Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publications Portal

You searched on: Author: eric lin

Displaying records 11 to 20 of 197 records.
Resort by: Date / Title

11. Manipulation of the asymmetric swelling fronts of photoresist polyelectrolyte gradient thin films
Published: 9/22/2008
Authors: Vivek M Prabhu, Ashwin Rao, Shuhui Kang, Eric K Lin, Sushil K Satija
Abstract: The depth profile of swelling polyelectrolyte layers is characterized by a static substrate layer and an asymmetric profile with position and shape parameters that describe the near substrate and solution-side of the interfacial region. The character ...

12. The effect of interfacial roughness on the thin film morphology and charge transport of high performance polythiphenes
Published: 9/1/2008
Authors: Yeon-Gil Jung, Regis J Kline, Daniel A Fischer, Eric K Lin, Martin Heeney, Iain McCulloch

13. A Molecular Model for Toughening in Double-Network Hydrogels
Published: 6/18/2008
Authors: Vijay Tirumala, Sanghun Lee, Taiki Tominaga, Eric K Lin, Jian P. Gong, Paul D Butler, Wen-Li Wu
Abstract: A molecular mechanism is proposed for the toughness enhancement observed in double network (DN) hydrogels prepared from poly (2 acrylamido, 2-methyl, 1-propanesulfonicacid) (PAMPS) polyelectrolyte network and polyacrylamide (PAAm) linear polymer. It ...

14. The Impact of the Dielectric / Semiconductor Interface on Microstructure and Charge Carrier Transport in High-Performance Polythiophene Transistors
Published: 5/14/2008
Authors: Youngsuk Jung, Regis J Kline, Eric K Lin, Daniel A Fischer, Michael F. Toney, Martin Heeney, Iain McCulloch, Dean M DeLongchamp
Abstract: The performance of organic field-effect transistors (OFETs) significantly depends on the properties of the interface between the semiconductor and gate dielectric. Here, we study the impact of chemically modified and morphologically controlled diele ...

15. Self-Sealing Nanoporous Low-k Dielectric Patterns Created by Nanoimprint Lithography
Published: 4/15/2008
Authors: Hyun Wook Ro, H Peng, Ken-ich Nihara, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, D Gidley, Hiropshi Jinai, Do Y. Yoon, Christopher L Soles
Abstract: In this letter we describe how highly porous nanostructures can be directly printed into a poly(methylsilsequioxane) (PMSQ)-based organosilicate film, with high pattern fidelity, and develop the measurement infrastructure to quantitatively evaluate ...

16. Well Ordered Polymer Melts from Blends of Disordered Triblock Copolymer Surfactants and Functional Homopolymers
Published: 4/4/2008
Authors: Vijay Tirumala, Alvin Romang, Sumit Agarwal, Eric K Lin, J J. Watkins
Abstract: Here, we report that well ordered, processible polymer melts with periodic nanostructures can be obtained in bulk quantity by simple blending of commercially available triblock copolymer surfactants with a series of commodity homopolymers that select ...

17. Characterizing Pattern Structures Using X-Ray Reflectivity
Published: 3/28/2008
Authors: Hae-Jeong Lee, Christopher L Soles, Hyun Wook Ro, Shuhui Kang, Eric K Lin, Alamgir Karim, Wen-Li Wu
Abstract: Specular X-ray reflectivity (SXR) can be used, in the limit of the effective medium approximation (EMA), as a high-resolution shape metrology for periodic patterns on a planar substrate. The EMA means that the density of the solid pattern and the sp ...

18. Nanoimprint Lithography for the Direct Patterning of Nanoporous Interlayer Dielectric Insulator Materials
Published: 3/28/2008
Authors: Hyun Wook Ro, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, Daniel R. Hines, Do Y. Yoon, Christopher L Soles
Abstract: Directly patterning dielectric insulator materials for semiconductor devices via nanoimprint lithography has the potential to simplify fabrication processes and reduce manufacturing costs. However, the prospect of mechanically forming these material ...

19. Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM
Published: 3/24/2008
Authors: Chengqing C. Wang, Ronald Leland Jones, Kwang-Woo Choi, Christopher L Soles, Eric K Lin, Wen-Li Wu, James S Clarke, John S Villarrubia, Benjamin Bunday
Abstract: Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall roughness in patterns ranging from (10 to 500) nm in pitch with sub nm precision. These capabili ...

20. Structure and Dynamics in Multicomponent Polyelectrolyte Solutions
Published: 3/11/2008
Authors: Sanghun Lee, Vijay Tirumala, Michihiro Nagao, Taiki Tominaga, Eric K Lin, Jian P. Gong, Wen-Li Wu
Abstract: Double-network hydrogels (DN-gels) prepared from the combination of a moderately crosslinked anionic polyelectrolyte (poly(2-acrylamido-2-methyl-1-propanesulfonic acid, PAMPS) and an uncrosslinked linear polymer (polyacrylamide, PAAm) solution show s ...

Search NIST-wide:

(Search abstract and keywords)

Last Name:
First Name:

Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series