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Author: john woodward iv

Displaying records 11 to 20 of 46 records.
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11. Characterization of the Latent Image to Developed Image in Model EUV Photoresists
Published: 2/22/2008
Authors: John Taylor Woodward IV, Kwang-Woo Choi, Vivek M Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and proc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853583

12. Component Segregation in Model Chemically Amplified Resists
Published: 3/15/2007
Authors: John Taylor Woodward IV, Theodore Fedynyshyn, David Astolfi, Susan Cann, Michael Leeson
Abstract: We have applied chemical force microscopy (CFM) to probe the chemical segregation of resist materials. CFM is capable of providing simultaneous information about surface topography and chemical heterogeneity of partiallt developed resist films. We ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841082

13. Molecular-scale structural and functional characterization of sparsely tethered bilayer lipid membranes
Published: 3/1/2007
Authors: Duncan J. McGillivray, Gintaras Valincius, David J Vanderah, W. Febo-Ayala, John Taylor Woodward IV, Frank Heinrich, John J Kasianowicz, Mathias Losche
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906578

14. Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist
Published: 2/25/2007
Authors: Kwang-Woo Choi, Vivek M Prabhu, Kristopher Lavery, Eric K Lin, Wen-Li Wu, John Taylor Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Abstract: Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852725

15. The effect of surface chemistry on the formation of thin films of native fibrillar collagen
Published: 2/1/2007
Authors: John T Elliott, John Taylor Woodward IV, A. Umarji, Y. Mei, Alessandro Tona
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908012

16. -Component Segregation in Model Chemically Amplified Resists,-
Published: 1/1/2007
Authors: John Taylor Woodward IV, T H Fedynyshyn, D K Astolfi, Susan Cann, J R Roberts, M K Leeson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104253

17. Hunting the Origins of Line Width Roughness with Chemical Force Microscopy
Published: 1/1/2007
Authors: John Taylor Woodward IV, Jeeseong Hwang, V and Choi Prabhu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101779

18. The effect of surface chemistry on the formation of thin films of native fibrillar collagen
Published: 1/1/2007
Authors: J T Elliott, John Taylor Woodward IV, A. Umarji, Y. Mei, A. Tona
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101736

19. The effect of surface chemistry on the formation of thin films of native fibrillar collagen
Published: 1/1/2007
Authors: J T Elliott, John Taylor Woodward IV, A. Umarji, Y. Mei, A. Tona
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=103730

20. Novel chemical detection strategies for trichloroethylene and perchloroethylene, ed. by P.W. Wang and T. Zachry
Published: 1/1/2006
Authors: A C Pipino, J P Hoefnagles, John Taylor Woodward IV, C W Meuse, V Silin
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104713



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