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Topic Area: Metrology
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Displaying records 791 to 800 of 851 records.
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791. Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty
Topic: Metrology
Published: 1/1/2005
Authors: Ronald G Dixson, Richard A Allen, William F Guthrie, Michael W Cresswell
Abstract: The use of critical dimension atomic force microscopes (CD-AFMs) in semiconductor manufacturing, both for process control and as a reference metrology tool, is increasing.  If the tip width is calibrated consistentlybetween measurements, a CD-AF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823193

792. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Topic: Metrology
Published: 3/9/2012
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, John E Bonevich, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908943

793. Traceable Pico-Meter Level Step Height Metrology
Topic: Metrology
Published: 12/1/2004
Authors: Ndubuisi George Orji, Ronald G Dixson, Joseph Fu, Theodore Vincent Vorburger
Abstract: The atomic force microscope (AFM) increasingly being used as a metrology tool in the semiconductor industry where the features measured are at the nanometer level and continue to decrease. Usually the height sensors of the AFM are calibrated using st ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822142

794. Traceable Standards for Scanning Electron Microscopy
Topic: Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: The emphasis on International Standards Organization (ISO) certification of laboratories has resulted in a renewed interest in NIST traceable standards for scanning electron microscopy (SEM). Under ISO certification, it is mandatory to calibrate and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820996

795. Trial Shape-Sensitive Linewidth Measurement System
Topic: Metrology
Published: 11/1/2001
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: This is a report for a project to develop a scanning electron microscope (SEM) based shape-sensitive linewidth measurement system by improving the method by improving the method by which SEM data are analyzed. We report significant developments in al ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822433

796. Two-Dimensional Calibration Artifact and Measurement Methodology
Topic: Metrology
Published: 6/1/1999
Authors: Richard M Silver, Theodore D Doiron, William B. Penzes, S Fox, Edward A Kornegay, S Rathjen, M Takac, D Owen
Abstract: In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank. The design has been agreed upon by a number of SEMI participants working on a two-dimensiona ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820948

797. Two-Dimensional Simulation and Modeling in Scanning Electron Microscope Imaging and Metrology Research
Topic: Metrology
Published: 7/1/2002
Authors: Michael T Postek, Andras Vladar, J R. Lowney, William J. Keery
Abstract: Traditional Monte Carlo modeling of the electron beam specimen interactions in a scanning electron microscope (SEM) produces information about electron beam penetration and output signal generation at either a single beam landing location, or multipl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822435

798. Two-dimensional Simulation Modeling in Imaging and Metrology Research
Topic: Metrology
Published: 7/1/2002
Authors: Michael T Postek, Andras Vladar, J R. Lowney, William J. Keery
Abstract: Traditional Monte Carlo modeling of the electron beam-specimen interactions in a scanning electron microscope (SEM) produces information about electron beam penetration and output signal generation at either a single beam-landing location, or multipl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821738

799. U.S. Navy Coordinate Measuring Machines: A Study of Needs
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5379
Topic: Metrology
Published: 1/1/1994
Authors: David C Stieren, Ralph C. Veale, Howard H. Harary, Shaw C Feng
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820716

800. USARSim/ROS: A Combined Framework for Robotic Control and Simulation
Topic: Metrology
Published: 6/20/2012
Authors: Stephen B. Balakirsky, Zeid Kootbally
Abstract: The Robot Operating System (ROS) has been steadily gaining popularity among robotics researchers as an open source framework for robot control. The Unified System for Automation and Robot Simulation (USARSim) has been used for many years by robotics ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910918



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