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Author: john small
Displaying records 31 to 35.
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31.
Depth Profiling Using C^d60^+ SIMS Deposition and Topography Development During Bombardment of Silicon
Published: Date unknown
Authors: John G Gillen, J Batteas, Chris A Michaels, P Chi, John A Small, Eric S Windsor, Albert J. Fahey, Jennifer R Verkouteren, W Kim
Abstract: A C60+ primary ion source has been coupled to an ion microscope SIMS instrument to examine sputtering of silicon with an emphasis on possible application of C60+ depth profiling for high depth resolution SIMS analysis of silicon semiconductor materi
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831392
32.
Electron Microprobe Characterization of Si-Ge Alloys and Films for Use as Microanalysis Reference Materials
Published: Date unknown
Authors: Ryna B. Marinenko, Shirley Turner, Dale E Newbury, Robert L. Myklebust, Lee Lijian Yu, Rolf Louis Zeisler, David S Simons, John A Small
Abstract: Bulk SiGe wafers cut from single-crystal boules and SiGe thick films on Si wafers were evaluated with the electron probe microanalyzer for the extent of heterogeneity and composition for use as reference standards needed by the microelectronics ind
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831405
33.
Manganese-Enhanced Magnetic Resonance Microscopy of Mineralization
Published: Date unknown
Authors: I Chesnick, T Todorov, J M Centeno, Dale E Newbury, John A Small, K Potter
Abstract: Paramagnetic manganese (II) can be employed as a calcium surrogate to enhance the sensitivity of the magnetic resonance microscopy (MRM) technique to the processing of calcium during the bone formation process. At high doses, osteoblasts can take up
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831423
34.
Report from the NIST-MAS Workshop on The Accuracy Barrier in Quantitative EPMA and the Role of Standards
Published: Date unknown
Authors: Dale E Newbury, Ryna B. Marinenko, J T. Armstrong, John A Small, Eric B Steel
Abstract: stract is attached.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831292
35.
The Impact of the Transition Edge Sensor Microcalorimeter Energy Dispersive X-Ray Spectrometer on Electron Probe Microanalysis
Published: Date unknown
Authors: Dale E Newbury, Kent D Irwin, Gene C Hilton, David A Wollman, John A Small, John M Martinis
Abstract: Electron probe x-ray microanalysis is based upon the use of a focused, high current density electron beam, 5 keV to 30 keV in energy, to excite characteristic x-rays from a picogram mass of a solid target. X-ray spectral measurements are currently p
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831321