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Author: eric lin

Displaying records 11 to 20 of 198 records.
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11. Manipulation of the asymmetric swelling fronts of photoresist polyelectrolyte gradient thin films
Published: 9/22/2008
Authors: Vivek M Prabhu, Ashwin Rao, Shuhui Kang, Eric K Lin, Sushil K Satija
Abstract: The depth profile of swelling polyelectrolyte layers is characterized by a static substrate layer and an asymmetric profile with position and shape parameters that describe the near substrate and solution-side of the interfacial region. The character ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854125

12. The effect of interfacial roughness on the thin film morphology and charge transport of high performance polythiphenes
Published: 9/1/2008
Authors: Yeon-Gil Jung, Regis J Kline, Daniel A Fischer, Eric K Lin, Martin Heeney, Iain McCulloch
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854398

13. A Molecular Model for Toughening in Double-Network Hydrogels
Published: 6/18/2008
Authors: Vijay Tirumala, Sanghun Lee, Taiki Tominaga, Eric K Lin, Jian P. Gong, Paul D Butler, Wen-Li Wu
Abstract: A molecular mechanism is proposed for the toughness enhancement observed in double network (DN) hydrogels prepared from poly (2 acrylamido, 2-methyl, 1-propanesulfonicacid) (PAMPS) polyelectrolyte network and polyacrylamide (PAAm) linear polymer. It ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853627

14. The Impact of the Dielectric / Semiconductor Interface on Microstructure and Charge Carrier Transport in High-Performance Polythiophene Transistors
Published: 5/14/2008
Authors: Youngsuk Jung, Regis J Kline, Eric K Lin, Daniel A Fischer, Michael F. Toney, Martin Heeney, Iain McCulloch, Dean M DeLongchamp
Abstract: The performance of organic field-effect transistors (OFETs) significantly depends on the properties of the interface between the semiconductor and gate dielectric. Here, we study the impact of chemically modified and morphologically controlled diele ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853581

15. Self-Sealing Nanoporous Low-k Dielectric Patterns Created by Nanoimprint Lithography
Published: 4/15/2008
Authors: Hyun Wook Ro, H Peng, Ken-ich Nihara, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, D Gidley, Hiropshi Jinai, Do Y. Yoon, Christopher L Soles
Abstract: In this letter we describe how highly porous nanostructures can be directly printed into a poly(methylsilsequioxane) (PMSQ)-based organosilicate film, with high pattern fidelity, and develop the measurement infrastructure to quantitatively evaluate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852758

16. Well Ordered Polymer Melts from Blends of Disordered Triblock Copolymer Surfactants and Functional Homopolymers
Published: 4/4/2008
Authors: Vijay Tirumala, Alvin Romang, Sumit Agarwal, Eric K Lin, J J. Watkins
Abstract: Here, we report that well ordered, processible polymer melts with periodic nanostructures can be obtained in bulk quantity by simple blending of commercially available triblock copolymer surfactants with a series of commodity homopolymers that select ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852721

17. Characterizing Pattern Structures Using X-Ray Reflectivity
Published: 3/28/2008
Authors: Hae-Jeong Lee, Christopher L Soles, Hyun Wook Ro, Shuhui Kang, Eric K Lin, Alamgir Karim, Wen-Li Wu
Abstract: Specular X-ray reflectivity (SXR) can be used, in the limit of the effective medium approximation (EMA), as a high-resolution shape metrology for periodic patterns on a planar substrate. The EMA means that the density of the solid pattern and the sp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852735

18. Nanoimprint Lithography for the Direct Patterning of Nanoporous Interlayer Dielectric Insulator Materials
Published: 3/28/2008
Authors: Hyun Wook Ro, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, Daniel R. Hines, Do Y. Yoon, Christopher L Soles
Abstract: Directly patterning dielectric insulator materials for semiconductor devices via nanoimprint lithography has the potential to simplify fabrication processes and reduce manufacturing costs. However, the prospect of mechanically forming these material ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852733

19. Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM
Published: 3/24/2008
Authors: Chengqing C. Wang, Ronald Leland Jones, Kwang-Woo Choi, Christopher L Soles, Eric K Lin, Wen-Li Wu, James S Clarke, John S Villarrubia, Benjamin Bunday
Abstract: Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall roughness in patterns ranging from (10 to 500) nm in pitch with sub nm precision. These capabili ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853580

20. Structure and Dynamics in Multicomponent Polyelectrolyte Solutions
Published: 3/11/2008
Authors: Sanghun Lee, Vijay Tirumala, Michihiro Nagao, Taiki Tominaga, Eric K Lin, Jian P. Gong, Wen-Li Wu
Abstract: Double-network hydrogels (DN-gels) prepared from the combination of a moderately crosslinked anionic polyelectrolyte (poly(2-acrylamido-2-methyl-1-propanesulfonic acid, PAMPS) and an uncrosslinked linear polymer (polyacrylamide, PAAm) solution show s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854453



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