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Author: nhan nguyen

Displaying records 51 to 60 of 72 records.
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51. Effects of High Temperature Annealing on the Dielectric Function of Ta^d2^O^d5^ Films Observed by Spectroscopic Ellipsometry
Published: 11/6/2000
Authors: Nhan V Nguyen, Curt A Richter, Yong J. Cho, G A Alers, L. A. Stirling
Abstract: Post-deposition annealing of high-k dielectric Ta^d2^O^d5^ films to eliminate contaminations can adversely cause the films to crystallize, which can be detrimental to their CMOS device performances. In this letter, we will show that spectroscopic el ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=25317

52. In Situ and Ex Situ Spectroscopic Ellipsometry of Low-Temperature-Grown GaAs
Published: 7/30/2000
Authors: Donald A. Gajewski, Nhan V Nguyen, Jonathan E Guyer, Joseph J Kopanski, Curt A Richter, Joseph G. Pellegrino
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30331

53. In situ Metrology During the Growth of Compound Semiconductors by Molecular Beam Epitaxy
Series: Journal of Research (NIST JRES)
Published: 2/9/2000
Authors: Donald A. Gajewski, Jonathan E Guyer, Nhan V Nguyen, Joseph G. Pellegrino
Abstract: In this poster, we present the optical response of thin film compound semiconductors measured using in situ spectroscopic ellipsometry (SE), at growth temperatures ((180 to 600) 0C), during the growth by molecular beam epitaxy (MBE). We will focus on ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30282

54. Analytical Spectroscopic Ellipsometry of Ta^d2^O^d5^ and TiO^d2^ for Use as High-k Gate Dielectrics
Published: 12/2/1999
Authors: Curt A Richter, Nhan V Nguyen, G A Alers, X Guo, Xiaorui Wang, T P Ma, T Tamagawa
Abstract: Extended abstract on Analytical Spectroscopic Ellipsometry of Ta^d2^O^d5^ and TiO^d2^ for Use as High-k Gate Dielectrics. Opening paragraph of abstract: There is tremendous interest in high dielectric constant (high-k) films to use as alternates to S ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30167

55. Spectroscopic Ellipsometry of Ta^d2^0^d5^ On Si, in Ultrathin SiO^d2^ and High-K Materials for ULSI Gate Dielectrics, edited by H. R. Huff, C. A. Richter, M. L. Green, G. Lucovsky, and T. Hattori
Published: 9/1/1999
Authors: Curt A Richter, Nhan V Nguyen, G A Alers
Abstract: In this paper, we present the results of spectroscopic ellipsometry (SE) studies of Ta^d2^0^d5^ films on Si. Based on these results, we have experimentally determined an effective method for analyzing SE measurements of Ta^d2^0^d5^. A set of CVD-gro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=10687

56. Thin Film Ellipsometry Metrology
Published: 12/31/1998
Authors: P. Durgapal, James R. Ehrstein, Nhan V Nguyen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=11732

57. Neutron Reflectometry, X-Ray Reflectometry, and Spectroscopic Ellipsometry Characterization of Thin SiO^d2^ on Si
Published: 10/12/1998
Authors: Joseph A. Dura, Curt A Richter, Charles F Majkrzak, Nhan V Nguyen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16777

58. Characterization of Thin SiO^d2^ on Si by Spectroscopic Ellipsometry, Neutron Reflectometry, and X-Ray Reflectometry
Published: 7/1/1998
Authors: Curt A Richter, Nhan V Nguyen, Joseph A. Dura, Charles F Majkrzak
Abstract: We compare the results of neutron reflectometry, x-ray reflectometry, and spectroscopic ellipsometry measurements of a thin oxide film (=10 nm). These methods, which arise from three physically different scattering mechanisms, each determine physic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=9343

59. Thin-Film Ellipsometry Metrology
Published: 3/1/1998
Authors: P. Durgapal, James R. Ehrstein, Nhan V Nguyen
Abstract: A wide variety of commercial ellipsometers are available in the market today. They all measure the change in the state of polarization of light on reflection, but the techniques adopted vary from instrument to instrument. Further, the models used t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30140

60. Thickness Determination of Ultra-Thin SiO^d2^ Films on Si by Spectroscopic Ellipsometry
Published: 12/31/1997
Authors: Nhan V Nguyen, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=835



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