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Topic Area: Metrology
Displaying records 791 to 800 of 835 records.
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791.
The Measurement of the Pile-up Topography of Hardness Indentations
Topic: Metrology
Published: 4/1/1994
Authors: L Blunt, P Sullivan
Abstract: A number of indentations were made in 70:30 brass specimens. The resulting surface disturbance was analyzed using a stylus-based 3D topography measuring instrument. Numerical methods based on progressive truncation routines were developed in order to
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820672
792.
The Measurement and Uncertainty of a Calibration Standard for the SEM
Topic: Metrology
Published: 3/1/1994
Authors: Joseph Fu, M Croarkin, Theodore Vincent Vorburger
Abstract: Standard Reference Material 484 is an artifact for calibration the magnification scale of a Scanning Electron Microscope (SEM) within the range of 1000X to 20000X. Seven issues, SRM-484, and SRM-484a to SRM-484f, have been certified between 1977 and
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820682
793.
Calibration of Translational Tables for use in 3-Dimensional Surface Topography Measurement Systems
Topic: Metrology
Published: 2/1/1994
Authors: E Mainsah, P Sullivan, K Stout
Abstract: Translational tables now form a vital pan in three-dimensional surface topography systems. In some systems typically. one translational table is used to provide measurements in one of the axes and the translational motion provided by the gearbox of t
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820690
794.
The Effects of Quantization on 3D Topography Characterization
Topic: Metrology
Published: 2/1/1994
Authors: E Mainsah, P Sullivan, K Stout
Abstract: This paper investigates the influence of quantization on 3D surface characterization by carrying out an analysis of surface parameter changes on a range of real and simulated surfaces. The changes in parameters are calculated as a percentage of the o
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820691
795.
A Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir
Abstract: Atomic force microscope (AFM) is a rapidly emerging measurement technology. As the technology develops, it is being incorporated into industrial research and development, and manufacturing facilities. At present there are no sub-micrometer pitch or s
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820693
796.
A Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir, Theodore Vincent Vorburger
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901971
797.
A High Accuracy Micrometer for Diameter Measurements of Cylindrical Standards
Topic: Metrology
Published: 1/1/1994
Authors: John Richard Stoup, Theodore D Doiron
Abstract: NIST has developed a new instrument to measure cylindrical standards including thread wires and plain plug gages. The instrument uses a laser interferometer system which is coupled with an air bearing linear motion slide and precise contact geometry
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820717
798.
A Method for the Spatial Calibration of a Commercial Phase Measuring Interferometer - Theoretical Aspects
Topic: Metrology
Published: 1/1/1994
Authors: P Sullivan, Christopher J. Evans
Abstract: In a phase measuring interferometer (PMI), the interference pattern is focused on a charge coupled device (CCD) detector array and data points are sampled at the corresponding locations. In most commercially available systems, a zoom lens forms part
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820718
799.
A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Topic: Metrology
Published: 1/1/1994
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820698
800.
A New Workshop Summary Report: Industrial Applications of Scanned Probe Microscopy
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5550
Topic: Metrology
Published: 1/1/1994
Authors: John A. Dagata, A Diebold, C Shih, R Colton
Abstract: An Industrial Applications of Scanned Probe Microscopy (SPM) workshop was held at NIST Gaithersburg on March 24-25 1994. The meeting, co-sponsored by NIST, SEMATECH, ASTM E42.14, and the American Vacuum Society, was attended by over one hundred SPM u
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820677