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Author: richard silver

Displaying records 61 to 70 of 113 records.
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61. Dynamic Modeling and Vibration Analysis of a UHV Scanning Tunneling
Published: 8/17/2005
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver, James D Gilsinn
Abstract: Techniques based on scanning probe microscopy (SPM) are used to fabricate surface structures with dimensions ranging from 10 - 100mm. These structures have been fabricated and imaged using a scanning tunneling microscope (STM), and the STM requires ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822269

62. High-resolution Optical Metrology
Published: 5/1/2005
Authors: Richard M Silver, Ravikiran (Ravikiran) Attota, Michael T. Stocker, M R Bishop, Lowell P. Howard, Thomas Avery Germer, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822387

63. Characterization of Prototype Silicon Pitch Artifacts Fabricated by Scanning Probe Lithography and Anisotropic Wet Etching
Published: 1/1/2005
Authors: F S Chien, W F Hsieh, S Gwo, Jay Shi Jun, Richard M Silver, Andras Vladar, John A. Dagata
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822246

64. Photomask Metrology, Photomask Fabrication Technology
Published: 1/1/2005
Authors: Richard M Silver, Andras Vladar
Abstract: In this paper we will focus on the different metrology techniques used to measure features on photomasks.  In view of the above discussion, we will focus on the importance of accurately measuring features and developing traceability.  The m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823184

65. The Influence of Defects on the Morphology of Si (111) Etched in NHF
Published: 1/1/2005
Authors: Hui H. Zhou, Joseph Fu, Richard M Silver
Abstract: We have implemented a kinetic Monte-Carlo (KMC) simulation to study the morphologies of Si (111) surfaces etched in NHF. Although our initial simulations reproduced the previous results from Hines, it failed to produce the morphologies observed in ou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823191

66. Evaluation of New In-Chip and Arrayed Line Overlay Target Designs
Published: 5/24/2004
Authors: M P Davidson, M R Bishop, Robert D. Larrabee, Michael T. Stocker, Jay Shi Jun, Egon Marx, Richard M Silver, Ravikiran (Ravikiran) Attota
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822156

67. Evaluation of New In-Chip and Arrayed Line Overlay
Published: 5/1/2004
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, M R Bishop, Egon Marx, Jay Shi Jun, Michael T. Stocker, M P Davidson, Robert D. Larrabee
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822386

68. High-Resolution Optical Overlay Metrology
Published: 5/1/2004
Authors: Richard M Silver, Ravikiran (Ravikiran) Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822155

69. Improving the Uncertainty of Photomask Linewidth Measurements
Published: 5/1/2004
Authors: J Pedulla, James Edward Potzick, Richard M Silver
Abstract: The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of calibration than the previous NIST standards (SRMs 473, 475, 476). In calibrating these s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822175

70. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: 3/11/2004
Authors: James D Gilsinn, Hui H. Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822480



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