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Topic Area: Nanomanufacturing

Displaying records 61 to 70 of 76 records.
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61. Computational Models of the Nana Probe Tip for Static Behaviors (Abstract Only)
Topic: Nanomanufacturing
Published: 2/1/2007
Authors: Shaw C Feng, Theodore Vincent Vorburger, Che B. Joung, Joseph Fu, Ronald G Dixson, Li Ma
Abstract: As integrated circuits become smaller and faster, the measurement of line width must have less uncertainty and more versatility. The common requirement for uncertainty is less than 10 nanometers. The industrial need for versatility is three dimension ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822658

62. Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variations
Report Number: 823030
Topic: Nanomanufacturing
Published: 1/2/2007
Authors: Ulf Griesmann, Quandou Wang, Marc Tricard, Paul Dumas, Christopher Hill
Abstract: With the evolution of exposure tools for optical lithography towards larger numerical apertures, the semiconductor industry expects continued demand for improved wafer flatness at the exposure site. The Allowable site flatness for 300 mm wafers is ex ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823030

63. Control of MEMS Nanopositioners With Nano-Scale Resolution
Topic: Nanomanufacturing
Published: 11/10/2006
Authors: Jason John Gorman, Yong Sik Kim, Nicholas G Dagalakis
Abstract: Several approaches for the precision control of micro-scale positioning mechanisms, or MEMS nanopositioners, are presented along with initial experimental results which demonstrate nano-scale positioning resolution. The MEMS nanopositioners discussed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823602

64. Design of an On-Chip Micro-Scale Nanoassembly System
Topic: Nanomanufacturing
Published: 11/3/2006
Authors: Jason John Gorman, Yong Sik Kim, Andras Vladar, Nicholas G Dagalakis
Abstract: In this paper, the design and proposed operation of a MEMS-based nanoassembly system is presented. The nanoassembly system is comprised of four nanomanipulators that can work independently or cooperatively. The design of the nanomanipulators will be ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823599

65. Probe-Based Micro-Scale Manipulation and Assembly Using Force Feedback
Topic: Nanomanufacturing
Published: 6/26/2006
Authors: Jason John Gorman, Nicholas G Dagalakis
Abstract: Repeatable manipulation and assembly of micro-scale components is a critical capability for future developments in opto-electronics, hybrid microelectromechanical systems, and the integration of nano-scale devices into larger systems. This paper focu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822694

66. Damping mechanisms for precision applications in UHV environment
Topic: Nanomanufacturing
Published: 5/1/2006
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver
Abstract: Surface analysis techniques such as scanning probe microscopy (SPM) have undergone significant advances and are attractive for application to electron and optical devices such as micro lenses, vacuum tubes, electron tubes, etc. For surface stability ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822541

67. Dynamic Modeling and Vibration Analysis of a UHV Scanning Tunneling
Topic: Nanomanufacturing
Published: 8/17/2005
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver, James D Gilsinn
Abstract: Techniques based on scanning probe microscopy (SPM) are used to fabricate surface structures with dimensions ranging from 10 - 100mm. These structures have been fabricated and imaged using a scanning tunneling microscope (STM), and the STM requires ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822269

68. Optical Flatness Metrology for 300 mm Silicon Wafers
Topic: Nanomanufacturing
Published: 4/1/2005
Authors: Ulf Griesmann, Quandou Wang, T D Raymond
Abstract: At the National Institute of Standards and Technology (NIST), we are developing two interferometric methods for measuring the thickness variation and flatness of free-standing and chucked silicon wafers with diameters up to 300mm. The eXtremely accu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822272

69. NIST's Logistics Integration Solutions
Series: Letter Circular
Topic: Nanomanufacturing
Published: 9/1/2004
Author: Sharon J. Kemmerer
Abstract: The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results in the field of manufacturing. Building on this experience, NIST can: (1) Work with indu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822197

70. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Topic: Nanomanufacturing
Published: 3/1/2004
Authors: James D Gilsinn, Hui Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822172



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