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Author: eric lin
Displaying records 11 to 20 of 197 records.
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11.
The effect of interfacial roughness on the thin film morphology and charge transport of high performance polythiphenes
Published: 9/1/2008
Authors: Yeon-Gil Jung, Regis J Kline, Daniel A Fischer, Eric K Lin, Martin Heeney, Iain McCulloch
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854398
12.
A Molecular Model for Toughening in Double-Network Hydrogels
Published: 6/18/2008
Authors: Vijay Tirumala, Sanghun Lee, Taiki Tominaga, Eric K Lin, Jian P. Gong, Paul D Butler, Wen-Li Wu
Abstract: A molecular mechanism is proposed for the toughness enhancement observed in double network (DN) hydrogels prepared from poly (2 acrylamido, 2-methyl, 1-propanesulfonicacid) (PAMPS) polyelectrolyte network and polyacrylamide (PAAm) linear polymer. It
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853627
13.
The Impact of the Dielectric / Semiconductor Interface on Microstructure and Charge Carrier Transport in High-Performance Polythiophene Transistors
Published: 5/14/2008
Authors: Youngsuk Jung, Regis J Kline, Eric K Lin, Daniel A Fischer, Michael F. Toney, Martin Heeney, Iain McCulloch, Dean M DeLongchamp
Abstract: The performance of organic field-effect transistors (OFETs) significantly depends on the properties of the interface between the semiconductor and gate dielectric. Here, we study the impact of chemically modified and morphologically controlled diele
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853581
14.
Self-Sealing Nanoporous Low-k Dielectric Patterns Created by Nanoimprint Lithography
Published: 4/15/2008
Authors: Hyun Wook Ro, H Peng, Ken-ich Nihara, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, D Gidley, Hiropshi Jinai, Do Y. Yoon, Christopher L Soles
Abstract: In this letter we describe how highly porous nanostructures can be directly printed into a poly(methylsilsequioxane) (PMSQ)-based organosilicate film, with high pattern fidelity, and develop the measurement infrastructure to quantitatively evaluate
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852758
15.
Well Ordered Polymer Melts from Blends of Disordered Triblock Copolymer Surfactants and Functional Homopolymers
Published: 4/4/2008
Authors: Vijay Tirumala, Alvin Romang, Sumit Agarwal, Eric K Lin, J J. Watkins
Abstract: Here, we report that well ordered, processible polymer melts with periodic nanostructures can be obtained in bulk quantity by simple blending of commercially available triblock copolymer surfactants with a series of commodity homopolymers that select
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852721
16.
Characterizing Pattern Structures Using X-Ray Reflectivity
Published: 3/28/2008
Authors: Hae-Jeong Lee, Christopher L Soles, Hyun Wook Ro, Shuhui Kang, Eric K Lin, Alamgir Karim, Wen-Li Wu
Abstract: Specular X-ray reflectivity (SXR) can be used, in the limit of the effective medium approximation (EMA), as a high-resolution shape metrology for periodic patterns on a planar substrate. The EMA means that the density of the solid pattern and the sp
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852735
17.
Nanoimprint Lithography for the Direct Patterning of Nanoporous Interlayer Dielectric Insulator Materials
Published: 3/28/2008
Authors: Hyun Wook Ro, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, Daniel R. Hines, Do Y. Yoon, Christopher L Soles
Abstract: Directly patterning dielectric insulator materials for semiconductor devices via nanoimprint lithography has the potential to simplify fabrication processes and reduce manufacturing costs. However, the prospect of mechanically forming these material
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852733
18.
Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM
Published: 3/24/2008
Authors: Chengqing C. Wang, Ronald Leland Jones, Kwang-Woo Choi, Christopher L Soles, Eric K Lin, Wen-Li Wu, James S Clarke, John S Villarrubia, Benjamin Bunday
Abstract: Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall roughness in patterns ranging from (10 to 500) nm in pitch with sub nm precision. These capabili
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853580
19.
Structure and Dynamics in Multicomponent Polyelectrolyte Solutions
Published: 3/11/2008
Authors: Sanghun Lee, Vijay Tirumala, Michihiro Nagao, Taiki Tominaga, Eric K Lin, Jian P. Gong, Wen-Li Wu
Abstract: Double-network hydrogels (DN-gels) prepared from the combination of a moderately crosslinked anionic polyelectrolyte (poly(2-acrylamido-2-methyl-1-propanesulfonic acid, PAMPS) and an uncrosslinked linear polymer (polyacrylamide, PAAm) solution show s
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854453
20.
The Effect of Interfacial Roughness on the Thin Film Morphology and Charge Transport of High-Performance Polythiophenes
Published: 3/11/2008
Authors: Y S Jung, Regis J Kline, Daniel A Fischer, Eric K Lin, Martin Heeney, Iain McCulloch, Dean M DeLongchamp
Abstract: We control and vary the roughness of a dielectric upon which a high-performance polymer semiconductor, poly(2,5-bis(3-alkylthiophen-2-yl)thieno[3,2-b]thiophene) (pBTTT) is cast, to determine the effects of roughness on thin-film microstructure and th
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852764