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Topic Area: Nanotechnology
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Displaying records 51 to 60 of 384 records.
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51. Chemical Science and Technology Laboratory (CSTL) 2009 Annual Report
Series: NIST Interagency/Internal Report (NISTIR)
Topic: Nanotechnology
Published: 11/17/2009
Authors: Willie E May, Richard R Cavanagh, Dianne L Poster, Michael D. Amos
Abstract: CSTL is entrusted with building, sustaining, and maximizing the chemical measurement system that is criticial to chemical technological innovation, economic competitiveness and new job growth for the benefit of the Nation.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902427

52. Chemical and Structural Characterization of Ultrathin Dielectric Films Using AEM
Topic: Nanotechnology
Published: 1/1/2000
Authors: J H J Scott, Eric S Windsor
Abstract: The structure of ultrathin silicon oxynitride films, used as gate dielectrics in integrated circuits (ICs), is studied using analytical electron microscopy (AEM). Laterally homogeneous blanket films approximately 2nm in thickness are characterized i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831163

53. Cluster Primary Ion Beam Secondary Ion Mass Spectrometry for Semiconductor Characterization
Topic: Nanotechnology
Published: 1/1/2001
Authors: John G Gillen, S V. Roberson, Albert J. Fahey, Marlon L Walker, J Bennett, R Lareau
Abstract: We are evaluating the use of polyatomic and cluster primary ion beams for characterization of semiconductor materials by secondary ion mass spectrometry using both magnetic sector and time-of-flight SIMS instruments. Primary ion beams of SF^d5^+, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831200

54. Comparison of Semiconductor Pixel Array, Phosphor Plate, and Track-Etch Detectors for Alpha Autoradiography
Topic: Nanotechnology
Published: 12/1/1997
Author: Cynthia J Zeissler
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100387

55. Competitive Adsorption of PEG, CI^u-^, and SPS/MPS on Cu: An In Situ Ellipsometric Study
Topic: Nanotechnology
Published: 8/1/2006
Authors: Marlon L Walker, Lee J Richter, Thomas P Moffat
Abstract: The adsorption of Cu electrodeposition accelerating agents SPS and MPS on evaporated Cu thin films was examined in-situ using spectroscopic ellipsometry under quiescent conditions. Both the thiol (MPS) and disulfide (SPS) resulted in definitive chan ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831400

56. Competitive Adsorption of Thiolated Polyethylene Glycol and Mercaptoproprionic acid on Gold Nanoparticles Measured by Physical Characterization Methods
Topic: Nanotechnology
Published: 5/24/0010
Authors: De-Hao D. Tsai, Frank W DelRio, Robert I. MacCuspie, Tae Joon Cho, Michael Russel Zachariah, Vincent A Hackley
Abstract: Adsorption kinetics between thiolated polyethylene glycol (SH-PEG) and mercaptoproprionic acid (MPA) on gold nanoparticles (Au-NP) were studied using dynamic light scattering (DLS) and electrospray differential mobility analysis (ES-DMA). Through a c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904724

57. Consistency of Delta ^u13^ C Measurements Improved
Topic: Nanotechnology
Published: 2/1/2006
Authors: T B Copelen, W Brand, M Gehre, M Groening, HAJ Meijer, Blaza Toman, R Michael Verkouteren
Abstract: We present state-of-the-art measurements and data evaluation methods to show that the consistency of carbon isotope ratio measurements can be improved 39 % to 47 % by anchoring the measurement scale with two isotopic reference materials differing in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831406

58. Contact mechanics and tip shape in afm-based nanomechanical measurements
Topic: Nanotechnology
Published: 8/31/2005
Authors: Malgorzata Kopycinska-Mueller, Roy Howard Geiss, Donna C. Hurley
Abstract: Stiffness-load curves obtained in quantitative atomic force acoustic microscopy (AFAM) measurements depend on both the elastic properties of the sample and the geometry of the atomic force microscope (AFM) tip. The geometry of silicon AFM tips change ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50203

59. Controlled dielectrophoretic nanowire self-assembly using atomic layer deposition and suspended microfabricated electrodes
Topic: Nanotechnology
Published: 5/28/2012
Authors: Kristine A Bertness, Joseph J. Brown, Alicia I Baca, Victor M. Bright
Abstract: Effects of design and materials on the dielectrophoretic self-assembly of individual gallium nitride nanowires (GaN NWs) onto microfabricated electrodes have been experimentally investigated. The use of TiO^d2^ surface coating generated by atomic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910631

60. Controlled nucleation of GaN nanowires grown with molecular beam epitaxy
Topic: Nanotechnology
Published: 7/13/2010
Authors: Kristine A Bertness, Aric Warner Sanders, Devin M. Rourke, Todd E Harvey, Alexana Roshko, Norman A Sanford
Abstract: The location of GaN nanowires was controlled with essentially perfect selectivity using patterned SiNx prior to molecular beam epitaxy growth. Growth was uniform within mask openings and absent on the mask surface for over 95 % of the usable area of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904471



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