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Author: ndubuisi orji

Displaying records 51 to 54.
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51. Surface Finish and Sub-Surface Metrology
Published: 1/1/2003
Authors: Theodore Vincent Vorburger, Ndubuisi George Orji, Li Piin Sung, T Rodriguez
Abstract: Surface finsih affects the performance of a wide variety of manufactured products ranging from road surfaces and ships to mechanical parts, microelectronics, and optics. Accordingly roughness values can vary over many orders of magnitude. A variety o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822033

52. Surface Metrology Software Variability in Two-Dimensional Measurements
Published: 1/1/2003
Authors: Ndubuisi George Orji, Theodore Vincent Vorburger, Xiaohong Gu, Jayaraman Raja
Abstract: A range of surface texture measurement instruments is available in the market place. Most of the measurement instruments are microcomputer-based systems that contain their own surface analysis software to evaluate measured roughness profiles. After a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822099

53. Silicon Single Atom Steps as AFM Height Standards
Published: 8/1/2001
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore Vincent Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Abstract: Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and roughness measurements at sub-nanometer levels are often of interest. To perform accurate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821579

54. Atomic Level Surface Metrology
Published: 1/1/2001
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Jun-Feng Song, Thomas B Renegar, Joseph Fu, Ndubuisi George Orji, V W. Tsai, E. C. Williams, H Edwards, D Cook, P West, R Nyffenegger
Abstract: MotivationSemiconductor wafers and many types of optical elementsrequire ultra-smooth surfaces in order to functionas specifiedExamples:Laser gyro mirrors with rms roughness ~ 0.1 nmSilicon gate oxides with thickness ~ 3 nm,rms roughness must be sign ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823146



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