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You searched on: Author: ronald jones

Displaying records 21 to 30 of 62 records.
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21. Structure-Property Relationships of Photopolymerizable Poly(Ethylene Glycol) Dimethacrylate Hydrogels
Published: 4/1/2005
Authors: L G Sheng, Ronald Leland Jones, N Washburn, F Horkay
Abstract: Photopolymerized hydrogels from poly(ethylene glycol) dimethacrylate (PEGDM) and similar derivatives have been examined extensively as scaffolds for tissue regeneration and other biological applications. A systematic investigation into the structure ...

22. X-ray Absorption Spectroscopy to Probe Surface Composition and Surface Deprotection in Photoresist Films
Published: 3/1/2005
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A Fischer, S Sambasivan, Eric K Lin, Ronald Leland Jones, Christopher L Soles, Wen-Li Wu, D M Goldfarb, M Angelopoulos
Abstract: We utilize near edge x-ray absorption fine structure spectroscopy (NEXAFS) to provide chemical insight into surface chemical effects in model photo-resist films. First, NEXAFS was used to examine the resist/air interface including surface segregrati ...

23. Pattern Fidelity in Nanoimprinted Films Using Cd-Saxs
Published: 1/1/2005
Authors: Ronald Leland Jones, Christopher L Soles, Eric K Lin, Walter Hu, R M Reano, Stella W Pang, Steven J Weigand, D T Keane, John P Quintana

24. Formation of Deprotected Fuzzy Blobs in Chemically Amplified Resists
Published: 9/1/2004
Authors: Ronald Leland Jones, C G Willson, T Hu, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos, B C Trinque, G M Schmidt, M D Stewart
Abstract: The requirement of nanometer dimensional control in photolithographic patterning underlies the future of emerging technologies including next generation semiconductors, nanofluidics, photonics, and microelectronic machines (MEMs). Dimensional contro ...

25. Small Angle X-Ray Scattering Metrology for Sidewall Angle and Cross Section of Nanometer Scale Line Gratings
Published: 8/1/2004
Authors: T Hu, Ronald Leland Jones, Wen-Li Wu, Eric K Lin, Q Lin, D T Keane, Steven Weigand, J Quintana

26. Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists
Published: 7/1/2004
Authors: Ronald Leland Jones, Vivek M Prabhu, D M Goldfarb, Eric K Lin, Christopher L Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, M Angelopoulos
Abstract: A model bilayer geometry is used to examine fundamental contributions of in-situ reaction front profile width on resulting line edge roughness after development in standard 0.26 N tetramethyl ammonium hydroxide aqueous base developer. The bilayer ge ...

27. Interfacial Effects on Moisture Absorption in Thin Polymer Films
Published: 6/1/2004
Authors: B D. Vogt, Christopher L Soles, Ronald Leland Jones, C M Wang, Eric K Lin, Wen-Li Wu, Sushil K. Satija, D L Goldfarb, M Angelopoulos
Abstract: Moisture absorption in model photoresist films of poly(4-hydroxystryene) (PHOSt) and poly(tert-butoxycarboxystyrene) (PBOCSt) was measured by x-ray and neutron reflectivity. The degree of swelling in the films upon moisture exposure was found to be ...

28. Unusual Expansion and Contraction in Ultrathin Glassy Polycarbonate Films
Published: 4/1/2004
Authors: Christopher L Soles, Jack F Douglas, Ronald Leland Jones, Wen-Li Wu
Abstract: The thermal expansion behavior and glass transitions of poly(styrene) (PS) and poly(methyl methacrylate) (PMMA) are extensively studied in the thin film geometry. Both PS and PMMA are similar in that they possess very low entanglement densities. In ...

29. Brillouin Scattering Studies of Polymeric Nanostructures
Published: 3/1/2004
Authors: R Hartschuh, A Mahorowala, Y Ding, J H Roh, A Kisliuk, Alexei Sokolov, Christopher L Soles, Ronald Leland Jones, T J Hu, Wen-Li Wu
Abstract: Polymers are now being patterned into nanometer-sized features via optical and/or imprint lithography for a range of applications, including semiconductors, Micro-Electro- Mechanical systems (MEMS), and Nano-Electro-Mechanical systems (NEMS). In the ...

30. Line-Edge Roughness and Side-Wall Angle Measurements of Nanoscale Patterns by Small Angle X-Ray Scattering
Published: 2/1/2004
Authors: T Hu, Ronald Leland Jones, Eric K Lin, Wen-Li Wu
Abstract: Nanometer scale control of lithographic pattern quality is required as the semiconductor industry moves to the mass production of sub-100nm semiconductor devices. Scanning electron microscopy (SEM) has been the mainstay metrology in lithography. Othe ...

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