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Displaying records 41 to 50 of 81 records.
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41. Laser-assisted atom probe tomography of MBE grown GaN nanowire heterostructures
Topic: Nanomanufacturing
Published: 2/24/2014
Authors: Norman A Sanford, Paul Timothy Blanchard, Matthew David Brubaker, Kristine A Bertness, John B Schlager, R Kirchofer, David R Diercks, Brian Gorman
Abstract: Laser-assisted atom probe tomography (L-APT) was performed on GaN nanowires (NWs) and axial GaN/InGaN nanowire heterostructures. All samples were grown by MBE on Si(111) substrates. The laser pulse energy (PE) at 355 nm used in L-APT analysis of Ga ...

42. Lithography, Metrology and Nanomanufacturing
Topic: Nanomanufacturing
Published: 4/12/2011
Authors: James Alexander Liddle, Gregg M. Gallatin
Abstract: Semiconductor chip manufacturing is by far the predominant nanomanufacturing technology in the world today. Top-down lithography techniques are used for fabrication of logic and memory chips since, in order to function, these chips must essentially b ...

43. Low-Loss Electron Imagine for Enhanced Surface Detail in the Scanning Electron Microscope: The Contributions of Oliver C. Wells
Topic: Nanomanufacturing
Published: 1/7/2015
Authors: Michael T Postek, Andras Vladar
Abstract: Low-loss electron (LLE) imaging in the scanning electron microscope (SEM) is based on the collection of energy-filtered backscattered electrons that have undergone minimal elastic interactions within a sample and therefore can carry high-resolution, ...

44. Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variations
Report Number: 823030
Topic: Nanomanufacturing
Published: 1/2/2007
Authors: Ulf Griesmann, Quandou Wang, Marc Tricard, Paul Dumas, Christopher Hill
Abstract: With the evolution of exposure tools for optical lithography towards larger numerical apertures, the semiconductor industry expects continued demand for improved wafer flatness at the exposure site. The Allowable site flatness for 300 mm wafers is ex ...

45. Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment
Topic: Nanomanufacturing
Published: 9/25/2009
Authors: Ndubuisi George Orji, Ronald G Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
Abstract: A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimen ...

46. Measuring the Structure of Epitaxially Assembled Block Copolymer Domains with Soft X-ray Diffraction
Topic: Nanomanufacturing
Published: 11/30/2009
Authors: Gila Stein, James Alexander Liddle, Andrew Aquila, Eric M Gullikson
Abstract: The size, shape, and roughness of poly(styrene-b-methyl methacrylate) block copolymer domains assembled on an epitaxial template are characterized with soft x-ray diffraction. The domain size and shape are deformed when the dimensions of the epitax ...

47. Methods for transferring the SI unit of force from millinewtons to piconewtons
Topic: Nanomanufacturing
Published: 6/1/2009
Authors: Gordon Allan Shaw, Koo-Hyun Chung, Douglas T Smith, Jon Robert Pratt
Abstract: The establishment of standards for small force measurement requires a link to an absolute measurement of force traceable to the international system of units (SI). To this end, a host of different means are being employed by the NIST small force meas ...

48. Metrology at the Nanoscale: What are the Grand Challenges?
Topic: Nanomanufacturing
Published: 8/6/2008
Authors: Kevin W Lyons, Michael T Postek
Abstract: Nanometrology provides the means to measure and characterize nanometer scale process and product performance and covers an expanse of topics including instrumentation, measurement methods (off-line and in-process applications), and standards. To meet ...

49. Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
Topic: Nanomanufacturing
Published: 7/20/2011
Authors: Michael T Postek, Andras Vladar
Abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is d ...

50. NIST's Logistics Integration Solutions
Series: Letter Circular
Topic: Nanomanufacturing
Published: 9/1/2004
Author: Sharon J. Kemmerer
Abstract: The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results in the field of manufacturing. Building on this experience, NIST can: (1) Work with indu ...

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