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Author: vivek prabhu
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Displaying records 1 to 10 of 78 records.
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1. Effect of Copolymer Composition on Acid Catalyzed Deprotection Reaction Kinetics in Model Photoresists
Published: 6/25/2006
Authors: Shuhui Kang, Vivek M Prabhu, B D. Vogt, Eric K Lin, Wen-Li Wu, Karen Turnquest
Abstract: The kinetics of an acid-catalyzed deprotection reaction in model photoresist materials was studied as a function of copolymer composition with Fourier Transform Infrared spectroscopy. A mathematical model was developed to analyze the acid catalyzed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852623

2. Additive-Containing Rinses for LER and Defectivity Control During High-Resolution Resist Patterning
Published: Date unknown
Authors: D L Goldfarb, S D Burns, M Angelopolous, S Skordas, R L Burns, M C Lawson, C J Brodsky, V Vishnu, E Jablonski, Vivek M Prabhu, Ronald Leland Jones, B D. Vogt, Christopher Soles, Eric K Lin, Wen-Li Wu
Abstract: The addition of a surface conditioning agent to the de-ionized water rinse used to quench the photoresist development process is an attractive methodology that can afford a controlled decrease in resist line edge roughness (LER) or a reduction in def ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852849

3. Aggregation/agglomeration state of carbon nanotubes
Published: 10/12/2012
Authors: Vivek M Prabhu, Toshiya Okazaki, Takeshi Eitoku, Masayoshi Tange, Haruhisa Kato
Abstract: Evaluation of aggregation and agglomeration of carbon nanotube (CNT) solution has been one of the key issues for applications. Here we introduce a simple method based on depolarized dynamic light scattering (DDLS) performed at multiple scattering ang ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912177

4. Architectural Effects on Reaction-Diffusion Kinetics in Molecular Glass Photoresists
Published: 4/20/2010
Authors: Vivek M Prabhu, Shuhui Kang, Christopher Soles, Christopher K. Ober, Jing Sha, Jin-Kyun Lee, Peter V. Bonnesen
Abstract: Understanding acid reaction-diffusion kinetics is crucial for controlling the lithographic performance of chemically amplified photoresists. In this work, we study how the molecular architectures of positive-tone chemically amplified molecular glass ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904649

5. Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy
Published: 2/9/2007
Authors: Shuhui Kang, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, David Lloyd VanderHart, Ashwin Rao, Karen Turnquest
Abstract: We demonstrate a general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy. Polymer films with varying degrees of heterogeneity were prepared using a model chemically ampl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852648

6. Characterization of the In-Plane Structure of Buried Interfaces by Off-Specular X-Ray and Neutron Reflectometry
Published: 2/14/2008
Authors: Kristopher Lavery, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, Kwang-Woo Choi, Sushil K. Satija, M Wormington
Abstract: Off-specular reflectivity, or diffuse scattering, probes the lateral compositional variations at surfaces and interfaces. Of particular interest is the characterization at buried interfaces for the form and amplitude of roughness. Recent advances i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852736

7. Characterization of the Latent Image to Developed Image in Model EUV Photoresists
Published: 2/22/2008
Authors: John Taylor Woodward IV, Kwang-Woo Choi, Vivek M Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and proc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853583

8. Characterization of the Photoacid Diffusion Length
Published: 2/27/2009
Authors: Shuhui Kang, Vivek M Prabhu, Wen-Li Wu, Eric K Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh
Abstract: The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness (LER) and line-width-roughness (LWR). This paper provides an approach to characterize the pho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902190

9. Characterization of the non-uniform reaction in chemically-amplified calix[4]resorcinarene molecular resist thin films
Published: 7/19/2011
Authors: Vivek M Prabhu, Shuhui Kang, Regis J Kline, Dean M DeLongchamp, Daniel A Fischer, Wen-Li Wu, Sushil K. Satija, Jing Sha, Christopher K. Ober, Peter V. Bonnesen
Abstract: The ccc stereoisomer-purified tert-butoxycarbonyloxy (t-Boc) protected calix[4]resorcinarene molecular resists blended with photoacid generator exhibit a non-uniform photoacid catalyzed reaction in thin films. The surface displays a reduced reaction ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908683

10. Characterization of the photoacid diffusion length and reaction kinetics in EUV photoresists with IR spectroscopy
Published: 4/14/2010
Authors: Shuhui Kang, Wen-Li Wu, Kwang-Woo Choi, Vivek M Prabhu, Anuja De Silva, Christopher K. Ober
Abstract: A soft-contact film transfer method was developed to prepare multilayer photoresist thin films that enable high resolution spectroscopic and reflectivity measurements for determining the reaction-diffusion kinetic parameters and photoacid diffusion ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904320



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