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Topic Area: Metrology
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Displaying records 841 to 850 of 855 records.
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841. Virtual Surface Calibration and Computational Uncertainty
Topic: Metrology
Published: 10/1/2004
Authors: Son H. Bui, Theodore Vincent Vorburger, Thomas B Renegar
Abstract: This paper presents the development of a virtual surface calibration database for parameter evaluation and algorithm verification. The database runs from a web site at the National Institute of Standards and Technology (NIST), USA. Companies, univers ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823170

842. Visualization of Surface Figure Using Zernike Polynomials
Topic: Metrology
Published: 12/1/1995
Authors: Christopher J. Evans, R E. Parks, P Sullivan, John S Taylor
Abstract: Commercial software in modern interferometers used in optical testing frequently fit the wave-front or surface-figure error to Zernike polynomials; typically 37 coefficients are provided. We provide visual representations of these data in a form that ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820739

843. Voltage Modulation Scanned Probe Oxidation
Topic: Metrology
Published: 7/1/1999
Authors: F Perez-murano, K Birkelund, K Morimoto, John A Dagata
Abstract: Scanned probe microscope (SPM) oxidation with voltage modulation leads to a significant enhancement of the oxide growth rate, improvement of the aspect ratio of oxide features, and control of the structural and electrical properties of the SPM oxide. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821776

844. Voltage Modulation Scanned Probe Oxidation (Abstract)
Topic: Metrology
Published: 1/1/1998
Authors: John A Dagata, T Inoue, J Itoh, K Matsumoto, H Yokoyama
Abstract: This talk describes methods for enhancing the growth rate and electrical characteristics of nanostructures produced on silicon and titanium substrates by scanned probe microscope (SPM) oxidation. Direct oxidation of a substrate by the intense electr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823101

845. Wavelength-Shift Interferometry: Using a Dither to Improve Accuracy
Topic: Metrology
Published: 1/1/1996
Authors: Jack A Stone Jr, Alois Stejskal, Lowell P. Howard
Abstract: A dither in path length can dramatically improve the accuracy of wavelength-shift methods used for absolute distance interferometry. Here we report how a dither improves the accuracy of absolute distance measurement by two orders of magnitude, reduci ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820825

846. Wavelength-Tracking Capabilities of a Fabry-Perot Cavity
Topic: Metrology
Published: 11/20/2003
Authors: Jack A Stone Jr, Alois Stejskal
Abstract: We have characterized the accuracy of atmospheric wavelength tracking based on a laser servolocked to a simple Fabry-Peron cavity. The motivations are (1) to explore a method for air refractive index measurement and (2) to determine the stability and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822028

847. Working and Check Standards for NIST Surface and Microform Measurements
Topic: Metrology
Published: 1/1/1995
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: Different working standards and check standards are used in the NIST surface and microform measurement laboratory for calibrating instruments, establishing measurement traceability and control measurement uncertainty. The basic requirements for these ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820773

848. Workshop Discussion: A Framework for Standards Development and the Future of the IASPM Workshops
Topic: Metrology
Published: 1/1/1997
Author: John A Dagata
Abstract: A proposal to develop the Industrial Applications of Scanned Probe Microscopy (IASPM) workshops, which NIST has co-sponsored with Sematech, the ASTM E42.14 subcommittee, and the American Vacuum Society, over the past four years into a forum for assis ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820836

849. Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure
Topic: Metrology
Published: 1/1/1995
Authors: Michael T Postek, Andras Vladar, G Banke, T Reilly
Abstract: An accurate electron beam model is primary to the understanding of the SEM image. Several independently developed Monte Carlo models have been introduced for this purpose and a modeling round-robin has just been conducted to compare the results of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820756

850. Workshop Report 3: Edge Positions From Scanning Electron Microscope Signals by Comparing Models With Measure
Topic: Metrology
Published: 8/6/1995
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: There is a pressing need in the semiconductor industry to determine the dimensions of lithographically produced features on wafers and masks down to the l0?nm level of accuracy. Such measurements involve the accurate location of line edges, the subtr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820745



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