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You searched on: Author: john villarrubia

Displaying records 11 to 20 of 92 records.
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11. Stylus Tip-Size Effect on the Calibration of Periodic Roughness Specimens with Rectangular Profiles
Published: 3/21/2012
Authors: Thomas B Renegar, Johannes A Soons, Balasubramanian Muralikrishnan, John S Villarrubia, Xiaoyu A Zheng, Theodore Vincent Vorburger, Jun-Feng Song
Abstract: Stylus instruments are widely used for surface characterization. It is well known that the size and shape of the stylus tip affects the measured surface geometry and parameters. In most cases, increasing the tip size decreases the measured Ra value b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911079

12. VCI Simulation with Semiconductor Device Models: Test Report
Published: 2/29/2012
Author: John S Villarrubia
Abstract: JMONSEL, an electron beam imaging simulator, has been modified to permit conducting regions of a sample to be designated as unconnected to an external source or sink of charge (floating) or, alternatively, to be connected with a user-specified relaxa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910799

13. NIST Simulation of E-beam Inspection and CD-SEM in-line metrology: Final Report
Published: 1/1/2011
Author: John S Villarrubia
Abstract: This report summarizes results from a two-year project to develop a simulator for electron beam inspection and critical dimension scanning electron microscope (SEM) inline metrology tools. The development attempts to improve on prior simulators and d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907582

14. Proximity-associated errors in contour metrology
Published: 3/31/2010
Authors: John S Villarrubia, Ronald G Dixson, Andras Vladar
Abstract: In contour metrology the CD-SEM (critical dimension scanning electron microscope) assigns a continuous boundary to extended features in an image. The boundary is typically assigned as a simple function of the signal intensity, for example by a bright ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905141

15. NIST Simulation of E-beam Inspection and CD-SEM in-line metrology: Interim Report for 1st year of project
Published: 3/1/2010
Author: John S Villarrubia
Abstract: This report summarizes results from the first year of a 2-year project to develop a simulator for electron beam (e-beam) inspection and critical dimension-scanning electron microscope (CD-SEM) inline metrology tools. The goal is to improve on previou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904929

16. Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: The imaging and measurement of nanostructures such as particles, carbon nanotubes, and quantum dots have placed new demands on the high resolution imaging capabilities of scanning electron microscopes. A barrier to accurate dimensional metrology is t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902308

17. Sensitivity of SEM width measurements to model assumptions
Published: 3/31/2009
Authors: John S Villarrubia, Zejun Ding
Abstract: The most accurate width measurements in a scanning electron microscope (SEM) require raw images to be corrected for instrumental artifacts. Corrections are based upon a physical model that describes the sample-instrument interaction. Models differ in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901733

18. Blind estimation of general tip shape in AFM imaging
Published: 12/1/2008
Authors: Fenglei Tian, Xiaoping Qian, John S Villarrubia
Abstract: The use of flared tip and bi-directional servo control in some recent atomic force microscopes (AFM) has made it possible for these advanced AFMs to image structures of general shapes with undercuts and reentrant surfaces. Since AFM images are distor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824643

19. Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM
Published: 3/24/2008
Authors: Chengqing C. Wang, Ronald Leland Jones, Kwang-Woo Choi, Christopher L Soles, Eric K Lin, Wen-Li Wu, James S Clarke, John S Villarrubia, Benjamin Bunday
Abstract: Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall roughness in patterns ranging from (10 to 500) nm in pitch with sub nm precision. These capabili ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853580

20. Monte Carlo Modeling of Secondary Electron Imaging in Three Dimensions
Published: 3/1/2007
Authors: John S Villarrubia, Nicholas W m Ritchie, J R. Lowney
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913838



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