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You searched on: Author: joseph kopanski Sorted by: title

Displaying records 61 to 70 of 116 records.
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61. Influence of Metal¿MoS2 Interface on MoS2 Transistor Performance: Comparison of Ag and Ti Contacts
Published: 12/16/2014
Authors: Hui H. Yuan, Guangjun Cheng, Lin You, Haitao Li, Hao Zhu, Wei Li, Joseph J Kopanski, Yaw S Obeng, Angela R Hight Walker, David J Gundlach, Curt A Richter, D. E Ioannou, Qiliang Li
Abstract: In this work, we present a study of enhancing MoS2 transistor performance by using proper metal contact. We found that the on-state current of MoS2 field-effect transistors with 30 nm Au/ 30 nm Ag contacts is enhanced more than 60 times and the subth ...

62. Intermittent-Contact Scanning Capacitance Microscope for Lithographic Overlay Measurement
Published: 5/11/1998
Authors: Joseph J Kopanski, Santos D Mayo
Abstract: A new scanning capacitance microscope (SCM) mode was implemented by using an atomic force microscope (AFM) operated in intermittent contact and by measuring the tip-to-sample capacitance change at the tip vibration frequency. The intermittent-contac ...

63. Intermittent-Contact Scanning Capacitance Microscopy Imaging and Modeling for Overlay Metrology
Published: 12/31/1998
Authors: Santos D Mayo, Joseph J Kopanski, William F Guthrie

64. Limitations of the Calibration Curve Method for Determining Dopant Profiles from Scanning Capacitance Microscope Measurements
Published: 3/1/2000
Authors: Jay F. Marchiando, Joseph J Kopanski, John Albers
Abstract: The calibration or conversion curve method (CCM) refers here to using a database of calculations of the capacitance done for a matrix set of model parameters, such as oxide thickness, uniform dopant density, etc., as one method for interpreting scann ...

65. Limitations of the Calibration Curve Method for Determining Dopant Profiles from Scanning Capacitance Microscope Measurements
Published: 6/1/1999
Authors: Jay F. Marchiando, Joseph J Kopanski, John Albers

66. MIS Capacitor Studies on Silicon Carbide Single Crystals: Final Report for May 8, 1989 to November 8, 1989
Series: NIST Interagency/Internal Report (NISTIR)
Published: 7/1/1990
Author: Joseph J Kopanski

67. Measurement Science for "More-Than-Moore" Technology Reliability Assessments
Published: 10/12/2012
Authors: Chukwudi Azubuike Okoro, Jungjoon Ahn, Meagan V. Kelso, Pavel Kabos, Joseph J Kopanski, Yaw S Obeng
Abstract: In this paper, we will present an overview of metrology issues and some of the techniques currently under development in our group at NIST, aimed at understanding some of the potential performance limiting issues in such highly integrated systems ...

68. Metrology for Nanosystems and Nanoelectronics Reliability Assessments
Published: 8/20/2012
Authors: Yaw S Obeng, Chukwudi Azubuike Okoro, Joseph J Kopanski
Abstract: The traditional models and techniques for studying reliability in integrated circuits may not be appropriate for nanoelectronics and nanosystems. In this paper, we present an overview of a number of materials and metrology techniques currently un ...

69. Microwave-Based Metrology Platform Development: Application of Broad-Band RF Metrology to Integrated Circuit Reliability Analyses
Published: 5/12/2014
Authors: Lin You, Chukwudi Azubuike Okoro, Jungjoon Ahn, Joseph J Kopanski, Yaw S Obeng
Abstract: In this paper we describe the development of a suite of techniques, based on the application of high frequency electromagnetic waves, to probe material and structural changes in integrated circuits under various external perturbations. We discuss how ...

70. Models for Interpreting Measurements Scanning Capacitance Microscope Measurements
Published: 12/31/1997
Authors: Jay F. Marchiando, J R. Lowney, Joseph J Kopanski

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  • SP 250-XX: Calibration Services
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