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Author: charles tarrio
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Displaying records 61 to 70 of 102 records.
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61. Multilayers for Next Generation X-Ray Sources
Published: Date unknown
Authors: S Bajt, H N Chapman, E Spiller, S Hau-Riege, J Alameda, A J Nelson, C C Walton, B Kjornrattanawanich, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840269

62. NIST VUV Metrology Programs to Support Space Based Research,
Published: 1/1/2006
Authors: Robert Edward Vest, Yaniv Barad, Mitchell L. Furst, Steven E Grantham, Charles S Tarrio, Ping-Shine Shaw
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101784

63. NIST VUV metrology programs to support space-based research
Published: 1/1/2006
Authors: Robert Edward Vest, Yaniv Barad, Mitchell L. Furst, Steven E Grantham, Charles S Tarrio, Ping-Shine Shaw
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104243

64. Narrow band EUV multilayer coating for the MOSES rocket,
Published: 1/1/2006
Authors: S M Owens, J S Gum, Charles S Tarrio, S Grantham, J A Dvorak, B Kjornrattanawanich, R Keski kuha, R J Thomas, C C Kankelborg
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100181

65. New Developments at the NIST/DARPA EUV Optics Characterization Facility,
Published: 1/1/1997
Author: Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101764

66. Normal-Incidence Optics for Solar Coronal Imaging,
Published: 1/1/1995
Authors: E Spiller, J Wilczynski, L Golub, G Nystrom, Eric M Gullikson, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100195

67. Optical Constants of In-Situ Deposited Films of Important EUV Multilayer Materials,
Published: 1/1/1998
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, J M Slaughter, C M Falco
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101763

68. Optical Constants of In-Situ-Deposited Films of Important Extreme-Ultraviolet Multilayer Mirror Materials
Published: 7/1/1998
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, J M Slaughter, Charles M Falco
Abstract: We have performed angle-dependent reflectance measurements of in-situ magnetron sputtered films of B^d4^C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of appro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840047

69. Optical Properties of Silicon and its Oxides,
Published: 1/1/1993
Authors: Charles S Tarrio, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101766

70. Optics contamination studies in support of high-throughput EUV lithography tools
Published: 3/25/2011
Authors: Shannon Bradley Hill, Fardina Asikin, Lee J Richter, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, Sergiy Yulin, Mark Schurmann, Viatcheslav Nesterenko, Torsten Feigl
Abstract: We report on optics contamination rates induced by exposure to broad-bandwidth, high-intensity EUV radiation peaked near 8 nm in a new beamline at the NIST synchrotron. The peak intensity of 50 mW/mm2 allows extension of previous investigations of c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908291



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