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Author: ulf griesmann

Displaying records 21 to 30 of 52 records.
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21. Dual-CGH Interferometry Test for X-Ray Mirror Mandrels
Published: 6/15/2008
Authors: Guangjun Gao, John Lehan, Ulf Griesmann
Abstract: We describe a glancing-incidence interferometric double-pass test, based on a pair of computer generated holograms (CGHs), for mandrels used to fabricate x-ray mirrors for space-based x-ray telescopes. The design of the test and its realization are d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902515

22. Three-Flat Test Solutions Including Mounting-Induced Deformations
Published: 9/1/2007
Authors: Ulf Griesmann, Quandou Wang, Johannes A Soons
Abstract: We investigate three-flat calibration methods for circular flats, based on rotation symmetry and mirror symmetry, for absolute interferometric flatness measurements in the presence of deformations caused by the support mechanism for the flats, which ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823338

23. Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variations
Report Number: 823030
Published: 1/2/2007
Authors: Ulf Griesmann, Quandou Wang, Marc Tricard, Paul Dumas, Christopher Hill
Abstract: With the evolution of exposure tools for optical lithography towards larger numerical apertures, the semiconductor industry expects continued demand for improved wafer flatness at the exposure site. The Allowable site flatness for 300 mm wafers is ex ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823030

24. Three-Flat Test Solutions based on Simple Mirror Symmetry
Published: 8/1/2006
Author: Ulf Griesmann
Abstract: Three-flat tests are the archetypes of measurement procedures used in interferometric surface and wavefront metrology to separate errors in the interferometer reference wavefront from errors due to the tests part surface, so-called absolute tests. A ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822358

25. Form-Profiling of Optics Using the Geometry Measuring Machine and NIST M-48 CMM
Published: 1/1/2006
Authors: Nadia Machkour-Deshayes, John Richard Stoup, John Lu, Johannes A Soons, Ulf Griesmann, Robert S. Polvani
Abstract: We are developing an instrument, the Geometry Measuring Machine (GEMM), to measure the profile errors of aspheric and free form optical surfaces, which require measurement uncertainties near 1nm. Using GEMM, an optical profile is reconstructed from ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822545

26. Mini-Fizeau Interferometer for Curvature Sensing in the NIST Geometry Measuring Machine
Published: 1/1/2006
Authors: Quandou Wang, Ulf Griesmann
Abstract: We describe the design of a miniature Fizeau interferometer, which is intended to be an accurate curvature sensor for the NIST Geometry Measuring (GEMM), which is used to measure aspheric and free form surfaces. The interferometer was designed for s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822280

27. Uncertainties in Aspheric Profile Measurements with the Geometry Measuring Machine at NIST
Published: 7/31/2005
Authors: Ulf Griesmann, Nadia Machkour-Deshayes, Byoung Chang Kim, Quandou Wang, Lahsen Assoufid
Abstract: The Geometry Measuring Machine (GEMM) of the National Institute of Standards and Technology (NIST) is a profilometer for free-form surfaces. A profile is reconstructed from local curvature of a test part surface, measured at several locations along ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822308

28. Interferometric Thickness Calibration of 300mm Silicon Wafers
Published: 7/20/2005
Authors: Quandou Wang, Ulf Griesmann, Robert S. Polvani
Abstract: The Improved Infrared Interferometer (IR3) at the National Institute of Standards and Technology (NIST) is a phase-measuring interferometer, operating at a wavelength of 1550 nm, which is being developed for measuring the thickness and thickness vari ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822291

29. Optical Flatness Metrology for 300 mm Silicon Wafers
Published: 4/1/2005
Authors: Ulf Griesmann, Quandou Wang, T D Raymond
Abstract: At the National Institute of Standards and Technology (NIST), we are developing two interferometric methods for measuring the thickness variation and flatness of free-standing and chucked silicon wafers with diameters up to 300mm. The eXtremely accu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822272

30. A Simple Ball Averager for Reference Sphere Calibrations
Published: 1/1/2005
Authors: Ulf Griesmann, Quandou Wang, Johannes A Soons, Remi Carakos
Abstract: When measuring the form errors of precision optics with an interferometer, the calibration of the reference wavefront is of central importance.  Ball averaging, or random ball testing, has in recent years emerged as a robust method for calibrati ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822303



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