Vincent Vorburger
Abstract: Atomic force microscopes (AFMs) are increasingly used in the semiconductor industry as tools for submicrometer dimensional metrology. The scales of an AFM must be calibrated in order to perform accurate measurements. We have designed and developed th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820926

912. Focus and Edge Detection Algorithms and Their Relevance to the Development of an Optical Overlay Calibration Standard
Topic: Manufacturing
Published: 6/1/1999
Authors: S Fox, M Dagenais, Edward A Kornegay, Richard M Silver
Abstract: We present results of investigations into optical focus and edge detection algorithms relevant to overlay metrology. We compare gradient energy, standard deviation, contrast and summed intensity of acquired images as focus metrics for bright-field, s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820929

913. Intercomparison of SEM, AFM, and Electrical Linewidths
Topic: Manufacturing
Published: 6/1/1999
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell
Abstract: Uncertainty in the locations of line edges dominates the uncertainty budget for high quality sub-micrometer linewidth measurements. For microscopic techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM), the image of the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820954

914. Measurement Traceability to NIST Standard Rockwell Diamond Indenters
Topic: Manufacturing
Published: 6/1/1999
Author: Jun-Feng Song
Abstract: A metrology-based Rockwell hardness scale is established by a standard machine and a standard diamond indenter. Both must be established through force and dimensional metrology with acceptably small measurement uncertainties. In 1994, NIST developed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820949

915. Measurement Uncertainity and Noise in Nanometrology
Topic: Manufacturing
Published: 6/1/1999
Author: James Edward Potzick
Abstract: The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823119

916. Modeling and Experimental Aspects of Apparent Beam Width as an Edge Resolution Measure
Topic: Manufacturing
Published: 6/1/1999
Authors: C Archie, J R. Lowney, Michael T Postek
Abstract: The SEMATECH advanced metrology advisory group (AMAG) recently issued a critical dimension (CD) scanning electron microscope (SEM) specification. One component of this specification was the measurement of the apparent beam width (ABW). The edge width ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820923

917. Optical Linewidth Models: Then and Now
Topic: Manufacturing
Published: 6/1/1999
Authors: Robert D. Larrabee, Richard M Silver, M P Davidson
Abstract: In the late 1970's, Dr. Diana Nyyssonen demonstrated that NIST could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright-field microscope. She equated the known position of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820934

918. Telepresence:  A New Paradigm for Industrial and Scientific Collaboration
Topic: Manufacturing
Published: 6/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: A portion of the mission of the National Institute of Standards and Technology (NIST) Manufacturing Engineering Laboratory (MEL) is to improve and advance length metrology in aid of U.S. industry.  The successful development of a Collaboratory f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823114

919. Telepresence: A New Paradigm for Industrial and Scientific Collaboration
Topic: Manufacturing
Published: 6/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: The successful development of a collaboratory for Telepresence Microscopy (TPM) provides an important new tool to promote technology transfer in the areas of measurement technology. NIST and Texas Instruments (TI), under the auspices of the National ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820945

920. Toward Nanometer Accuracy Measurements
Topic: Manufacturing
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820933



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