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You searched on: Author: ndubuisi orji

Displaying records 31 to 40 of 63 records.
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31. Accuracy Considerations for Critical Dimension Semiconductor Metrology
Published: 9/9/2008
Authors: Ronald G Dixson, Ndubuisi George Orji, B Bunday, J Allgair
Abstract: As the size of integrated circuit features continues to decrease, the accuracy of measurements becomes more important. Due to greater emphasis on precision rather than accuracy, many of the measurements made in semiconductor fabs are not traceable to ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824699

32. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Published: 9/1/2008
Authors: Ravikiran Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

33. Comparison of Measurement Techniques for Advanced Photomask Metrology
Published: 3/24/2008
Authors: Stewart Smith, Martin McCallum, Andrew Hourd, J. Tom Stevenson, Anthony J Walton, Ronald G Dixson, Richard A Allen, James Edward Potzick, Michael W. Cresswell, Ndubuisi George Orji
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904605

34. Towards Accurate Feature Shape Metrology
Published: 3/22/2008
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, J Allgair
Abstract: Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824629

35. Nano- and Atomic-Scale Length Metrology
Published: 12/14/2007
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W. Cresswell, Richard A Allen, William F Guthrie, Wei Chu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824603

36. Photoresist Cross-sectioning with Negligible Damage using a Dual-beam FIB-SEM: A High Throughput Method for Profile Imaging
Published: 11/1/2007
Authors: James Clarke, Martin Schmidt, Ndubuisi George Orji
Abstract: Imaging of photoresist cross sections in a focused ion beam (FIB)-scanning electron microscope (SEM) is demonstrated with negligible damage. An in situ chromium sputtering technique is used to deposit metal on the site of interest, replacing the co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823232

37. Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 10/1/2007
Authors: Ronald G Dixson, Ndubuisi George Orji, James Edward Potzick, Joseph Fu, Michael W. Cresswell, Richard A Allen, S J Smith, Anthony J Walton
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology.  Two major instruments are being used for traceable measurements.  The first is a custom in-house metrology AFM, called the c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823242

38. Comparison and Uncertainties of Standards for CD-AFM Microscope Tip Width Calibration
Published: 4/5/2007
Authors: Ronald G Dixson, Ndubuisi George Orji
Abstract: Since the advent of critical-dimension atomic force microscopes (CD-AFMs) inthe 90s, these tools have enjoyed growing acceptance in semiconductormanufacturing both for process development and to support in-line criticaldimension (CD) metrology.   ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823230

39. Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards
Published: 4/5/2007
Authors: Ronald G Dixson, William F Guthrie, Michael W. Cresswell, Richard A Allen, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) are rapidly gaining acceptance in semiconductor manufacturing metrology.  These instruments offer non-destructive three dimensional imaging of structures and can provide a valuable complement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823219

40. TEM Calibration Methods for Critical Dimension Standards
Published: 4/5/2007
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, M R Bishop, Michael W. Cresswell, J Allgair
Abstract: One of the key challenges in critical dimension (CD) metrology is finding suitable calibration standards. Over the last few years there has been some interest in using features measured with transmission electron microscope (TEM) as primary standards ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823228



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  • SP 250-XX: Calibration Services
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