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You searched on: Author: richard silver

Displaying records 61 to 70 of 121 records.
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61. Advanced Metrology Needs for Nanoelectronics Lithography
Published: 10/1/2006
Authors: Stephen Knight, Ronald Dixon, Ronald Leland Jones, Eric Lin, Ndubuisi G Orji, Richard M Silver, Andras Vladar, Wen-li Wu
Abstract: The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades. While enormous effort has been expended in developing the optical lithography tools to print ever finer features, sign ...

62. Illumination Optimization for Optical Semiconductor Metrology
Published: 9/1/2006
Authors: Bryan M Barnes, L Howard, Richard M Silver
Abstract: Uniform sample illumination via K hler illumination, is achieved by establishing a pair of conjugate focal planes; a light source is focused onto the condenser lens aperture while the image of the field aperture is focused at the plane of the specime ...

63. National Nanotechnology Initiative Interagency Workshop on Instrumentation and Metrology for Nanotechnology Grand Challenge Report
Published: 8/1/2006
Authors: Michael T Postek, Richard R Cavanagh, C M Allocca, Douglas T Smith, Robert D Shull, David A Wollman, David G Seiler, Stephen Knight, A Diebold, Richard M Silver, Charles W Clark, Kevin W Lyons, James R Whetstone, Ronald F Boisvert

64. Damping mechanisms for precision applications in UHV environment
Published: 5/1/2006
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver
Abstract: Surface analysis techniques such as scanning probe microscopy (SPM) have undergone significant advances and are attractive for application to electron and optical devices such as micro lenses, vacuum tubes, electron tubes, etc. For surface stability ...

65. Optical Critical Dimension Measurement and Illumination Analysis using the Through-focus Focus Metric
Published: 3/24/2006
Authors: Ravikiran Attota, Richard M Silver, M R Bishop, Ronald G Dixson
Abstract: In this paper we present utility of the out of focus optical microscope images for metrology applications as opposed to the best focus images. Depending on the type of analysis, considerable beneficial information can be deduced from the out of focus ...

66. Koehler Illumination for High-Resolution Optical Metrology
Published: 3/1/2006
Authors: Martin Y Sohn, Bryan M Barnes, Lowell P. Howard, Richard M Silver, Ravikiran Attota, Michael T. Stocker
Abstract: Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the detailed evaluation and alignment of the illumination optics, we have separated Koehler il ...

67. The Limits of Image-Based Optical Metrology
Published: 3/1/2006
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
Abstract: An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper.  We have developed a set of techniques we refer to as scatterfield microscopy ...

68. The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calib Standards With a Calibrated AFM at NIST
Published: 9/29/2005
Authors: V W. Tsai, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, R Koning, Richard M Silver, Edwin Ross Williams
Abstract: Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lat ...

69. Dynamic Modeling and Vibration Analysis of a UHV Scanning Tunneling
Published: 8/17/2005
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver, James D Gilsinn
Abstract: Techniques based on scanning probe microscopy (SPM) are used to fabricate surface structures with dimensions ranging from 10 - 100mm. These structures have been fabricated and imaged using a scanning tunneling microscope (STM), and the STM requires ...

70. High-resolution Optical Metrology
Published: 5/1/2005
Authors: Richard M Silver, Ravikiran Attota, Michael T. Stocker, M R Bishop, Lowell P. Howard, Thomas Avery Germer, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combin ...

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