NIST logo

Publications Portal

You searched on:
Author: ndubuisi orji

Displaying records 31 to 40 of 59 records.
Resort by: Date / Title


31. Nano- and Atomic-Scale Length Metrology
Published: 12/14/2007
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W Cresswell, Richard A Allen, William F Guthrie, Wei Chu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824603

32. Photoresist Cross-sectioning with Negligible Damage using a Dual-beam FIB-SEM: A High Throughput Method for Profile Imaging
Published: 11/1/2007
Authors: James Clarke, Martin Schmidt, Ndubuisi George Orji
Abstract: Imaging of photoresist cross sections in a focused ion beam (FIB)-scanning electron microscope (SEM) is demonstrated with negligible damage. An in situ chromium sputtering technique is used to deposit metal on the site of interest, replacing the co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823232

33. Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 10/1/2007
Authors: Ronald G Dixson, Ndubuisi George Orji, James Edward Potzick, Joseph Fu, Michael W Cresswell, Richard A Allen, S J Smith, Anthony J Walton
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology.  Two major instruments are being used for traceable measurements.  The first is a custom in-house metrology AFM, called the c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823242

34. Comparison and Uncertainties of Standards for CD-AFM Microscope Tip Width Calibration
Published: 4/5/2007
Authors: Ronald G Dixson, Ndubuisi George Orji
Abstract: Since the advent of critical-dimension atomic force microscopes (CD-AFMs) inthe 90s, these tools have enjoyed growing acceptance in semiconductormanufacturing both for process development and to support in-line criticaldimension (CD) metrology.   ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823230

35. Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards
Published: 4/5/2007
Authors: Ronald G Dixson, William F Guthrie, Michael W Cresswell, Richard A Allen, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) are rapidly gaining acceptance in semiconductor manufacturing metrology.  These instruments offer non-destructive three dimensional imaging of structures and can provide a valuable complement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823219

36. TEM Calibration Methods for Critical Dimension Standards
Published: 4/5/2007
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, M R Bishop, Michael W Cresswell, J Allgair
Abstract: One of the key challenges in critical dimension (CD) metrology is finding suitable calibration standards. Over the last few years there has been some interest in using features measured with transmission electron microscope (TEM) as primary standards ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823228

37. Progress on Implementation of a Reference Measurement System based on a Critical-dimension Atomic Force Microscope
Published: 4/1/2007
Authors: Ndubuisi George Orji, Angela Martinez, B Bunday, J Allgair, Theodore Vincent Vorburger
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824604

38. Application of Carbon Nanotube Probes in a Critical Dimension Atomic Force Microscope
Published: 3/1/2007
Authors: B C. Park, J Choi, S J Ahn, D H Kim, L Joon, Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Theodore Vincent Vorburger
Abstract: The ever decreasing size of semiconductor features demands the advancement of critical dimension atomic force microscope (CD-AFM) technology, for which the fabrication and use of more ideal probes like carbon nanotubes (CNT) is of considerable intere ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823234

39. The Coming of Age of Tilt CD-SEM
Published: 3/1/2007
Authors: B Bunday, J Allgair, E Solecky, C Archie, Ndubuisi George Orji
Abstract: The need for 3D metrology is becoming more urgent to address critical gaps in metrology for both lithographic and etch processes. Current generation lithographic processing (ArF source, where lambda=193 nm) sometimes results in photoresist lines with ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823229

40. Higher Order Tip Effects in CD-AFM Linewidth Measurements
Published: 1/1/2007
Authors: Ndubuisi George Orji, Ronald G Dixson
Abstract: In critical dimension Atomic force microscopy (CD-AFM), a source of uncertainty is the tip.  Measurements made using a CD-AFM tip show an apparent broadening of the width. Usually the results can be approximated if the tip-width is known. In add ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823201



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series