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You searched on: Topic Area: Manufacturing

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Displaying records 901 to 910 of 1000 records.
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901. Uncertainty Estimation for Multiposition Form Error Metrology
Topic: Manufacturing
Published: 9/1/1997
Authors: William Tyler Estler, Christopher J. Evans, Lianzhen Shao
Abstract: We analyze a general multiposition comparator measurement procedure that leads to partial removal of artifact error for a class of problems including roundness metrology, measurement of radial error motions of precision spindles, and figure error met ...

902. Blind Estimation of Tip Geometry in Scanned Probe Microscopy
Topic: Manufacturing
Published: 8/1/1997
Author: John S Villarrubia
Abstract: Broadening of surface protrusions is a well-known imaging artifact in scanned probe microscope topographs. Blind reconstruction is a method for estimating the tip shape from the image of a tip characterizer, without independent knowledge of the chara ...

903. A Method to Characterize Overlay Tool Misalignments and Distortions
Topic: Manufacturing
Published: 7/1/1997
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Christopher J. Evans, Michael L McGlauflin, Edward A Kornegay, Robert D. Larrabee
Abstract: A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. ...

904. Algorithm for Scanned Probe Microscope Image Simulation, Surface Reconstruction, and Tip Estimation
Series: Journal of Research (NIST JRES)
Topic: Manufacturing
Published: 7/1/1997
Author: John S Villarrubia

905. Algorithms for Scanned Probe Microscope Image Simulation, Surface Reconstruction, and Tip Estimation
Topic: Manufacturing
Published: 7/1/1997
Author: John S Villarrubia
Abstract: To the extent that tips are not perfectly sharp, images produced by scanned probe microscopies (SPM) such as atomic force microscopy and scanning tunneling microscopy are only approximations of the specimen surface. Tip-induced distortions are signif ...

906. Conference Report: Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects, Gaithersburg, MD, May 20, 1996
Topic: Manufacturing
Published: 7/1/1997
Authors: M E. McKnight, J Martin, Michael A Galler, Fern Y Hunt, R Lipman, Theodore Vincent Vorburger, A Thompson
Abstract: To help NIST researchers better understand industry''s needs, four NIST laboratories held a Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects on May 20, 1996. The four NIST laboratories are Building and Fire Resear ...

907. Dimensional Metrology at the Nanometer Level: Combined SEM and PPM
Topic: Manufacturing
Published: 7/1/1997
Authors: Michael T Postek, H Ho, L Harrison
Abstract: The National Institute of Standards and Technology (NIST) is currently exploring the potentials afforded by the incorporation of a commercial proximal probe microscope (PPM) operating in the scanning tunneling or atomic force mode into a high resolut ...

908. Fourier Transform Feedback for Scanning Electron Microscopes Used in Semiconductor Metrology
Topic: Manufacturing
Published: 7/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: The utility of the sharpness concept for use on metrology scanning electron microscopes (SEM) as implemented through the Fourier transform technique has been clearly demonstrated and documented. The original methods for sharpness analysis were labor- ...

909. Practical Aspects of Touch Trigger Probe Error Compensation
Topic: Manufacturing
Published: 7/1/1997
Authors: William Tyler Estler, Steven David Phillips, Bruce R. Borchardt, Ted Hopp, M Levenson, K Eberhardt, Marjorie A McClain
Abstract: We present extensions of our prior work in modeling and correcting for pretravel variation errors in kinematic seat touch-trigger coordinate measuring machine (CMM) probes with straight styli. A simple correction term is shown to account for a range ...

910. Statistical Measure for the Sharpness of the SEM Image
Topic: Manufacturing
Published: 7/1/1997
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...

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