NIST logo

Publications Portal

You searched on: Topic Area: Optical Metrology Sorted by: title

Displaying records 31 to 40 of 64 records.
Resort by: Date / Title


31. MEMS optomechanical accelerometry standards
Topic: Optical Metrology
Published: 7/8/2015
Authors: Felipe Guzman, Yiliang Bao, Jason John Gorman, John Russell Lawall, Jacob M Taylor, Thomas W LeBrun
Abstract: Current acceleration primary standards reach relative uncertainties of the order of 0.001 and consist of complex test facilities, typically operated at National Metrology Institutes. Our research focuses on the development of silicon mechanical os ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918899

32. Measurement of the Gold-Gold Bond Rupture Force at 4 K in a Single-Atom Chain Using Photon-Momentum-Based Force Calibration
Topic: Optical Metrology
Published: 12/22/2014
Authors: Douglas T Smith, Jon Robert Pratt
Abstract: We present instrumentation and methodology for simultaneously measuring force and displacement at the atomic scale at 4 K. The technique, which uses a macroscopic cantilever as a force sensor and high-resolution, high-stability fiber-optic interfero ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909684

33. Measuring Single-Walled Carbon Nanotube Length Distributions from Diffusional Trajectories
Topic: Optical Metrology
Published: 8/27/2012
Authors: Jason Streit, Sergei M Bachilo, Anton V Naumov, Constantine Y. Khripin, Ming Zheng, R Bruce Weisman
Abstract: A new method is demonstrated for measuring the length distributions of dispersed single-walled carbon nanotube (SWCNT) samples by analyzing diffusional motions of many individual nanotubes in parallel. In this method, termed Length Analysis by Na ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911770

34. Metrologia
Topic: Optical Metrology
Published: 7/8/2011
Authors: Uwe Arp, Zhigang Li, Ping-Shine Shaw, Mathias Richter, Roman Klein, Wolfgang Paustian, Reiner Thornagel
Abstract: We report on a successful bilateral inter-comparison between the Physikalisch-Technische Bundesanstalt (PTB) and the National Institute of Standards and Technology (NIST). In both laboratories deuterium lamps were calibrated using the calculability o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907243

35. Microwave generation with low residual phase noise from a femtosecond fiber laser with an intracavity electro-optic modulator
Topic: Optical Metrology
Published: 11/14/2011
Authors: William C Swann, Esther Baumann, Fabrizio Raphael Giorgetta, Nathan Reynolds Newbury
Abstract: Low phase-noise microwave generation has previously been demonstrated using self-referenced frequency combs to divide down a low noise optical reference. We demonstrate an approach based on a fs Er-fiber laser that avoids the complexity of self-refer ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909568

36. Mode reconstruction of a light field by multi-photon statistics
Topic: Optical Metrology
Published: 7/15/2013
Authors: Elizabeth A Goldschmidt, Fabrizio Piacentini, I. Ruo Berchera, Sergey V Polyakov, Silke Peters, Stefan Kuck, Giorgio Brida, Ivo Pietro Degiovanni, Alan L Migdall, Marco Genovese
Abstract: Knowing the underlying number and structure of occupied modes of a light field plays a crucial role in minimizing loss and decoherence of quantum information. Typically, full characterization of the mode structure involves a series of several separ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913292

37. Monitoring Photothermally Excited Nanoparticles via Multimodal Microscopy
Topic: Optical Metrology
Published: 5/19/2010
Authors: Matthew Lawrence Clarke, Shin G. Chou, Jeeseong Hwang
Abstract: Generation of heat using optically excited nanoparticles can be beneficial or detrimental depending on the application. Therefore, clinically applicable studies are being pursued in an effort to achieve safe practices of nanoparticle-induced hyperth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905276

38. Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture
Topic: Optical Metrology
Published: 4/20/2011
Authors: Thomas Avery Germer, Martin Foldyna, Brent Bergner
Abstract: We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). The unperturbed, reference grating profile was determined from multip ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908372

39. Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization
Topic: Optical Metrology
Published: 10/11/2012
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Francois R. Goasmat, Ronald G Dixson, Richard M Silver
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912169

40. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Topic: Optical Metrology
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series