NIST logo

Publications Portal

You searched on:
Author: ndubuisi orji

Displaying records 31 to 40 of 56 records.
Resort by: Date / Title


31. Comparison and Uncertainties of Standards for CD-AFM Microscope Tip Width Calibration
Published: 4/5/2007
Authors: Ronald G Dixson, Ndubuisi George Orji
Abstract: Since the advent of critical-dimension atomic force microscopes (CD-AFMs) inthe 90s, these tools have enjoyed growing acceptance in semiconductormanufacturing both for process development and to support in-line criticaldimension (CD) metrology.   ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823230

32. Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards
Published: 4/5/2007
Authors: Ronald G Dixson, William F Guthrie, Michael W Cresswell, Richard A Allen, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) are rapidly gaining acceptance in semiconductor manufacturing metrology.  These instruments offer non-destructive three dimensional imaging of structures and can provide a valuable complement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823219

33. TEM Calibration Methods for Critical Dimension Standards
Published: 4/5/2007
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, M R Bishop, Michael W Cresswell, J Allgair
Abstract: One of the key challenges in critical dimension (CD) metrology is finding suitable calibration standards. Over the last few years there has been some interest in using features measured with transmission electron microscope (TEM) as primary standards ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823228

34. Progress on Implementation of a Reference Measurement System based on a Critical-dimension Atomic Force Microscope
Published: 4/1/2007
Authors: Ndubuisi George Orji, Angela Martinez, B Bunday, J Allgair, Theodore Vincent Vorburger
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824604

35. Application of Carbon Nanotube Probes in a Critical Dimension Atomic Force Microscope
Published: 3/1/2007
Authors: B C. Park, J Choi, S J Ahn, D H Kim, L Joon, Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Theodore Vincent Vorburger
Abstract: The ever decreasing size of semiconductor features demands the advancement of critical dimension atomic force microscope (CD-AFM) technology, for which the fabrication and use of more ideal probes like carbon nanotubes (CNT) is of considerable intere ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823234

36. The Coming of Age of Tilt CD-SEM
Published: 3/1/2007
Authors: B Bunday, J Allgair, E Solecky, C Archie, Ndubuisi George Orji
Abstract: The need for 3D metrology is becoming more urgent to address critical gaps in metrology for both lithographic and etch processes. Current generation lithographic processing (ArF source, where lambda=193 nm) sometimes results in photoresist lines with ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823229

37. Higher Order Tip Effects in CD-AFM Linewidth Measurements
Published: 1/1/2007
Authors: Ndubuisi George Orji, Ronald G Dixson
Abstract: In critical dimension Atomic force microscopy (CD-AFM), a source of uncertainty is the tip.  Measurements made using a CD-AFM tip show an apparent broadening of the width. Usually the results can be approximated if the tip-width is known. In add ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823201

38. Advanced Metrology Needs for Nanoelectronics Lithography
Published: 10/1/2006
Authors: Stephen Knight, Ronald Dixon, Ronald Leland Jones, Eric Lin, Ndubuisi G Orji, Richard M Silver, Andras Vladar, Wen-li Wu
Abstract: The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades. While enormous effort has been expended in developing the optical lithography tools to print ever finer features, sign ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32439

39. Progress on Implementation of a CD-AFM Based Reference Measurement System
Published: 3/1/2006
Authors: Ndubuisi George Orji, Angela Martinez, Ronald G Dixson, J Allgair
Abstract: The National Institute of Standards and Technology (NIST) and SEMATECH are working to address traceability issues in semiconductor dimensional metrology.  In semiconductor manufacturing, many of the measurements made in the fab are not traceable ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823197

40. Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 3/1/2006
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Michael W Cresswell, Richard A Allen, William F Guthrie
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology.  There are two major instruments being used for traceable measurements at NIST.  The first is a cus ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823204



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series