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Author: charles tarrio
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Displaying records 61 to 70 of 96 records.
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61. Narrow band EUV multilayer coating for the MOSES rocket,
Published: 1/1/2006
Authors: S M Owens, J S Gum, Charles S Tarrio, S Grantham, J A Dvorak, B Kjornrattanawanich, R Keski kuha, R J Thomas, C C Kankelborg
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100181

62. New Developments at the NIST/DARPA EUV Optics Characterization Facility,
Published: 1/1/1997
Author: Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101764

63. Normal-Incidence Optics for Solar Coronal Imaging,
Published: 1/1/1995
Authors: E Spiller, J Wilczynski, L Golub, G Nystrom, Eric M Gullikson, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100195

64. Optical Constants of In-Situ Deposited Films of Important EUV Multilayer Materials,
Published: 1/1/1998
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, J M Slaughter, C M Falco
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101763

65. Optical Constants of In-Situ-Deposited Films of Important Extreme-Ultraviolet Multilayer Mirror Materials
Published: 7/1/1998
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, J M Slaughter, Charles M Falco
Abstract: We have performed angle-dependent reflectance measurements of in-situ magnetron sputtered films of B^d4^C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of appro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840047

66. Optical Properties of Silicon and its Oxides,
Published: 1/1/1993
Authors: Charles S Tarrio, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101766

67. Optics for Extreme Ultraviolet Lithography
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840225

68. Optics go to extremes in EUV lithography
Published: 1/1/2005
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101546

69. Photon Damage and Absolute Photoluminescent Efficiency of Sodium Salicylate in the Soft X-ray Regime
Published: 1/1/1992
Authors: D E Husk, Charles S Tarrio, E L Benitez, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101562

70. Photon Physics Home Page
Published: 5/1/1998
Authors: Uwe Arp, Charles S Tarrio
Abstract: The principal research activities of the Photon Physics Group are in the far ultraviolet and extreme ultraviolet [EUV] physics. In particular, we are currently pursing research activities in EUV optics, the development of x-ray microscopies, and nan ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840048



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