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Topic Area: Optical Metrology
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Displaying records 1 to 10 of 117 records.
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1. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Topic: Optical Metrology
Published: 3/25/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912961

2. 3-D Optical Metrology of Finite sub-20nm Dense Arrays With sub-nanometer Parametric Uncertainties
Topic: Optical Metrology
Published: 6/23/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: A new approach that involves parametric fitting of 3-D scattered field with electromagnetic simulation, Fourier domain normalization, and uncertainties analysis is presented to rigorously analyze 3-D through-focus optical images of targets that scatt ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913511

3. A New Metrology for Tissue Engineering: Collinear Optical Coherence and Confocal Fluorescence Microscopies
Topic: Optical Metrology
Published: 1/1/2003
Authors: Joy P Dunkers, Marcus T Cicerone, Forrest Andrew Landis, N. R. Washburn
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853913

4. A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate
Topic: Optical Metrology
Published: 6/13/2010
Author: Quandou Wang
Abstract: A simple method to optimize the etching uniformity when making a Computer generated halogram on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE).
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905044

5. A Toolbox for Designing and Analyzing Phase-Shifting Interferometry Algorithms with Characteristic Polynomials
Topic: Optical Metrology
Published: 6/13/2010
Author: Ulf Griesmann
Abstract: Many of the recent advances in understanding of phase-shifting algorithms have yet to be incorporated into the software for commercial phase shifting interferometers. A toolbox, for the open-source computer algebra system Maxima, simplifies analysis ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905043

6. A compact and robust method for full Stokes spectropolarimetry
Topic: Optical Metrology
Published: 8/1/2012
Authors: William Sparks, Thomas Avery Germer, John MacKenty, Frans Snik
Abstract: We present an approach to spectropolarimetry which requires neither moving parts nor time dependent modulation, and which o ers the prospect of achieving high sensitivity. The concept, which is one of those generically known as channeled polarimetry, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911231

7. A modified Roberts-Langenbeck test for measuring thickness and refractive index variation of silicon wafers
Topic: Optical Metrology
Published: 8/17/2012
Authors: Jungjae Park, Lingfeng Chen, Quandou Wang, Ulf Griesmann
Abstract: We describe a method to simultaneously measure thickness variation and refractive index homogeneity of 300 mm diameter silicon wafers using a wavelength shifting Fizeau interferometer operating at 1550 nm. Only three measurements are required, corres ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911565

8. A statistical study of de-embedding applied to eye diagram analysis
Topic: Optical Metrology
Published: 2/1/2012
Authors: Paul D Hale, Jeffrey A Jargon, Chih-Ming Wang, Brett Grossman, Matthew Claudius, Jose Torres, Andrew M Dienstfrey, Dylan F Williams
Abstract: We describe a stable method for calibrating digital waveforms and eye diagrams using the measurement system response function and its regularized inverse. The function describing the system response includes the response of the oscilloscope and any ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907585

9. Absolute Ranging Using Frequency Combs
Topic: Optical Metrology
Published: 5/25/2009
Authors: William C Swann, Ian R Coddington, Nathan Reynolds Newbury
Abstract: We present a technique for measuring absolute range that uses two mismatched frequency combs to measure distance over 1.5 m range with 10 nm level statistical uncertainty.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901110

10. Absolute refractometry of dry gas to {+ or -}3 parts in 10^u9^
Topic: Optical Metrology
Published: 6/20/2011
Authors: Patrick F Egan, Jack A Stone Jr
Abstract: We present a method of measuring the refractive index of dry gases absolutely at 632.8 nm wavelength using a Fabry-Perot cavity with an expanded uncertainty of < 3 {multiply} 10^u-9^ (coverage factor {I}k{/I} = 2. The main contribution to this uncer ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907731



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