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Displaying records 901 to 910 of 1000 records.
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901. Thermal and Flammability Properties of a Silica-Pmma Nanocomposite
Topic: Manufacturing
Published: 1/1/2000
Authors: Abby W. Morgan, Joseph M Antonucci, Mark R VanLandingham, R H Harris, Takashi Kashiwagi
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853638

902. X-ray Scattering and Fluorescence From Atoms and Molecules
Topic: Manufacturing
Published: 1/1/2000
Authors: S H Southworth, L Young, E P Kanter, Thomas W LeBrun
Abstract: Fundamental understanding of x-ray interactions with atoms and molecules provides a basis for applying x-ray methods to complex materials, such as structural determinations by x-ray diffraction and extended x-ray absorption fine structure. Compton sc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820950

903. Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing
Topic: Manufacturing
Published: 12/14/1999
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about January 15, 1999, researchers at the National Institute of Standards and Technology (NIST) received partial support from ISEMATECH to collaborate in a mutually defined program designated 1998-1999 NIST/ISEMATECH Collaboration fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823124

904. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Topic: Manufacturing
Published: 12/1/1999
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820939

905. On-Wafer Measurements of Noise Temperature
Topic: Manufacturing
Published: 12/1/1999
Authors: James Paul Randa, Robert L Billinger, Joseph Paul Rice
Abstract: The NIST Noise Project has developed the theoretical formalism and experimental methods for performing accurate noise-temperature measurements on wafer. This report summarizes the theoretical formulation and describes the design, methods, and results ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27649

906. A General Quantitative Method to Validate Instrument Calibration Techniques
Topic: Manufacturing
Published: 11/1/1999
Author: Steven David Phillips
Abstract: In this paper a method to validate proposed calibration procedures for coordinate measuring machines (CMMs) is presented. Conceptually, the validation procedure is based on a computer generated population of CMMs assumed to include any real CMM that ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820940

907. Grating Pitch Measurements With the Molecular Measuring Machine
Topic: Manufacturing
Published: 11/1/1999
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820932

908. Step Height Metrology for Data Storage Applications
Topic: Manufacturing
Published: 11/1/1999
Authors: R Koning, Ronald G Dixson, Joseph Fu, Thomas B Renegar, Theodore Vincent Vorburger, V W. Tsai, Michael T Postek
Abstract: The measurements of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) are quite different from the measurement of step heights on step height calibration standards.  Both the bumps and the pits show much large ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823118

909. Step-height Metrology for Data Storage Applications
Topic: Manufacturing
Published: 11/1/1999
Authors: R Koning, Ronald G Dixson, Joseph Fu, Thomas B Renegar, Theodore Vincent Vorburger, V W. Tsai, Michael T Postek
Abstract: The measurement of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) is quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820931

910. Absolute Distance Interferometry with a 670-nm External Cavity Diode Laser
Topic: Manufacturing
Published: 10/1/1999
Authors: Jack A Stone Jr., Alois Stejskal, Lowell P. Howard
Abstract: Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820952



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