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Topic Area: Manufacturing

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901. Step-height Metrology for Data Storage Applications
Topic: Manufacturing
Published: 11/1/1999
Authors: R Koning, Ronald G Dixson, Joseph Fu, Thomas B Renegar, Theodore Vincent Vorburger, V W. Tsai, Michael T Postek
Abstract: The measurement of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) is quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transi ...

902. Absolute Distance Interferometry with a 670-nm External Cavity Diode Laser
Topic: Manufacturing
Published: 10/1/1999
Authors: Jack A Stone Jr, Alois Stejskal, Lowell P. Howard
Abstract: Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of ...

903. Absolute Interferometry With a 670 nm External Cavity Diode Laser
Topic: Manufacturing
Published: 10/1/1999
Authors: Jack A Stone Jr, Alois Stejskal, Lowell P. Howard
Abstract: In the last few years there has been much interest in the use of tunable diode lasers for absolute interferometry. Here we report on the use of an external cavity diode laser operating in the visible ({lambda}{approximately} 670 nm) for absolute dis ...

904. NORAMET Comparison of Gauge Block Measurement by Optical Interferometry
Topic: Manufacturing
Published: 10/1/1999
Authors: Jennifer Decker, A Lapointe, John Richard Stoup, M V Alonso, J R Pekelsky
Abstract: A varied assortment of 47 new and used steel, ceramic, chromium carbide and tungsten carbide gauge blocks from 9 manufacturers, ranging in length from 05. mm to 101.6  mm were calibrated by four laboratories from the NORAMET countries using the ...

905. Summaries of the Programs of the Manufacturing Engineering Laboratory 1999
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6369
Topic: Manufacturing
Published: 8/2/1999
Authors: Lisa Jean Fronczek, Bessmarie A. Young
Abstract: The National Institute of Standards and Technology's Manufacturing Engineering Laboratory (MEL) works with the U.S. manufacturing industry to develop and apply infrastructural technology, measurements, and standards to meet their needs. This report c ...

906. Measurement as Inference: Fundamental Ideas
Topic: Manufacturing
Published: 8/1/1999
Author: William Tyler Estler
Abstract: We review the logical basis of inference as distinct from deduction, and show that measurements in general, and dimensional metrology in particular, are best viewed as exercises in probable inference: reasoning from incomplete information. The resul ...

907. The NIST Length Scale Interferometer
Series: Journal of Research (NIST JRES)
Topic: Manufacturing
Published: 7/23/1999
Authors: John S Beers, William B. Penzes
Abstract: The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar t ...

908. Effects of Defocus and Algorithm on Optical Step Height Calibration
Topic: Manufacturing
Published: 7/1/1999
Authors: Theodore D Doiron, Theodore Vincent Vorburger, P Sullivan
Abstract: Defocus effects on step height measurements by interferometric microscopy are estimated using different algorithms to calculate the step height. The interferometric microscope is a Mirau-type with a 20x objective and a numerical aperture (NA) of 0.4. ...

909. Extensions of the Single-Integral-Equation Method
Topic: Manufacturing
Published: 7/1/1999
Author: Egon Marx
Abstract: Scattering of electromagnetic waves by homogeneous dielectric or finitely conducting bodies can be reduced to the solution of integral equations. In the simpler cases, only a single-integral-equation is needed, with no increase of required memory ove ...

910. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Topic: Manufacturing
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...

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