NIST logo

Publications Portal

You searched on:
Topic Area: Characterization, Nanometrology, and Nanoscale Measurements
Sorted by: title

Displaying records 21 to 30 of 199 records.
Resort by: Date / Title


21. Challenges for Physical Characterization of Silver Nanoparticles Under Pristine and Environmentally Relevant Conditions
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/17/2011
Authors: Robert I. MacCuspie, Kim Rogers, Manomita Patra, Zhiyong Suo, Andrew John Allen, Matthew N. Martin, Vincent A Hackley
Abstract: The conditions used to disperse silver nanoparticles (AgNPs) strongly impact their resulting size measurements and agglomeration state, based on the underlying metrology and physical chemistry, respectively. A series of AgNP materials with reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907651

22. Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/7/2011
Authors: Joseph Leo Tedesco, Walter Zheng, Oleg A Kirillov, Sujitra Jeanie Pookpanratana, Hyuk-Jae Jang, Premsagar Purushotham Kavuri, Nhan V Nguyen, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910358

23. Characterization of Probe Dynamic Behaviors in Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/15/2008
Authors: Shaw C Feng, Che B. Joung, Theodore Vincent Vorburger
Abstract: Critical Dimension Atomic Force Microscopy (CD-AFM) is a primary means to measure the geometric shapes of walls and trenches on the nanometer scale in laboratories supporting the electronic industry. As the widths of commercially available CD-AFM pro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824690

24. Characterization of Soluble Anthradithiophene Derivatives
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/18/2010
Authors: Brad Conrad, Calvin Chan, Marsha A. Loth, John E Anthony, David J Gundlach
Abstract: We will discuss the growth and electrical measurements of a newly developed, partially fluorinated anthradithiophene (F-ADT) derivative with tert-butyldiphenylsilyl (TBDMS) side groups. Single crystals of the material can be readily grown and device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905386

25. Characterization of TiO2 Memristors on Flexible Substrates
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/19/2010
Authors: Joseph Leo Tedesco, Nadine Emily Gergel-Hackett, Laurie A. Stephey, Christina Ann Hacker, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906390

26. Characterization of a Soluble Anthradithiophene Derivative
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/1/2010
Authors: Brad Conrad, Calvin Chan, Marsha A. Loth, Sean R Parkin, Xinran Zhang, John E Anthony, David J Gundlach
Abstract: The structural and electrical properties of a new solution processable material, 2,8-diflouro-5,11-tert-butyldimethylsilylethynl anthradithiophene (TBDMS), were measured for single crystal and spun cast thin-film transistors. TBDMS is observed to rea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905704

27. Charge Puddles and Edge Effect in a Graphene Device as Studied by a Scanning Gate Microscope
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/1/2011
Authors: Joseph A Stroscio, H.J. Yang, Jungseok Chae, H. Baek, Jeonghoon Ha, Young Kuk, Suyong S. Jung, Young J. Song, Nikolai B Zhitenev, S.J. Woo, Young-Woo Son
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908985

28. Charge-Based Capacitance Measurements Circuits for Interface With Atomic Force Microscope Probes
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/25/2013
Authors: Joseph J Kopanski, Muhammad Yaqub Afridi, Chong Jiang, Michael Lorek, Timothy Kohler, Curt A Richter
Abstract: The charge based capacitance measurement (CBCM) technique is highly sensitive to small capacitances and capable integration of onto an AFM tip, thereby reducing stray and wire capacitance to the bare minimum. The CBCM technique has previous been appl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913172

29. Comparison of NIST SI Force Scale to NPL SI Mass Scale
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/19/2008
Authors: Christopher W. Jones, John A Kramar, Stuart Davidson, Richard Leach, Jon Robert Pratt
Abstract: Small masses in the 1.0 mg to 0.1 mg range were developed and calibrated at NPL with traceability to the IPK. These masses were transported to NIST at Gaithersburg and used as deadweights on the NIST electrostatic force balance, to facilitate a mass- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824727

30. Conduction and Loss Mechanisms in Flexible Oxide-Based Memristors
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/21/2011
Authors: Joseph Leo Tedesco, Nadine Gergel-Hackett, Laurie Stephey, Andrew A Herzing, Madelaine Herminia Hernandez, Christina Ann Hacker, Jan Obrzut, Lee J Richter, Curt A Richter
Abstract: In order to study the conduction and loss mechanisms behind their operation, flexible sol-gel based memristors were fabricated with differing oxide film thicknesses and device sizes. XPS, TEM, EELS, and VASE measurements indicated the oxide was amor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908435



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series