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Displaying records 121 to 130 of 134 records.
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121. Studies of Ion Bombardment in High Density Plasmas Containing CF^d4^
Published: 7/1/1999
Authors: James K Olthoff, Yicheng Wang
Abstract: We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6462

122. Studies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference RF Reference Cell
Series: Journal of Research (NIST JRES)
Published: 7/1/1995
Authors: James K Olthoff, Richard J. Van Brunt, S. B. Radovanov
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=22332

123. Studies of Unoccupied Orbitals of BF3 and BCI3 by Electron Transmission Spectroscopy and Multiple Scattering Xa Calculations
Published: 1/1/1986
Authors: J. A. Tossell, J. H. Moore, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32404

124. Sulfur Hexafluoride and the Electric Power Industry
Published: 9/1/1997
Authors: Loucas G. Christophorou, James K Olthoff, Richard J. Van Brunt
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=29211

125. The Gaseous Electronics Conference RF Reference Cell?An Introduction
Series: Journal of Research (NIST JRES)
Published: 7/1/1995
Authors: James K Olthoff, K E Greenberg
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=22811

126. The Gaseous Electronics Conference Radio-frequency Reference Cell: A Defined Parallel-plate Radio-frequency System for Experimental and Theoretical Studies of Plasma-processing Discharges
Published: 1/1/1994
Authors: J R Roberts, James K Olthoff, James R Whetstone, Richard J. Van Brunt, Mark A Sobolewski
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=13313

127. The Gaseous Electronics Conference radio-frequency reference cell: a defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma processing discharges
Published: 1/1/1994
Authors: P J Hargis, Jr, K E Greenberg, P A Miller, J B Gerardo, J R Torczynski, M E Riley, G A Hebner, J R Roberts, James K Olthoff, J R Whet-stone, R R Van brunt, M A Sobolewski, H M Anderson, M P Splichal, J L Mock, P Bletzinger, A Garscadden, R A Gottscho, G Selwyn, M Dalvie, J E Heidenreich, J W Butter-baugh, M L Brake, M L Passow, J Pender, A Lujan, M E Elta, D Graves, H H Sawin, M J Kuschner, J T Verdeyen, R Horwath, T R Turner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=102134

128. The NIST Plan for Providing Public Access to Results of Federally Funded Research
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 8084
Published: 10/27/2015
Authors: Katherine E Sharpless, Regina Lorraine Avila, Sally Skidmore Bruce, Wo L Chang, Robert M Dimeo, Virginia Covahey, Alan K Dohne, Heather M Evans, Aaron P Fein, Donna J Kimball, Andrea M Medina-Smith, Alan Edwin Munter, James K Olthoff, Dianne L Poster, Kathleen M Roberts, Susannah B Schiller, John Henry j Scott, Barbara P Silcox, James A St Pierre, Mark D Stiles
Abstract: Documentation of the evolution of NIST's plan for providing public access to results of federally funded research is provided, including the plan itself, responses to comments made by NIST staff, and public comments received in response to a requ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919416

129. Time-resolved Balmer-alpha Emission from Fast Hydrogen Atoms in Low Pressure, Radio-Frequency Discharges in Hydrogen
Published: 5/1/1995
Authors: S. B. Radovanov, Krzysztof Dzierzega, J R Roberts, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2388

130. Time-resolved Measurements of Ion Energy Distributions and Optical Emissions in Pulsed Radio-Frequency Discharges
Published: 3/1/2000
Authors: Yicheng Wang, Eric C Benck, Martin Misakian, M. Edamura, James K Olthoff
Abstract: In pulse-modulated inductively coupled plasmas generated in CF^d4^:Ar mixtures, a transition between a capacitive coupling mode (E mode) and an inductive coupling mode (H mode) was observed. For a pulsed plasma in a 50%CF^d4^:50%Ar volume mixture wi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=9483



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