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You searched on: Author: william guthrie

Displaying records 21 to 30 of 82 records.
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21. Single Crystal Critical Dimension Reference Materials (SCCDRM): Process Optimization for the Next Generation of Standards
Published: 4/5/2007
Authors: Ronald G Dixson, William F Guthrie, Michael W Cresswell, Richard A Allen, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) are rapidly gaining acceptance in semiconductor manufacturing metrology.  These instruments offer non-destructive three dimensional imaging of structures and can provide a valuable complement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823219

22. Development of Certified Reference Materials of Ion-Implanted Dopants in Silicon for Calibration of Secondary Ion Mass Spectrometers
Published: 1/1/2007
Authors: David S Simons, Robert G Downing, George Paul Lamaze, Richard Mark Lindstrom, Robert Russ Greenberg, Rick L Paul, Susannah Schiller, William F Guthrie
Abstract: Certified reference materials have been developed for calibration of the concentrations of the most common dopants used in silicon semiconductor technology boron, arsenic, and phosphorus. These materials consist of a single dopant species that is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831437

23. Calcium Phosphate Cement With Non-Rigidity and Strength Durability for Periodontal Bone Repair
Published: 8/1/2006
Authors: Hockin D. Xu, Shozo Takagi, Limin Sun, L A Hussain, Laurence Chung Lung Chow, William F Guthrie, James H Yen
Abstract: Background. The need for biomaterials to treat periodontal osseous defects has increased as the world population ages. The objective of the present study was to develop a self-hardening, resorbable, and mech/anically strong calcium phosphate cement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852519

24. Certification of SRM 114q: Part I
Series: Special Publication (NIST SP)
Report Number: 260-161
Published: 6/14/2006
Authors: Chiara F Ferraris, William F Guthrie, A Aviles, Robin K Haupt, Bruce S MacDonald
Abstract: The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Being a powder, the main physical properties of cement, prior to hydratio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=860624

25. Certification of SRM 114q: Part II
Series: Special Publication (NIST SP)
Report Number: 260-166
Published: 6/14/2006
Authors: Chiara F Ferraris, Max A Peltz, William F Guthrie, A Aviles, Robin K Haupt, Bruce S MacDonald
Abstract: The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Being a powder, the main physical properties of cement, prior to hydratio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=860657

26. k=2 and Other Sometimes Hidden Assumptions in Chemical Measurement Uncertainty Intervals
Published: 4/24/2006
Authors: David Lee Duewer, S LR Ellison, William F Guthrie, D B Hibbert, C Jackson, A Kallner, Stefan D Leigh, Reenie May Parris, Kenneth W Pratt, Michele M Schantz, Katherine E Sharpless
Abstract: A recent interlaboratory study that required individual analysts to estimate uncertainty intervals for their results revealed that some experienced chemical analysts have difficulty with measurement uncertainty calculations. To help validate assumpti ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=832153

27. Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 3/1/2006
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Michael W Cresswell, Richard A Allen, William F Guthrie
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology.  There are two major instruments being used for traceable measurements at NIST.  The first is a cus ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823204

28. Nano- and Atomic-Scale Length Metrology
Published: 1/1/2006
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W Cresswell, Richard A Allen, William F Guthrie, Wei Chu
Abstract: We discuss nano-scale length metrology of linewidth, step height, and line edge roughness (LER). These properties are of growing importance to the function and specification of semiconductor devices as the dimensions of semiconductor devices shrink t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823216

29. Traceable Calibration of Critical-dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty
Published: 11/30/2005
Authors: Ronald G Dixson, Richard A Allen, William F Guthrie, Michael W Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32210

30. Critical Dimension Reference Features with Sub-Five Nanometer Uncertainty
Published: 5/30/2005
Authors: Michael W Cresswell, Ronald G Dixson, William F Guthrie, Richard A Allen, Christine E. Murabito, Brandon Park, Joaquin (Jack) Martinez, Amy Hunt
Abstract: The implementation of a new type of HRTEM-imaging (High-Resolution Transmission Electron Microscopy) test structure, and the use of CD-AFM (CD-Atomic Force Microscopy) to serve as the transfer metrology have resulted in reductions in the uncertaintie ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31923



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