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You searched on: Topic Area: Semiconductor Materials Sorted by: title

Displaying records 21 to 30 of 46 records.
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21. Measurement of heat capacity and enthalpy of formation of Nickel Silicide using Nano-calorimetry
Topic: Semiconductor Materials
Published: 11/2/2009
Authors: Ravi Kummamuru, Lito De La Rama, Liang Hu, Mark D Vaudin, Mikhail Efremov, Martin L Green, David A LaVan, Leslie Allen
Abstract: We present characterization of energetics of the reaction between nickel and silicon thin films using differential scanning nano-calorimetry (nano-DSC). For the first time, nano-DSC measurements up to 850 °C and of enthalpy of thin film reactions hav ...

22. Measuring order in regioregular poly(3-hexylthiophene) with solid-state 13C CPMAS NMR
Topic: Semiconductor Materials
Published: 1/10/2014
Authors: Ryan C Nieuwendaal, Chad R Snyder, Dean M DeLongchamp
Abstract: We report on details of molecular packing in high molar mass poly(3-hexylthiophene) (P3HT) by solid-state 13C {1H} cross-polarization magic angle spinning (CPMAS) NMR measurements. The degree of polymer order was estimated for two films of varied dry ...

23. Measuring the extent of phase separation in P3HT/PCBM photovoltaic blends with 1H spin diffusion NMR spectroscopy
Topic: Semiconductor Materials
Published: 4/5/2010
Authors: Ryan C Nieuwendaal, Chad R Snyder, Regis J Kline, Eric K Lin, David Lloyd VanderHart, Dean M DeLongchamp

24. Micro-scale measurement and modeling of stress in silicon surrounding a tungsten-filled through-silicon via
Topic: Semiconductor Materials
Published: 10/11/2011
Authors: Ryan P. Koseski, William A Osborn, Stephan J Stranick, Frank W DelRio, Mark D Vaudin, Thuy Dao, Vance H. Adams, Robert Francis Cook
Abstract: The stress in silicon surrounding a tungsten-filled through-silicon via (TSV) is measured using confocal Raman microscopy line scans across the TSV both before and after etch removal of an oxide stack used as a mask to define the TSV during fabricati ...

25. Microwave Near-Field Imaging of Two-Dimensional Semiconductors
Topic: Semiconductor Materials
Published: 1/27/2015
Authors: Samuel Berweger, Joel C Weber, Jimmy J. Li, Jesus M Velazquez, Adam Pieterick, Norman A Sanford, Albert V. Davydov, Thomas M Wallis, Pavel Kabos
Abstract: Optimizing new generations of 2D devices based on van der Waals materials will require techniques capable of measuring variations in electronic properties in situ and with nanometer spatial resolution. We perform scanning microwave microscopy (SMM) ...

26. Microwave measurements and systematic circuit-model extraction of nanowire metal semiconductor field-effect transistors
Topic: Semiconductor Materials
Published: 8/24/2012
Authors: Dazhen Gu, Thomas M Wallis, Pavel Kabos, Paul T Blanchard, Kristine A Bertness, Norman A Sanford
Abstract: We present detailed on-wafer scattering parameter measurements and equivalent circuit modeling of metal semiconductor field effect transistor (MESFET) that incorporates a GaN nanowire (NW). A systematic procedure is established to extract intrinsic m ...

27. Modifying spin injection characteristics in the Co/Alq3 system by using a molecular self-assembled monolayer
Topic: Semiconductor Materials
Published: 5/19/2015
Authors: Hyuk-Jae Jang, Jun-Sik Lee, Sujitra Jeanie Pookpanratana, Ich C. Tran, Curt A Richter, Christina Ann Hacker
Abstract: We present the results of experiments that explore the influence of molecular self-assembled monolayers (SAMs) on characteristics of spin injection into an organic semiconductor, Alq3 [tris-(8-hydroxyquinoline) aluminum] from a ferromagnetic metal, C ...

28. NIST High Resolution X-Ray Diffraction Standard Reference Material: SRM 2000
Topic: Semiconductor Materials
Published: Date unknown
Authors: Donald A Windover, David L. Gil, Albert Henins, James P Cline
Abstract: NIST recently released a standard reference material (SRM) for the calibration of high resolution X-ray diffraction (HRXRD) instruments. HRXRD is extensively used in the characterization of lattice distortion in thin single, epitaxial crystal layer ...

29. Noise in ZnO Nanowire Field Effect Transistors
Topic: Semiconductor Materials
Published: 2/5/2009
Authors: Hao Xiong, Wenyong Wang, John S Suehle, Curt A Richter, W. Hong, T. Lee

30. Optical and Conductivity Properties of Films from Liquid-Phase Exfoliation of Natural Graphite
Topic: Semiconductor Materials
Published: 5/15/2009
Authors: Jan Obrzut, Kalman D Migler
Abstract: We experimentally determine the conductivity and optical transmittance of graphite layers, obtained from the liquid phase exfoliation of natural crystalline graphite. The measured transmittance values range from 0.9 to 0.97, comparable to the theoret ...

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