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991. Toward Accurate Linewidth Metrology Using Atomic Force Microscopy and Tip Characterization
Topic: Manufacturing
Published: 5/1/1996
Authors: Ronald G Dixson, J Schneir, T Mcwaid, N. Sullivan, V W. Tsai, S Zaidi, S Brueck
Abstract: As the critical dimensions of integrated circuit features decrease toward 0.18 um, feature width measurements with nanometer level accuracy will become increasingly important to the semiconductor processing industry. Atomic force microscopy (AFM) off ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820788

992. Models for Relating Scanning Electron Microscopy Images to Measured Artifacts
Topic: Manufacturing
Published: 4/1/1996
Authors: Michael T Postek, Andras Vladar, J R. Lowney
Abstract: A specific example of a technique we developed to enhance the information obtained from SEM images is the extraction of an approximate profile corresponding to an electron beam with zero beam diameter from one with a finite beam diameter. Results wer ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820810

993. Scanned Probe Microscope Tip Characterization Without Calibrated Tip Characterizers
Topic: Manufacturing
Published: 3/1/1996
Author: John S Villarrubia
Abstract: In scanned probe microscopy the image is a combination of information from the sample and the tip. In order to reconstruct the true surface geometry, it is necessary to know the actual tip shape. It has been proposed that this shape may be reconstruc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820829

994. Test Optics Error Removal
Topic: Manufacturing
Published: 3/1/1996
Authors: Christopher J. Evans, R Kestner
Abstract: Wave-front or surface errors may be divided into rotationally symmetric and nonrotationally symmetric terms. It is shown that if either the test part or the reference surface in an interferometric test is rotated to N equally spaced positions about t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820792

995. Chemical Aspects of Tool Wear in Single Point Diamond Turning
Topic: Manufacturing
Published: 1/1/1996
Authors: E W Paul, Christopher J. Evans, A Mangamelli, Michael L McGlauflin, Robert S. Polvani
Abstract: A hypothesis is proposed that ascribes chemical wear of diamond tools to the presence of unpaired d electrons in the sample being machined. This hypothesis is used to explain a range of results for metals, alloys, and other materials including electr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820801

996. Digital Imaging for Scanning Electron Microscopy
Topic: Manufacturing
Published: 1/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: The development and application of digital imaging technology has been one of the major advancements in scanning electron microscopy (SEM) during the past several years. This digital revolution has been brought about by significant progress in semico ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820807

997. Dynamic Measurement of Shear Band Formation in Precision Hard-Turning
Topic: Manufacturing
Published: 1/1/1996
Authors: Matthew A. Davies, Steven Earl Fick, Christopher J. Evans
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820787

998. Fabry-Perot Interferometers for Small Displacement Measurements
Topic: Manufacturing
Published: 1/1/1996
Authors: Lowell P. Howard, Fredric Scire, Jack A Stone Jr
Abstract: A description of a Fabry-Perot interferometer for measuring small displacements is given. The instruments consists of a fiber-optic-coupled actuator and mirror guiding mechanisms, a tunable diode laser for tracking the changes in cavity length and a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820794

999. Height Calibration of Atomic Force Microscopes Using Silicon Atomic Step Artifacts
Topic: Manufacturing
Published: 1/1/1996
Authors: V W. Tsai, Theodore Vincent Vorburger, P Sullivan, Ronald G Dixson, Richard M Silver, Edwin Ross Williams, J Schneir
Abstract: The decreasing feature dimensions required in the semiconductor manufacturing industry are placing ever increasing demands upon metrology instruments. Atomic force microscopes (AFMs), which can have ~1 nm lateral resolution and sub-angstrom vertical ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820827

1000. Integral Equation for Scattering by a Rough Surface
Topic: Manufacturing
Published: 1/1/1996
Author: Egon Marx
Abstract: An equation for an unknown surface field that represents scattering by a rough patch on a flat dielectric surface is presented. The geometrical considerations for this particular problem are discussed, especially in relation to a surface divergence f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820796