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Topic Area: Nanomanufacturing
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Displaying records 41 to 50 of 77 records.
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41. Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variations
Report Number: 823030
Topic: Nanomanufacturing
Published: 1/2/2007
Authors: Ulf Griesmann, Quandou Wang, Marc Tricard, Paul Dumas, Christopher Hill
Abstract: With the evolution of exposure tools for optical lithography towards larger numerical apertures, the semiconductor industry expects continued demand for improved wafer flatness at the exposure site. The Allowable site flatness for 300 mm wafers is ex ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823030

42. Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment
Topic: Nanomanufacturing
Published: 9/25/2009
Authors: Ndubuisi George Orji, Ronald G Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
Abstract: A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903286

43. Measuring the Structure of Epitaxially Assembled Block Copolymer Domains with Soft X-ray Diffraction
Topic: Nanomanufacturing
Published: 11/30/2009
Authors: Gila Stein, James Alexander Liddle, Andrew Aquila, Eric M Gullikson
Abstract: The size, shape, and roughness of poly(styrene-b-methyl methacrylate) block copolymer domains assembled on an epitaxial template are characterized with soft x-ray diffraction. The domain size and shape are deformed when the dimensions of the epitax ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903155

44. Methods for transferring the SI unit of force from millinewtons to piconewtons
Topic: Nanomanufacturing
Published: 6/1/2009
Authors: Gordon Allan Shaw, Koo-Hyun Chung, Douglas T Smith, Jon Robert Pratt
Abstract: The establishment of standards for small force measurement requires a link to an absolute measurement of force traceable to the international system of units (SI). To this end, a host of different means are being employed by the NIST small force meas ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902346

45. Metrology at the Nanoscale: What are the Grand Challenges?
Topic: Nanomanufacturing
Published: 8/6/2008
Authors: Kevin W Lyons, Michael T Postek
Abstract: Nanometrology provides the means to measure and characterize nanometer scale process and product performance and covers an expanse of topics including instrumentation, measurement methods (off-line and in-process applications), and standards. To meet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824701

46. Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
Topic: Nanomanufacturing
Published: 7/20/2011
Authors: Michael T Postek, Andras Vladar
Abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908153

47. NIST's Logistics Integration Solutions
Series: Letter Circular
Topic: Nanomanufacturing
Published: 9/1/2004
Author: Sharon J. Kemmerer
Abstract: The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results in the field of manufacturing. Building on this experience, NIST can: (1) Work with indu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822197

48. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Topic: Nanomanufacturing
Published: 3/1/2004
Authors: James D Gilsinn, Hui H. Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822172

49. Nanofabrication of a two-dimensional array using laser-focused atomic deposition
Topic: Nanomanufacturing
Published: 6/27/1995
Authors: R Gupta, Robert Celotta, Zeina Jabbour Kubarych, J Mcclelland
Abstract: Fabrication of a two-dimensional array of nanometer-scale chromium features on a silicon substrate by laser-focused atomic deposition is described. Features 13? 1 nm high and having a full-width at half maximum of 80? 10 nm are fabricated in a square ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820016

50. Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM
Topic: Nanomanufacturing
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: The imaging and measurement of nanostructures such as particles, carbon nanotubes, and quantum dots have placed new demands on the high resolution imaging capabilities of scanning electron microscopes. A barrier to accurate dimensional metrology is t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902308



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