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You searched on: Topic Area: Optical Metrology Sorted by: date

Displaying records 21 to 30 of 64 records.
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21. Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Optical Metrology
Published: 4/10/2013
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si ...

22. Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
Topic: Optical Metrology
Published: 4/8/2013
Authors: Paul Lemaillet, Thomas Avery Germer, Regis J Kline, Daniel Franklin Sunday, Chengqing C. Wang, Wen-Li Wu
Abstract: In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopi ...

23. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Topic: Optical Metrology
Published: 3/25/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...

Topic: Optical Metrology
Published: 3/25/2013
Authors: Richard M Silver, Bryan M Barnes, Francois R. Goasmat, Hui Zhou, Martin Y Sohn
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With conventional bright-field and dark- field inspection methods now at their limits, it has b ...

25. Accurate, inexpensive testing of handheld lasers for safe use and operation
Topic: Optical Metrology
Published: 3/7/2013
Authors: Marla L Dowell, Joshua Aram Hadler
Abstract: An accurate, inexpensive test bed for measurements of optical power emitted from handheld lasers is described. Our test bed consists of a thermopile detector, bandpass optical filters, an adjustable iris, and self-centering holders for mounting of th ...

26. Standardization of Broadband UV Measurements
Topic: Optical Metrology
Published: 1/1/2013
Author: George P Eppeldauer
Abstract: The CIE standardized rectangular-shape UV response functions can be realized only with large spectral mismatch errors. The spectral power-distribution of UV sources is not standardized. Accordingly, the readings of different types of UV meters, even ...

27. Adaptive measurements in nonorthogonal state discrimination
Topic: Optical Metrology
Published: 12/18/2012
Authors: Francisco E. Becerra Chavez, Alan L Migdall
Abstract: Adaptive measurements represent important resources in quantum information science and quan- tum technologies. They take advantage of the knowledge of partial measurements of the system to optimize subsequent measurements and perform tasks that are ...

28. Nanoscale Specific Heat Capacity Measurements Using Optoelectronic Bilayer Microcantilevers
Topic: Optical Metrology
Published: 12/12/2012
Authors: Brian G. (Brian Gregory) Burke, William A Osborn, Richard Swift Gates, David A LaVan
Abstract: We describe a new technique for optically and electrically detecting and heating bilayer microcantilevers (Pt−SiNx) to high temperatures at fast heating rates for nanoscale specific heat capacity measurements. The bilayer microcantilever acts s ...

29. Weak value thermostat with 0.2 mK precision
Topic: Optical Metrology
Published: 12/1/2012
Authors: Patrick F Egan, Jack A Stone Jr.
Abstract: A new laser-based thermostat sensitive to 0.2 mK at room temperature is reported. The method utilizes a fluid-filled prism and interferometric weak value amplification to sense nanoradian deviations of a laser beam: due to the high thermooptic coef ...

30. Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization
Topic: Optical Metrology
Published: 10/11/2012
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Francois R. Goasmat, Ronald G Dixson, Richard M Silver
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previ ...

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