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You searched on: Author: ndubuisi orji

Displaying records 31 to 40 of 61 records.
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31. Comparison of Measurement Techniques for Advanced Photomask Metrology
Published: 3/24/2008
Authors: Stewart Smith, Martin McCallum, Andrew Hourd, J. Tom Stevenson, Anthony J Walton, Ronald G Dixson, Richard A Allen, James Edward Potzick, Michael W. Cresswell, Ndubuisi George Orji

32. Towards Accurate Feature Shape Metrology
Published: 3/22/2008
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, J Allgair
Abstract: Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM ...

33. Nano- and Atomic-Scale Length Metrology
Published: 12/14/2007
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W. Cresswell, Richard A Allen, William F Guthrie, Wei Chu

34. Photoresist Cross-sectioning with Negligible Damage using a Dual-beam FIB-SEM: A High Throughput Method for Profile Imaging
Published: 11/1/2007
Authors: James Clarke, Martin Schmidt, Ndubuisi George Orji
Abstract: Imaging of photoresist cross sections in a focused ion beam (FIB)-scanning electron microscope (SEM) is demonstrated with negligible damage. An in situ chromium sputtering technique is used to deposit metal on the site of interest, replacing the co ...

35. Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 10/1/2007
Authors: Ronald G Dixson, Ndubuisi George Orji, James Edward Potzick, Joseph Fu, Michael W. Cresswell, Richard A Allen, S J Smith, Anthony J Walton
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology.  Two major instruments are being used for traceable measurements.  The first is a custom in-house metrology AFM, called the c ...

36. Comparison and Uncertainties of Standards for CD-AFM Microscope Tip Width Calibration
Published: 4/5/2007
Authors: Ronald G Dixson, Ndubuisi George Orji
Abstract: Since the advent of critical-dimension atomic force microscopes (CD-AFMs) inthe 90s, these tools have enjoyed growing acceptance in semiconductormanufacturing both for process development and to support in-line criticaldimension (CD) metrology.   ...

37. Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards
Published: 4/5/2007
Authors: Ronald G Dixson, William F Guthrie, Michael W. Cresswell, Richard A Allen, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) are rapidly gaining acceptance in semiconductor manufacturing metrology.  These instruments offer non-destructive three dimensional imaging of structures and can provide a valuable complement ...

38. TEM Calibration Methods for Critical Dimension Standards
Published: 4/5/2007
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, M R Bishop, Michael W. Cresswell, J Allgair
Abstract: One of the key challenges in critical dimension (CD) metrology is finding suitable calibration standards. Over the last few years there has been some interest in using features measured with transmission electron microscope (TEM) as primary standards ...

39. Progress on Implementation of a Reference Measurement System based on a Critical-dimension Atomic Force Microscope
Published: 4/1/2007
Authors: Ndubuisi George Orji, Angela Martinez, B Bunday, J Allgair, Theodore Vincent Vorburger

40. Application of Carbon Nanotube Probes in a Critical Dimension Atomic Force Microscope
Published: 3/1/2007
Authors: B C. Park, J Choi, S J Ahn, D H Kim, L Joon, Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Theodore Vincent Vorburger
Abstract: The ever decreasing size of semiconductor features demands the advancement of critical dimension atomic force microscope (CD-AFM) technology, for which the fabrication and use of more ideal probes like carbon nanotubes (CNT) is of considerable intere ...

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