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Topic Area: Spectroscopy
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Displaying records 71 to 80 of 116 records.
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71. Preface to Cavity-Enhanced Spectroscopies
Topic: Spectroscopy
Published: 12/1/2002
Authors: Roger D van Zee, J P. Looney
Abstract: This submission is an introduction to Cavity-Enhanced Spectroscopy, a book which is to be published by Academic Press.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830789

72. Grazing Incidence X-Ray Photoelectron Spectroscopy: A Method to Study Gate Dielectric Films on Si
Topic: Spectroscopy
Published: 11/1/2002
Authors: Terrence J Jach, E Landree
Abstract: Grazing Incidence X-ray Photoelectron Spectroscopy (GIXPS) is a method that offers promise as a non-destructive technique to measure the thickness and chemistry of ultrathin gate dielectric films. It combines aspects of x-ray reflectivity and convent ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831285

73. On the Application of Quantitative Cavity Ring Down Spectroscopy to Measruements of Line Shapes and Continuum Absorption
Topic: Spectroscopy
Published: 6/7/2002
Authors: J G. Cormier, Joseph Terence Hodges, J R Drummond
Abstract: Cavity ringdown spectroscopy (CRDS) is a highly sensitive spectroscopic technique that has been successfully applied to problems such as trace gas detection and the observation of weak spectra. Despite possessing several intrinsic advantages over oth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830795

74. The NIST Electron Effective-Attenuation-Length Database
Series: OTHER
Topic: Spectroscopy
Published: 2/1/2002
Authors: Cedric John Powell, Aleksander Jablonski
Abstract: The NIST Electron Effective-Attenuation-Length Database provides values of electron effective attenuation lengths (EALs) in solid elements and compounds at selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831244

75. Influence of Elastic-Electron Scattering on Measurements of Sillicon Dioxide Film Thicknesses by X-Ray Photoelectron Spectroscopy
Topic: Spectroscopy
Published: 9/1/2001
Authors: Cedric John Powell, Aleksander Jablonski
Abstract: We investigate the systematic error due to neglet of elastic scattering of photoelectrons in measurements of the thicknesses of thin films of SiO^d2^ on Si by x-ray photoelectron spectroscopy (XPS). Calulations were made of substrate Si 2p photoelec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831215

76. Comparisons of Calculated and Measured Effective Attenuation Lengths for Silicon Dioxide Over a Wide Electron Energy Range
Topic: Spectroscopy
Published: 8/1/2001
Authors: Cedric John Powell, Aleksander Jablonski
Abstract: We report calculations of effective attenuation lengths (EALs) for Si 2p photoelectrons in silicon dioxide at photoelectron energies between 82 and 1385 eV. These EALs are compared with measured values reported recently by Shimada et al. [Surf. Inte ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831218

77. Grazing Incidence X-Ray Photoemission Spectroscopy and the Accuracy of Thickness Measurements of CMOS Gate Dielectrics
Topic: Spectroscopy
Published: 8/1/2001
Authors: Terrence J Jach, E Landree
Abstract: Grazing incidence x-ray photoelectron spectroscopy (GIXPS) is a method that offers promise as a non-destructive technique to measure the thickness and chemical state of ultrathin gate dielectric films. This method utilizes the non-linear dependence o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831227

78. Measurement of 8-Hydroxy-2'-Deoxyadenosine In DNA by Liquid Chromatography/Mass Spectrometry
Topic: Spectroscopy
Published: 8/1/2001
Authors: Pawel Jaruga, H Rodriguez, M Miral Dizdar
Abstract: 8-Hydroxyadenine (8-OH-Ade) is one of the major lesions, which is formed in DNA by hydroxyl radical attack on the C-8 position of adenine followed by oxidation. We describe the measurement of the nucleoside form of this compound, 8-hydroxy-2'-deoxyad ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830242

79. Effects of Elastic-Electron Scattering on Measurements of Silicon Dioxide Film Thicknesses by X-Ray Photoelectron Spectroscopy
Topic: Spectroscopy
Published: 3/1/2001
Authors: Cedric John Powell, Aleksander Jablonski
Abstract: It is now customary for the effects of elastic-electron scattering to be ignored in measurements of the thicknesses of overlayer films by X-ray photoelectron spectroscopy (XPS). It is known, however, that elastic scattering can cause the effective a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831197

80. NIST Data Resources for Surface Analysis by X-Ray Photoelectron Spectroscopy and Auger Electron Spectroscopy
Topic: Spectroscopy
Published: 3/1/2001
Authors: Cedric John Powell, Aleksander Jablonski, A Naumkin, A Kraut-Vass, Joseph M Conny, J R. Rumble
Abstract: A description is given of data resources that are available from the National Institute of Standards and Technology (NIST) for x-ray photoelectron spectroscopy (XPS) and Auger-electron spectroscopy. NIST currently has three databases available: an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831193



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