You searched on: Author: John Kramar
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1. Feasibility study on 3-D shape analysis of high-aspect-ratio features using through-focus scanning
Ravikiran Attota, Peter Weck, John A Kramar, Bunday Benjamin, Victor H Vartanian
In-line metrologies currently used in the semiconductor industry are being challenged by the
pace of device scaling and the adoption of novel device architectures. Metrology and process control
three-dimensional (3D) high-aspect ...
2. Method for Measuring the Volume of Nominally 100 um Diameter Spherical Water-in-Oil Emulsion
Special Publication (NIST SP)
John A Dagata, Natalia Farkas, John A Kramar
This report describes an equivalent volume measurement method using optical microscopy for
estimating the mean volume of nominally 100 um diameter spherical droplets. The droplets
are the aqueous phase of proprietary water in oil emulsions used i ...
3. Optimizing noise for defect analysis with through-focus scanning optical microscopy
Ravikiran Attota, John A Kramar
4. Nanometer level sampling and control of a scanning electron microscope
Bradley N Damazo, Andras Vladar, Olivier Marc Marie-Rose, John A Kramar
The National Institute of Standards and Technology (NIST) is developing a specialized, metrology scanning electron microscope (SEM), having a metrology sample stage measured by a 38 picometer resolution, high-bandwidth laser interferometer system. Th ...
5. Reference Materials 8096 and 8097 - The MEMS 5-in-1 RMs: Homogeneous and Stable
Janet M Cassard, Jon C Geist, John A Kramar
The NIST Microelectromechanical Systems (MEMS) 5-in-1 Reference Materials (RMs) were developed to assist users in validating their use of five documentary standard test methods. A Reference Material can be defined as a material whose property values ...
6. Kinematic Modeling and Calibration of a Flexure Based Hexapod Nanopositioner
Hongliang Shi, Hai-Jun Su, Nicholas G Dagalakis, John A Kramar
This paper covers the kinematic modeling of a flexure-based, hexapod nanopositioner and a new method of calibration for this type of nanopositioner. This six degrees of freedom tri-stage nanopositioner can generate small displacement, high-resolution ...
7. Atomic Force Microscope Cantilever Flexural Stiffness Calibration: Toward a Standard Traceable Method
Journal of Research (NIST JRES)
Richard Swift Gates, Mark Reitsma, John A Kramar, Jon Robert Pratt
The evolution of the atomic force microscope into a useful tool for measuring mechanical properties of surfaces at the nanoscale has spurred the need for more precise and accurate methods for calibrating the spring constants of test cantilevers. Gro ...
8. TSOM Method for Semiconductor Metrology
Ravikiran Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
9. Scanning Probe Microscope Dimensional Metrology at NIST
John A Kramar, Ronald G Dixson, Ndubuisi George Orji
Scanning probe microscopy (SPM) dimensional metrology efforts at the U.S. National Institute of Standards and Technology are reviewed. The main SPM instruments for realizing the International System of Units (SI) are the Molecular Measuring Machine, ...
10. A COMPACT, COMPOUND ACTUATOR FOR THE MOLECULAR MEASURING MACHINE
Jing Li, Yin-Lin Shen, Jaehwa Jeong, Fredric Scire, John A Kramar
A compact, two-stage, vertical actuator with built-in sensors has been developed for the Molecular Measuring Machine (M3) and other potential precision instrumentation applications, such as scanning probe microscopy (SPM). In this article, we descri ...