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Displaying records 71 to 80 of 102 records.
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71. Optics for Extreme Ultraviolet Lithography
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840225

72. Optics go to extremes in EUV lithography
Published: 1/1/2005
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101546

73. Photon Damage and Absolute Photoluminescent Efficiency of Sodium Salicylate in the Soft X-ray Regime
Published: 1/1/1992
Authors: D E Husk, Charles S Tarrio, E L Benitez, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101562

74. Photon Physics Home Page
Published: 5/1/1998
Authors: Uwe Arp, Charles S Tarrio
Abstract: The principal research activities of the Photon Physics Group are in the far ultraviolet and extreme ultraviolet [EUV] physics. In particular, we are currently pursing research activities in EUV optics, the development of x-ray microscopies, and nan ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840048

75. Polymer Photochemistry at the EUV Wavelength
Published: 6/8/2010
Authors: Charles S Tarrio, Theodore Fedynyshyn, Russell Goodman, Alberto Cabral, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904827

76. Post-Polish Figuring of Optical Surfaces Using Multilayer Deposition, ed. by G. Kubiak and D. Kania
Published: 1/1/1996
Authors: Charles S Tarrio, E Spiller, C J Evans, Thomas B Lucatorto, Charles W Clark
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100204

77. Quantitative Measurement of Outgas Products From EUV Photoresists
Published: 3/14/2008
Authors: Charles S Tarrio, Bruce A Benner Jr, Robert Edward Vest, Steven E Grantham, Shannon Bradley Hill, Thomas B Lucatorto, Jay H Hendricks, Patrick J Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
Abstract: The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842436

78. SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research
Published: 9/1/2011
Authors: Uwe Arp, Charles W Clark, Lu Deng, Nadir S. Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Shannon Bradley Hill, Thomas B Lucatorto, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storag ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906750

79. Selected Programs at the New SURF III Electron Storage Ring
Published: 6/1/2000
Authors: Mitchell L. Furst, Uwe Arp, G P Cauchon, A D Hamilton, L R Hughey, Thomas B Lucatorto, Charles S Tarrio
Abstract: The conversion of the electron storage ring at NIST (the National Institute of Standards and Technology) to SURF III (the Synchrotron Ultraviolet Radiation Facility) has resulted in a significant improvement to the azimuthal uniformity of magnetic fi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841424

80. Si/B^d4C Narrow-Bandpass Mirrors for the Extreme Ultraviolet,
Published: 1/1/1994
Authors: J M Slaughter, B S Meadower, R N. Watts, Charles S Tarrio, Thomas B Lucatorto, C M Falco
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101720



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