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Displaying records 991 to 1000.
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991. Understanding Scanned Probe Oxidation of Silicon
Topic: Manufacturing
Published: 1/1/1998
Authors: John A. Dagata, T Inoue, J Itoh, H Yokoyama
Abstract: A model for scanned probe microscope (SPM) silicon oxidation is presented. The model was derived from a consideration of the space-charge dependence of this solid-state reaction as a function of substrate doping type/level and has been verified exper ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821775

992. Vibration of a Room-Sized Airspring-Supported Slab
Topic: Manufacturing
Published: 1/1/1998
Authors: H Amick, B Sennewald, N C Pardue, E Clayton Teague, Brian R Scace
Abstract: This paper reports the results of the finite element analysis and in situ testing of a large-scale (4 m x 10 m) pneumatically isolated concrete slab. The slab was constructed as a design prototype for next-generation metrology laboratories at the Nat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820887

993. Voltage Modulation Scanned Probe Oxidation (Abstract)
Topic: Manufacturing
Published: 1/1/1998
Authors: John A. Dagata, T Inoue, J Itoh, K Matsumoto, H Yokoyama
Abstract: This talk describes methods for enhancing the growth rate and electrical characteristics of nanostructures produced on silicon and titanium substrates by scanned probe microscope (SPM) oxidation. Direct oxidation of a substrate by the intense electr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823101

994. Application of Transmission Electron Detection to SCALPEL Mask Metrology
Topic: Manufacturing
Published: 11/1/1997
Authors: R Farrow, Michael T Postek, William J. Keery, Samuel N Jones, J R. Lowney, M Blakey, L Fetter, J Griffith, J E Liddle, L C Hopkins, H A Huggins, M Peabody,, A Novembre
Abstract: Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820894

995. Application of Trasmission Electron Detection to Scalpel Mask Metrology
Topic: Manufacturing
Published: 11/1/1997
Authors: R Farrow, Michael T Postek, William J. Keery, Samuel N Jones, J R. Lowney, M Blakey, L Fetter, A Liddle, L C Hopkins, H A Huggins, M Peabody, A Novembre, J Griffith
Abstract: Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823090

996. Applications of the Rapidly Renewable Lap
Topic: Manufacturing
Published: 11/1/1997
Authors: R E. Parks, E Robert, Christopher J. Evans, David J Roderick, J David, John A. Dagata
Abstract: The rapidly renewable lap is based on the simple concept of generating the figure needed in a lap substrate and then replicating it into a thin film slumped over the substrate. Based on this concept, we describe how efficient laps can be constructed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821593

997. Measurements of the LIGO Pathfinder Optics
Topic: Manufacturing
Published: 11/1/1997
Authors: R E. Parks, Christopher J. Evans, P Sullivan, Lianzhen Shao, B Loucks
Abstract: A number of 150 mm apertures in 250 mm diameter plano-concave optics with figure errors of a few nm were carefully tested using phase measuring interferometry and the data reduced using pixel based absolute testing techniques. We discuss some of the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820856

998. Metrology of Scattering with Angular Limitation Projection Electron Lithography Masks
Topic: Manufacturing
Published: 11/1/1997
Authors: J E Liddle, M Blakey, T Saunders, R Farrow, L Fetter, C Kneurek, R Kasica, et al, M Peabody,, Shannon L Takach, D L Windt, Michael T Postek
Abstract: Mask metrology is a vital part of any lithographic technology, both for control of the mask patterning process and also for ensuring that the contribution of the mask to the system error budget is within acceptable limits. For design rules of 0.13 ?m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820850

999. Uncertainty and Dimensional Calibrations
Topic: Manufacturing
Published: 11/1/1997
Authors: Theodore D Doiron, John Richard Stoup
Abstract: The calculation of uncertainty for a measurement is an effort to set reasonable bounds for the measurement result according to standardized rules. Since every measurement produces only an estimate of the answer, the primary requisite of an uncertaint ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820840

1000. Interim Report, NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing
Topic: Manufacturing
Published: 10/31/1997
Author: Michael T Postek
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820859



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