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Displaying records 11 to 20 of 77 records.
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11. Chemically Amplified Resist Fundamentals Studies by Combinatorial approaches
Published: 3/1/2003
Authors: M Wang, Vivek M Prabhu, Eric K Lin, Michael J Fasolka, Alamgir Karim
Abstract: Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental ...

12. Control of Moisture at Buried Polymer / Alumina Interfaces Through Subtrate Surface Modification
Published: 3/15/2005
Authors: B D. Vogt, Vivek M Prabhu, Christopher L Soles, Sushil K. Satija, Eric K Lin, Wen-Li Wu
Abstract: Moisture absorption in poly(4-tert-butoxycarbonyl-oxystyrene) (PBOCSt) films supported on Al2O3 sputter coated silicon wafers is measured using neutron and x-ray reflectivity. Accumulation of water at the interface during moisture exposure results in ...

13. Control of Moisture at Buried Polymer/Alumina Interfaces through Substrate Surface Modification
Published: 1/1/2005
Authors: B D. Vogt, Vivek M Prabhu, Christopher L Soles, Sushil K. Satija, Eric K Lin, Wen-Li Wu

14. Copolymer Fraction Effect on Acid Catalyzed Deprotection Reaction Kinetics in Model 193 nm Photoresists
Published: 2/19/2006
Authors: Shuhui Kang, Vivek M Prabhu, B D. Vogt, Eric K Lin, Wen-Li Wu, Karen Turnquest
Abstract: A correlation between polymer molecular structure and acid catalyzed kinetics is demonstrated by a binary copolymer photoresists system which includes an acid-liable and an acid-inert species. It was found that the acid catalyzed deprotection kinetic ...

15. Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists
Published: 7/1/2004
Authors: Ronald Leland Jones, Vivek M Prabhu, D M Goldfarb, Eric K Lin, Christopher L Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, M Angelopoulos
Abstract: A model bilayer geometry is used to examine fundamental contributions of in-situ reaction front profile width on resulting line edge roughness after development in standard 0.26 N tetramethyl ammonium hydroxide aqueous base developer. The bilayer ge ...

16. Counterion Associative Behavior with Flexible Polyelectrolytes
Published: 1/1/2004
Authors: Vivek M Prabhu, Eric J. Amis, D P Bossev, N S Rosov

17. Counterion Structure and Dynamics in Polyelectrolyte Solutions
Published: 6/23/2005
Author: Vivek M Prabhu

18. Counterion associative behavior with flexible polyelectrolytes
Published: 9/1/2004
Authors: Vivek M Prabhu, Eric J. Amis, N S Rosov
Abstract: At low ionic strength, organic counterions dress a flexible charged polymer as measured directly by small-angle neutron scattering (SANS) and neutron spin-echo (NSE) spectroscopy. This dressed state, quantified by the concentration dependence of th ...

19. Deprotection Kinetics in 193 nm Photoresist Thin Films: Influence of Copolymer Content
Published: 7/25/2006
Authors: Shuhui Kang, Vivek M Prabhu, B D. Vogt, Eric K Lin, Wen-Li Wu, Karen Turnquest
Abstract: The reaction-diffusion mechanism of photoacids is dependent upon many variables including the reaction rate, size of the acid counterion species and temperature. Recent experiments have demonstrated the acid diffusion can be controlled by a combinat ...

20. Deprotection Volume Characteristics and Line Edge Morphology in Chemically Amplified Resists
Published: 6/1/2003
Authors: Ronald Leland Jones, C G Willson, T J Hu, Vivek M Prabhu, Christopher L Soles, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos, B C Trinque
Abstract: The focus of this paper is the form of spatial heterogeneity of deprotection at the eventual pattern edge. The form results from the packing of fuzzy blobs consisting of volumes of deprotection created by individual photogenerated acids. The for ...

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