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Author: michael postek
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1. 2005 Metrology for a New Science: Advanced Metrology Needs
Published: 1/1/2005
Author: Michael T Postek
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822383

2. 2005 Variable Pressure/Environmental Scanning Electron Microscopy: Application to Photomask Dimensional Metrology
Published: 1/1/2005
Author: Michael T Postek
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822384

3. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641

4. 3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?
Published: 10/23/2014
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The ability to model the effect of fields due to charges trapped in insulators with floating conductors has been added to JMONSEL (Java Monte Carlo simulator for Secondary Electrons) and applied to a simple photomask metal on glass geometry. These ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917204

5. A Decade of Commitment from the NIST Manufacturing Engineering Laboratory to Nanomanufacturing and Nanometrology
Published: 8/27/2009
Authors: Kevin W Lyons, Michael T Postek
Abstract: Advanced research in nanomanufacturing technologies and processes has continued at an accelerating rate over the past decade. Profitable niche applications such as the use of carbon nanotubes for improving battery performance and nanoparticle-enhance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902648

6. A Kurtosis-Based Statistical Measure for Two-Dimensional Processes and Its Applications to Image Sharpness
Published: 6/30/2003
Authors: Nien F Zhang, Andras Vladar, Michael T Postek, Robert D. Larrabee
Abstract: Fully automated or semiautomatic scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. It is required that these automated instruments be routinely capable of 3 nanometer (nm) or bett ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50812

7. A Lithographic SEM Magnification Standard
Published: 12/1/1988
Authors: Michael T Postek, R. C. Tiberio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100

8. A Monte Carlo Model for SEM Linewidth Metrology
Published: 12/31/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=1721

9. A Monte Carlo Model for SEM Linewidth Metrology
Published: 5/1/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820689

10. A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope
Published: 11/1/1989
Authors: Michael T Postek, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=26670



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