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You searched on: Author: Thomas Germer

Displaying records 1 to 10 of 165 records.
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1. SCATMECH: Polarized Light Scattering C++ Class Library and the Modeled Integrated Scattering Tool (MIST)
Published: 1/15/2015
Author: Thomas Avery Germer
Abstract: SCATMECH is an object-oriented C++ class library developed to distribute models for light scattering applications. Included in the library are models for diffuse surface scattering that predict the bidirectional reflectance distribution function (BRD ...

2. Improved measurement capabilities at the NIST EUV Reflectometry Facility
Published: 8/1/2014
Authors: Charles S Tarrio, Steven E Grantham, Thomas Avery Germer, Jack Clark Rife, Thomas B Lucatorto, Mike Kriese, Yuriy Platonov, Licai Jiang, Jim Rodriguez
Abstract: The NIST Extreme Ultraviolet (EUV) Reflectometry Facility was designed in the 1990s to accommodate the largest multilayer optics envisioned at that time. However, with increasing power requirements for an EUV scanner, source collection optics have g ...

3. Angle-resolved diffuse reflectance and transmittance
Published: 7/1/2014
Authors: Thomas Avery Germer, J C Stover, Sven Schroeder
Abstract: This chapter will cover the topic of bidirectional reflectance distribution function [BRDF] measurements. These measurements, like the diffuse reflectance and transmittance measurements described in the previous chapter, cover the gamut from highly r ...

4. Dispersive Methods
Published: 7/1/2014
Authors: Arnold A. Gaertner, Howard W Yoon, Thomas Avery Germer
Abstract: Chapter 3 will discuss dispersive means of obtaining spectral resolution in spectrophotometry. These methods are used to spatially disperse or separate the various wavelengths of optical electromagnetic radiation to enable analysis of material proper ...

5. Preface and Introduction
Published: 7/1/2014
Authors: Thomas Avery Germer, Joanne C Zwinkels, Benjamin K Tsai
Abstract: This constitutes the front matter (preface and introductory chapter) to the book, "Spectrophotometry: Accurate Measurements of the Optical Properties of Materials," The introduction presents a short history of spectrophotometry. A very brief descrip ...

6. Theoretical Concepts in Spectrophotometric Measurements
Published: 7/1/2014
Authors: Thomas Avery Germer, Joanne C Zwinkels, Benjamin K Tsai
Abstract: This chapter will describe some of the theoretical concepts of obtaining optical properties from spectrophotometric measurements. The optical properties of interest can be the spectrophotometric quantities themselves or the calculated optical constan ...

7. Assessing consistency of a Mueller matrix measurement by rotation of the sample under test
Published: 9/27/2013
Author: Thomas Avery Germer
Abstract: We present a method for checking the consistency of a Mueller matrix measurement. The method is based upon the rotational properties of a Mueller matrix. The sample is placed in the polarimeter in a precision rotation stage. The Mueller matrix is th ...

8. The NIST Robotic Optical Scatter Instrument (ROSI) and its Application to BRDF Measurements of Diffuse Reflectance Standards for Remote Sensing
Published: 9/23/2013
Authors: Heather J Patrick, Clarence Joseph Zarobila, Thomas Avery Germer
Abstract: We describe the robotic optical scatter instrument (ROSI), a new robotic arm-based goniometer for in-plane and out-of-plane reflectance and bidirectional reflectance distribution function (BRDF) measurements of surfaces. The goniometer enables BRDF ...

9. Gaps Analysis for CD Metrology Beyond the 22 nm Node
Published: 4/10/2013
Authors: Benjamin D. Bunday, Thomas Avery Germer, Victor H Vartanian, Aaron Cordes, Aron Cepler, Charles Settens
Abstract: This paper will examine the future for critical dimension (CD) metrology. First we will present the extensive list of applications for which CD metrology solutions are needed, showing commonalities and differences among the various applications. We ...

10. Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
Published: 4/8/2013
Authors: Paul Lemaillet, Thomas Avery Germer, Regis J Kline, Daniel Franklin Sunday, Chengqing C. Wang, Wen-Li Wu
Abstract: In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopi ...

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