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Topic Area: Metrology
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Displaying records 841 to 850 of 851 records.
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841. Wavelength-Shift Interferometry: Using a Dither to Improve Accuracy
Topic: Metrology
Published: 1/1/1996
Authors: Jack A Stone Jr, Alois Stejskal, Lowell P. Howard
Abstract: A dither in path length can dramatically improve the accuracy of wavelength-shift methods used for absolute distance interferometry. Here we report how a dither improves the accuracy of absolute distance measurement by two orders of magnitude, reduci ...

842. Wavelength-Tracking Capabilities of a Fabry-Perot Cavity
Topic: Metrology
Published: 11/20/2003
Authors: Jack A Stone Jr, Alois Stejskal
Abstract: We have characterized the accuracy of atmospheric wavelength tracking based on a laser servolocked to a simple Fabry-Peron cavity. The motivations are (1) to explore a method for air refractive index measurement and (2) to determine the stability and ...

843. Working and Check Standards for NIST Surface and Microform Measurements
Topic: Metrology
Published: 1/1/1995
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: Different working standards and check standards are used in the NIST surface and microform measurement laboratory for calibrating instruments, establishing measurement traceability and control measurement uncertainty. The basic requirements for these ...

844. Workshop Discussion: A Framework for Standards Development and the Future of the IASPM Workshops
Topic: Metrology
Published: 1/1/1997
Author: John A. Dagata
Abstract: A proposal to develop the Industrial Applications of Scanned Probe Microscopy (IASPM) workshops, which NIST has co-sponsored with Sematech, the ASTM E42.14 subcommittee, and the American Vacuum Society, over the past four years into a forum for assis ...

845. Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure
Topic: Metrology
Published: 1/1/1995
Authors: Michael T Postek, Andras Vladar, G Banke, T Reilly
Abstract: An accurate electron beam model is primary to the understanding of the SEM image. Several independently developed Monte Carlo models have been introduced for this purpose and a modeling round-robin has just been conducted to compare the results of th ...

846. Workshop Report 3: Edge Positions From Scanning Electron Microscope Signals by Comparing Models With Measure
Topic: Metrology
Published: 8/6/1995
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: There is a pressing need in the semiconductor industry to determine the dimensions of lithographically produced features on wafers and masks down to the l0?nm level of accuracy. Such measurements involve the accurate location of line edges, the subtr ...

847. Workshop Summary Report: Scanning Probe Nanolithography Workshop
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7040
Topic: Metrology
Published: 1/1/2003
Authors: John A. Dagata, H Yokoyama, F Perez-murano
Abstract: A workshop on Scanning Probe Microscope (SPM)-based Nanolithography was held at NIST Gaithersburg on November 24-25, 2003.  The meeting was sponsored by the Precision Engineering Division, Manufacturing Engineering Laboratory, NIST, under a Rese ...

848. Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects
Topic: Metrology
Published: 7/1/1997
Authors: A Thompson, Theodore Vincent Vorburger, J Martin, M E. McKnight, Michael A Galler, R Lipman, Fern Y Hunt
Abstract: This is a conference report on the Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects held at Gaithersburg, MD, May 20, 1996.

849. X-ray Scattering and Fluorescence From Atoms and Molecules
Topic: Metrology
Published: 1/1/2000
Authors: S H Southworth, L Young, E P Kanter, Thomas W LeBrun
Abstract: Fundamental understanding of x-ray interactions with atoms and molecules provides a basis for applying x-ray methods to complex materials, such as structural determinations by x-ray diffraction and extended x-ray absorption fine structure. Compton sc ...

850. XUV Optics Characterization at the National Institute of Standards and Technology
Topic: Metrology
Published: 1/1/1993
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, William Tyler Estler, Christopher J. Evans, T. McWade, Joseph Fu, Theodore Vincent Vorburger
Abstract: Abstract not available.

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