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Author: william wallace

Displaying records 71 to 80 of 95 records.
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71. Absolute Molecular Orientational Distribution of the Polystyrene Surface
Published: 4/1/2001
Authors: Kimberly A Briggman, John C. Stephenson, William E Wallace III, Lee J Richter
Abstract: Vibrationally-resonant sum frequency generation (VR-SFG) has been used to study the absolute molecular orientational distribution of the pendant phenyl groups at the free surface of polystyrene (PS) thin films on oxidized Si substrates. Characteriza ...

72. Mass Spectrometry of Spin-On-Glass Low-K Dielectric Precursors
Published: 4/1/2001
Authors: William E Wallace III, Kathleen M. Flynn, Joseph M Antonucci
Abstract: The degree-of-intramolecular-condensation, defined as the number of residual silanol (SiOH) groups per oligomer, for a variety of silsesquioxane polymers was measured by matrix-assisted laser desorption/ionization time-of-flight mass spectrometry. R ...

73. NIST-Sponsored Interlaboratory Comparison of Polystyrene Molecular Mass Distribution Obtained by Matrix-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry: Statistical Analysis
Published: 3/1/2001
Authors: Charles Martin Guttman, S Wetzel, William R. Blair, B M Fanconi, Kathleen M. Flynn, R J Goldschmidt, William E Wallace III, David Lloyd VanderHart
Abstract: Matrix-assisted laser desorption/ionization time of flight mass spectrometry (MALDI-TOF-MS) is becoming a new and important technique in synthetic polymer characterization. Yet much is still unknown about the molecular mass distribution (MWD) which ...

74. Abstracts for the MSEL Assessment Panel, March 2001
Published: 1/26/2001
Authors: Leslie E Smith, Alamgir Karim, Leonid A Bendersky, C Lu, J J Scott, Ichiro Takeuchi, Kathleen M. Flynn, Vinod K Tewary, Davor Balzar, G A Alers, Stephen E Russek, Charles C. Dr. Han, Haonan Wang, William E Wallace III, Daniel A Fischer, K Efimenko, Wen-Li Wu, Jan Genzer, Joseph C Woicik, Thomas H Gnaeupel-Herold, Henry Joseph Prask, Charles F Majkrzak, Norman Frederic Berk, John G Barker, Charles J. Glinka, Eric K Lin, Ward L Johnson, Paul R Heyliger, David Thomas Read, R R Keller, J Blendell, Grady S White, Lin-Sien H Lum, Eric J Cockayne, Igor Levin, C E Johnson, Maureen E Williams, Gery R Stafford, William J Boettinger, Kil Won Moon, Daniel Josell, Daniel Wheeler, Thomas P Moffat, W H Huber, Lee J Richter, Clayton S. Yang, Robert D Shull, R A. Fry, Robert D McMichael, William F. Egelhoff Jr., Ursula R Kattner, James A Warren, Jonathan E Guyer, Steven P Mates, Stephen D Ridder, Frank S. Biancaniello, D Basak, Jon C Geist, Kalman D Migler
Abstract: Abstracts relating to research and development in the NIST Materials Science and Engineering Laboratory (MSEL) are presented for a poster session to be presented to the 2001 MSEL Assessment Panel.

75. Covalent Cationization Method for the Analysis of Polyethylene by Mass Spectrometry
Published: 1/1/2001
Authors: Barry J. Bauer, William E Wallace III, B M Fanconi, Charles Martin Guttman

76. Electrospray FTMS and MALDI TOF MS Characterization of [(O3/2SiMe)x(OSi(OH)Me)y(OSiMe2)z] Silsesquioxane Resin
Published: 1/1/2001
Authors: R E Tecklenburg, H Chen, William E Wallace III

77. Mass Spectroscopy of Spin-on-glass Low-k Dielectric Precursors
Published: 1/1/2001
Authors: William E Wallace III, Charles Martin Guttman, Joseph M Antonucci

78. Surface Analysis Studies of Yield Enhancements in Secondary Ion Mass Spectrometry by Polyatomic Projectiles
Published: 1/1/2001
Authors: E Fuoco, G Gillen, M B Wijesundara, William E Wallace III, L Hanley

79. Wafer Level Underfill: Experiments and Modeling.
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6731
Published: 1/1/2001
Authors: Daniel Josell, William E Wallace III, Daniel Wheeler

80. Thermal Expansion Coefficients of Low-K Dielectric Films From Fourier Analysis of X-Ray Reflectivity
Published: 7/1/2000
Authors: Charles E. Bouldin, William E Wallace III, G W Lynn, S C Roth, Wen-Li Wu
Abstract: We determine the thermal expansion coefficient of a fluorinated poly (arylene ether) low-k dielectric film using Fourier analysis of x-ray reflectivity data. The approach is similar to that used in Fourier analysis of x-ray absorption fine structure. ...

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