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Author: hui zhou
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1. Dependency of Morphology on Miscut Angle for Si(111) Etched in NH^d4^F
Published: 5/1/2003
Authors: Joseph Fu, Hui H. Zhou, John A Kramar, Richard M Silver, S Gonda
Abstract: Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH^d4^F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the numbe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823151

2. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: 3/11/2004
Authors: James D Gilsinn, Hui H. Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822480

3. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Published: 3/25/2013
Authors: Jing Qin, Hui H. Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912961

4. 3-D Optical Metrology of Finite sub-20nm Dense Arrays With sub-nanometer Parametric Uncertainties
Published: 6/23/2013
Authors: Jing Qin, Hui H. Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: A new approach that involves parametric fitting of 3-D scattered field with electromagnetic simulation, Fourier domain normalization, and uncertainties analysis is presented to rigorously analyze 3-D through-focus optical images of targets that scatt ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913511

5. A Bayesian Statistical Model for Hybrid Metrology to Improve Measurement Accuracy
Published: 7/31/2011
Authors: Richard M Silver, Nien F Zhang, Bryan M Barnes, Jing Qin, Hui H. Zhou, Ronald G Dixson
Abstract: We present a method to combine measurements from different techniques that reduces uncertainties and can improve measurement throughput. The approach directly integrates the measurement analysis of multiple techniques that can include different conf ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908377

6. A Macro-Micro Motion System for a STM
Published: 6/13/2002
Authors: Bradley N Damazo, James D Gilsinn, Richard M Silver, Hui H. Zhou
Abstract: As nano-lithography improves, more companies and research groups have the capability to create nano-scale structures. Scanning Tunneling Microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One difficulty is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821683

7. A New Design and Uncertainty Budget for a Metrology UHV-STM Used in Direct Measurements of Atom Spacings
Published: 7/1/2002
Authors: S Gonda, Hui H. Zhou, Joseph Fu, Richard M Silver
Abstract: A basic scheme of direct, highly accurate dimensional measurements of nanostructures is presented. We have constructed a scanning tunneling microscope (STM) unit combined with a diode laser-based Michelson interferometer module. The compact size of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821757

8. A Time-Resolved Kinetic Monte-Carlo Simulation Study On Si (111) Etching
Published: 1/1/2007
Authors: Hui H. Zhou, Joseph Fu, Richard M Silver
Abstract: In this paper we have extended the Kinetic Monte-Carlo simulation method to study the etching dynamics of Si (111) surfaces in NH4F in a time-resolved basis. We have examined the step-flow dynamics of Si(111) etching using various simulation window s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823196

9. Angle-resolved Optical Metrology using Multi-Technique Nested Uncertainties
Published: 8/15/2009
Authors: Richard M Silver, Bryan M Barnes, Hui H. Zhou, Nien F Zhang, Ronald G Dixson
Abstract: This paper introduces recent advances in scatterfield microscopy using improved normalization and fitting procedures. Reduced measurement uncertainties are obtained through the use of more accurate normalization procedures in combination with better ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902735

10. Coating Kinetics of Fluoropolymer Process Aids for Sharkskin Elimination: The Role of Domain Size
Published: Date unknown
Authors: D Bigio, Mathurin G Meillon, S B. Kharchenko, David C Morgan, Hui H. Zhou, S Oriani, C Macosko, Kalman D Migler
Abstract: We study the ability of fluoropolymer based polymer processing aids (PPA) to eliminate surface melt fracture (sharkskin) during extrusion of polyethylene in relation to blend morphology (PPA droplet size) and processing conditions (shear rate). Under ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852359



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