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You searched on: Author: john woodward iv

Displaying records 11 to 20 of 49 records.
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11. Mechanism of Formation of Vesicle Fused Phospholipid Monolayers on Alkanethiol Self-Assembled Monolayer Supports
Published: 6/15/2009
Authors: John Taylor Woodward IV, Curtis W Meuse

12. Absolute Flux Calibration of Stars; Calibration of the Reference Telescope
Published: 6/2/2009
Authors: Allan W. Smith, John Taylor Woodward IV, Colleen Alana Jenkins, Steven W Brown, Keith R Lykke
Abstract: Absolute stellar photometry is based on 1970s terrestrial measurements of the star Vega with instruments calibrated using the Planckian radiance from a Cu fixed-point blackbody. Significant advances in absolute radiometry have been made in the last 3 ...

13. Supercontinuum Sources for Metrology
Published: 6/2/2009
Authors: John Taylor Woodward IV, Allan W. Smith, Colleen Alana Jenkins, Chungsan Lin, Steven W Brown, Keith R Lykke
Abstract: Supercontinuum (SC) sources are novel laser-based sources that generate a broad, white-light continuum in single mode photonic crystal fibers. Currently, up to 6 W of optical power is available, spanning the spectral range from 460 nm to 2500 nm. A ...

14. Characterization of the Latent Image to Developed Image in Model EUV Photoresists
Published: 2/22/2008
Authors: John Taylor Woodward IV, Kwang-Woo Choi, Vivek M Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and proc ...

15. Component Segregation in Model Chemically Amplified Resists
Published: 3/15/2007
Authors: John Taylor Woodward IV, Theodore Fedynyshyn, David Astolfi, Susan Cann, Michael Leeson
Abstract: We have applied chemical force microscopy (CFM) to probe the chemical segregation of resist materials. CFM is capable of providing simultaneous information about surface topography and chemical heterogeneity of partiallt developed resist films. We ...

16. Molecular-scale structural and functional characterization of sparsely tethered bilayer lipid membranes
Published: 3/1/2007
Authors: Duncan J. McGillivray, Gintaras Valincius, David J Vanderah, W. Febo-Ayala, John Taylor Woodward IV, Frank Heinrich, John J Kasianowicz, Mathias Losche

17. Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist
Published: 2/25/2007
Authors: Kwang-Woo Choi, Vivek M Prabhu, Kristopher Lavery, Eric K Lin, Wen-Li Wu, John Taylor Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Abstract: Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and pr ...

18. The effect of surface chemistry on the formation of thin films of native fibrillar collagen
Published: 2/1/2007
Authors: John T Elliott, John Taylor Woodward IV, A. Umarji, Y. Mei, Alessandro Tona

19. -Component Segregation in Model Chemically Amplified Resists,-
Published: 1/1/2007
Authors: John Taylor Woodward IV, T H Fedynyshyn, D K Astolfi, Susan Cann, J R Roberts, M K Leeson

20. Hunting the Origins of Line Width Roughness with Chemical Force Microscopy
Published: 1/1/2007
Authors: John Taylor Woodward IV, Jeeseong Hwang, V and Choi Prabhu

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