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Author: nien zhang

Displaying records 11 to 20 of 64 records.
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11. A generalized method for multiple artifacts problem in interlaboratory comparisons with linear trends
Published: 5/22/2009
Authors: Weiping Zhang, Nien F Zhang
Abstract: A generalized statistical approach for interlaboratory comparisons with linear trends is proposed. This new approach can be applied to the general case when the artifacts are measured and reported multiple times in each participating laboratory. The ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=890065

12. Three Statistical Paradigms for The Assessment and Interpretation of Measurement Uncertainty
Published: 1/12/2009
Authors: William F Guthrie, Hung-Kung Liu, Andrew L Rukhin, Blaza Toman, Chih-Ming Wang, Nien F Zhang
Abstract: The goals of this chapter are to present different approaches to uncertainty assessment from a statistical point of view and to relate them to the methods that are currently being used in metrology or are being developed within the metrology communit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51273

13. SIM Comparison of DC Resistance Standards at 1 {Omega}, 1 M{Omega}, and 1 G{Omega}
Published: 1/1/2009
Authors: Dean G Jarrett, Randolph E Elmquist, Nien F Zhang, Alejandra Tonina, M Porfiri, Janice Fernandes, H Schechter, Daniel Izquierdo, C Faverio, Daniel Slomovitz, Dave Inglis, Kai Wendler, Felipe Hernandez-Marquez, B Rodriguez
Abstract: A set of regional comparisons of dc resistance standards at the nominal values of 1 {Omega}, 1 M {Omega}, and 1 G {Omega} has recently been completed in the Sistema Interamericano de Metrogia (SIM) region. The motivation, design, standards, and resu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=33141

14. SIM.EM-K1, 1 Ohm,SIM.EM-K2, 1 GOhm, and SIM.EM-S6, 1 MOhm: RMO COMPARISON REPORT, FINAL REPORT
Published: 1/1/2009
Authors: Randolph E Elmquist, Dean G Jarrett, Nien F Zhang
Abstract: 2006 - 2007 Resistance standards comparison between SIM Laboratories Pilot Laboratory: National Institute of Standards and Technology, Gaithersburg, MD, USA. Revised March 2008.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=33025

15. Allan Variance of Time Series Models of Measurement Data
Published: 9/22/2008
Author: Nien F Zhang
Abstract: The uncertainty of the mean of autocorrelated measurements from a stationary process has been discussed in the literature. However, when the measurements are from a non-stationary process, how to assess their uncertainty remains unresolved. Allan v ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=152041

16. Does the Angle of a Fingerprint Scanner Affect User Performance?
Published: 9/22/2008
Authors: Mary Frances Theofanos, Ross J Micheals, Shahram Orandi, Brian C Stanton, Nien F Zhang, Charles L Sheppard
Abstract: As the deployment of biometric technologies such as fingerprints has become more widespread in government applications there is an increased awareness of the human-computer interaction that such technologies involve. User behavior can impact operatio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51336

17. SIM COMPARISON OF DC RESISTANCE AT 1 Ohm, 1 MOhm, AND 1 GOhm
Report Number: 32890
Published: 6/1/2008
Authors: Dean G Jarrett, Randolph E Elmquist, Nien F Zhang, Alejandra Tonina, Janice Fernandes, Daniel Izquierdo, Dave Inglis, Felipe Hernandez-Marquez
Abstract: A regional comparison of DC resistance standards at the nominal values of 1 Ohm, 1 MOhm, and 1 GOhm has recently been completed in the System Interamericano de Metrogia (SIM) region. The motivation, design, standards, and results of this regional com ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32890

18. How the User can Improve Fingerprint Image Quality
Published: 5/12/2008
Authors: Mary Frances Theofanos, Ross J Micheals, Shahram Orandi, Brian C Stanton, Nien F Zhang
Abstract: Traditionally the biometric field has viewed the user as a passive source of the biometric sample rather than an interactive component of the biometric system. But fingerprint image quality is highly dependent on the human computer interaction and us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51194

19. Usability Testing of Height and Angles of Ten-Print Fingerprint Capture
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7504
Published: 5/11/2008
Authors: Mary Frances Theofanos, Brian C Stanton, Charles L Sheppard, Ross J Micheals, John W. Wydler II, Nien F Zhang, Lawrence Nadel, William Rubin
Abstract: As the deployment of biometric technologies such as fingerprints has become more widespread in government applications there is an increased awareness of the human-computer interaction that such technologies involve. User behavior can impact operatio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=152149

20. Usability Testing of Ten-Print Fingerprint Capture
Published: 10/8/2007
Authors: Brian C Stanton, Mary Frances Theofanos, Shahram Orandi, Ross J Micheals, Nien F Zhang
Abstract: Despite the increased deployment of biometric technologies in United States government applications, not enough attention is being paid to the human factors that such technologies involve. The use of biometric applications will be unfamiliar to many ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51098



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