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You searched on: Author: thomas lucatorto Sorted by: title

Displaying records 61 to 70 of 108 records.
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61. New Ultraviolet Radiometry Beamline at the Synchrotron Ultraviolet Radiation Facility at NIST
Published: 1/1/1998
Authors: Ping-Shine Shaw, Keith R. Lykke, Thomas R. O'Brian, Uwe Arp, H H White, Thomas B Lucatorto, J L Dehmer, Albert C Parr, R Gupta
Abstract: We have constructed a new (UV) radiometry facility at the Synchrotron Ultraviolet Radiation Facility [SURF II] at the National Institute of Standards and Technology (NIST). The facility combines a high-throughput normal-incidence monochromator with ...

62. Optical Constants of In-Situ Deposited Films of Important EUV Multilayer Materials,
Published: 1/1/1998
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, J M Slaughter, C M Falco

63. Optical Constants of In-Situ-Deposited Films of Important Extreme-Ultraviolet Multilayer Mirror Materials
Published: 7/1/1998
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, J M Slaughter, Charles M Falco
Abstract: We have performed angle-dependent reflectance measurements of in-situ magnetron sputtered films of B^d4^C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of appro ...

64. Optics contamination studies in support of high-throughput EUV lithography tools
Published: 3/25/2011
Authors: Shannon Bradley Hill, Fardina Asikin, Lee J Richter, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, Sergiy Yulin, Mark Schurmann, Viatcheslav Nesterenko, Torsten Feigl
Abstract: We report on optics contamination rates induced by exposure to broad-bandwidth, high-intensity EUV radiation peaked near 8 nm in a new beamline at the NIST synchrotron. The peak intensity of 50 mW/mm2 allows extension of previous investigations of c ...

65. Optics for Extreme Ultraviolet Lithography
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a m ...

66. Optics go to extremes in EUV lithography
Published: 1/1/2005
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto

67. Pioneering use of Synchrotron Radiation Research as a spectroscopic and metrological tool at NBS
Published: 8/14/2015
Authors: Charles S Tarrio, Keith Codling, Ederer David, Uwe Arp, Charles W Clark, Thomas B Lucatorto
Abstract: Interest in the use of Synchrotron Radiation (SR) as a source of continuum in the extreme ultraviolet (EUV) spectral region was stimulated by the 1956 Physical Review article by Diran Tomboulian and Paul Hartman of Cornell University. In their all-t ...

68. Polymer Photochemistry at the EUV Wavelength
Published: 6/8/2010
Authors: Charles S Tarrio, Theodore Fedynyshyn, Russell Goodman, Alberto Cabral, Thomas B Lucatorto

69. Post-Polish Figuring of Optical Surfaces Using Multilayer Deposition, ed. by G. Kubiak and D. Kania
Published: 1/1/1996
Authors: Charles S Tarrio, E Spiller, C J Evans, Thomas B Lucatorto, Charles W Clark

70. Precision Spectroscopy in He as a Test of QED
Published: 1/1/1999
Authors: S D Bergeson, A Balakrishnan, G H Baldwin, Thomas B Lucatorto, J P Marangos, T J McIlrath, Thomas R. O'Brian, S L. Rolston, Craig J Sansonetti, J Wen, N Westbrook, C H Cheng, E E Eyler

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