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Topic Area: Nanotechnology
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Displaying records 341 to 350 of 395 records.
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341. Surface-directed Growth of Nanowires: A Scalable Platform for Nanodevice Fabrication
Topic: Nanotechnology
Published: 7/11/2011
Author: Babak Nikoobakht
Abstract: Optical lithography continues to be the popular technique for further miniaturization of electronic circuitry and its components. However, as further device miniaturization continues, complexity of pattern generation and cost increase; therefore th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908140

342. Surface-plasmon-enhanced electric fields in two-dimensional arrays of gold nanodisks
Topic: Nanotechnology
Published: 8/4/2008
Authors: Ward L Johnson, Sudook A Kim, Zhandos Utegulov, B. T. Draine
Abstract: Electric-field distributions in two-dimensional arrays of gold nanodisks on Si3N4 membranes are modeled, using the discrete-dipole approximation, as a function of nanodisk diameter (20 − 50 nm), height (10 − 100 nm), ratio of the array sp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854107

343. Survey of FY 2001 Nanotechnology-Related Research at the National Institute of Standards and Technology.
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6864
Topic: Nanotechnology
Published: 1/1/2002
Authors: Chad R Snyder, J P. Looney, M P Casassa
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853823

344. Synthesis and Characterization of Monolayer Bimetallic Surfaces: A Synchrotron NEXAFS and XPS Study
Topic: Nanotechnology
Published: 12/8/2009
Authors: R. Rettew, J. Guthrie, Cherno Jaye, Daniel A Fischer, Faisal Alamgir
Abstract: Surface limited redox replacement (SLRR) is a potentially powerful tool for atomic monolayer-scale model catalyst fabrication for a plethora of spectroscopic techniques. This paper compares overpotential Ni deposition as an intermediary for SLRR with ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903790

345. Synthesis, Structural Characterization, and Electronic Structure of Single-Crystalline CuxV2O5 Nanowires
Topic: Nanotechnology
Published: 4/6/2009
Authors: Daniel A Fischer, C Patridge, Cherno Jaye, H Zhang, Amy Marschilok, E Takeuchi, S Banerjee
Abstract: Single-crystalline copper vanadium oxide nanowires β'-CuxV2O5 (x ~ 0.60) have been synthesized by the hydrothermal reduction of bulk CuV2O6 using small-molecule aliphatic alcohols as reducing agents. The prepared copper vanadium bronze nanow ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901684

346. Synthetic Approach for Tunable, Size-Selective Formation of Monodisperse, Diphosphine-Protected Gold Nanoclusters
Topic: Nanotechnology
Published: 8/10/2010
Authors: John M Pettibone, Jeffrey W Hudgens
Abstract: Most nanoparticle syntheses, including those based on the Brust-Schiffrin method, produce a mixture of different metal core sizes. This report presents a new strategy for controlling the size and dispersity of ultra-small nanoclusters through select ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905721

347. TSV Reveal height and bump dimension metrology by the TSOM method
Topic: Nanotechnology
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

348. Temperature-Controlled Depth Profiling in Poly (methylmethacrylate) (PMMA) Using Cluster Secondary Ion Mass Spectrometry (SIMS) II. An Investigation of Sputter-Induced Topography, Chemical Damage and Depolymerization Effects
Topic: Nanotechnology
Published: 2/1/2007
Authors: Christine M. Mahoney, Albert J. Fahey, John G Gillen, Chang Xu, James Batteas
Abstract: Secondary Ion Mass Spectrometry (SIMS) employing an SF polyatomic primary ion source was used to depth profile Poly(methyl methacrylate) (PMMA) at a series of temperatures from -75 C to 125 C where the primary glass transition for PMMA occurs at ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831399

349. Temperature-Controlled Depth Profiling in Poly(methylmethacrylate) (PMMA) Using Cluster Secondary Ion Mass Spectrometry (SIMS): I. Investigation of Depth Profile Characteristics
Topic: Nanotechnology
Published: 2/1/2007
Authors: Christine M. Mahoney, Albert J. Fahey, John G Gillen
Abstract: Secondary Ion Mass Spectrometry (SIMS) employing an SF5+ polyatomic primary ion source was used to depth profile Poly(methyl methacrylate) (PMMA) at a series of temperatures from -75 oC to 125 oC, where the primary glass transition for PMMA occurs at ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831413

350. Temperature-Controlled Depth Profiling in Polymeric Biomaterials Using Cluster Secondary Ion Mass Spectrometry
Topic: Nanotechnology
Published: 7/1/2006
Authors: Christine M. Mahoney, Albert J. Fahey, John G Gillen, Chang Xu, J Batteas
Abstract: Secondary Ion Mass Spectrometry (SIMS) employing an SF5+ polyatomic primary ion source was used to depth profile through various polymeric biomaterials at a series of temperatures from -125 oC to 150 oC. The depth profile characteristics (e.g. inte ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831404



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