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Topic Area: Optical Metrology
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Displaying records 31 to 40 of 117 records.
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31. Deformation-Free Form Error Measurements of Thin, Plane-Parallel Optics Floated on a Heavy Liquid
Topic: Optical Metrology
Published: 4/1/2010
Authors: JiYoung Chu, Ulf Griesmann, Quandou Wang, Johannes A Soons, Eric C Benck
Abstract: We describe a novel method for measuring the unconstrained flatness error of thin, plane parallel precision optics by floating them on high-density aqueous metatungstate solutions while measuring the flatness error with an interferometer. The supp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904728

32. Design, Construction, and Testing of a New High Accuracy Spectrophotometer
Series: Technical Note (NIST TN)
Report Number: 729
Topic: Optical Metrology
Published: 6/1/1972
Authors: Klaus Mielenz, K Eckerle
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620034

33. Dimensional Analysis of Through Silicon Vias Using the TSOM Method
Topic: Optical Metrology
Published: 7/12/2011
Authors: Ravikiran Attota, Andrew Rudack
Abstract: There is a great need for accurate, truly-3D metrology solutions that can be used for analysis of high aspect ratio features such as through-silicon-vias (TSVs). Through-focus scanning optical microscopy (TSOM) is an optical metrology method that pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909226

34. Dual frequency combs at 3.4 µm with subhertz residual linewidths
Topic: Optical Metrology
Published: 5/1/2010
Authors: Esther Baumann, Fabrizio Raphael Giorgetta, Ian R Coddington, William C Swann, Nathan Reynolds Newbury
Abstract: Two coherent 1.5-µm frequency combs are transferred to 3.4 µm by difference frequency generation with a 1064 nm cw laser. From a multi-heterodyne measurement, the residual linewidth between the comb teeth is resolution-limited at 200 mHz.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904566

35. Dual-CGH Interferometry Test for X-Ray Mirror Mandrels
Topic: Optical Metrology
Published: 6/15/2008
Authors: Guangjun Gao, John Lehan, Ulf Griesmann
Abstract: We describe a glancing-incidence interferometric double-pass test, based on a pair of computer generated holograms (CGHs), for mandrels used to fabricate x-ray mirrors for space-based x-ray telescopes. The design of the test and its realization are d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902515

36. Dual-comb-based characterization of rapidly tuned lasers
Topic: Optical Metrology
Published: 10/10/2011
Authors: Fabrizio Raphael Giorgetta, Esther Baumann, Ian R Coddington, William C Swann, Nathan Reynolds Newbury, Zeb W Barber, Peter Roos
Abstract: We demonstrate a technique to calibrate the instantaneous frequency versus time from a rapidly tuned cw laser. Our dual-comb-based spectrometer can measure optical waveforms tuned at 1500-THz/s rates over 5-THz bandwidths at high precision.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908712

37. Effect of Dissolved Air on the Density and Refractive Index of Water
Topic: Optical Metrology
Published: 9/30/2005
Authors: Allan H Harvey, Simon G. Kaplan, John H. Burnett
Abstract: We consider the effect of dissolved air on the density and the refractive index of liquid water from 0 ¿aC to 50 ¿aC. The density effect is calculated from the best available values of Henry's constants and partial molar volumes for the components of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50167

38. Effects of Roughness on Scatterometry Signatures
Topic: Optical Metrology
Published: 5/26/2011
Authors: Martin Foldyna, Thomas Avery Germer, Brent Bergner
Abstract: We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configuratio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908805

39. Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Optical Metrology
Published: 4/10/2013
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913542

40. Enhancing Image Contrast Using Coherent States and Photon Number Resolving Detectors
Topic: Optical Metrology
Published: 3/15/2010
Authors: Aaron Pearlman, Alexander E. Ling, Elizabeth Anne Goldschmidt, Jingyun Fan, Christoph Wildfeuer, Alan L Migdall
Abstract: We experimentally map the transverse profile of diffraction-limited beams using photon number resolving detectors. We observe strong compression of diffracted beam profiles for high detected photon number. This effect leads to higher contrast than ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904224



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